Method of inhibiting hillock formation in films and film thereby and
multilayer structure therewith
    37.
    发明授权
    Method of inhibiting hillock formation in films and film thereby and multilayer structure therewith 失效
    从而抑制膜和膜中的小丘形成的方法和其多层结构

    公开(公告)号:US4012756A

    公开(公告)日:1977-03-15

    申请号:US544462

    申请日:1975-01-27

    摘要: In accordance with the disclosure, certain impurities, e.g., alloying additions, are introduced in thin metal film to negate the driving force or the effect of the driving force which causes the hillock formation. Such thin metallic films are usually fabricated on the substrates which have different thermal coefficients of expansion than the film itself, and during thermal cycling stresses can be introduced into the film. This stress may serve as a driving force for atom movement and, therefore, to the formation of hillocks. The vehicle by which the induced stress in a film effects the requisite atom movement is via defect movement, and when the force is compressive this gives rise to hillocks. In the practice of this disclosure, impurity additions introduced into a film affect hillock growth by their interaction with the defects which give rise to the requisite atom movement. Systematically selected impurity additions are introduced into a film during fabrication thereof which inhibit the defect movement in the class consisting of a migration of point defects, linear defects and planar defects wherein the linear defects are dislocations and the planar defects are grain boundaries. Usually, the addition of impurities into a metal film is termed alloying and the resultant film is termed an alloyed film. The alloying addition may be either soluble or insoluble in the film. This will determine the choice of possible modes of fabrication. When the alloy addition is soluble, it is included within the limits of solubility at the temperature at which it is introduced. When the alloy addition is insoluble, it is introduced during fabrication and quantity thereof may be significantly better than the quantity capable of being sustained were the alloying addition and the film to be in thermal equilibrium.

    摘要翻译: 根据本公开内容,在薄金属膜中引入某些杂质,例如合金化添加物,以消除导致小丘形成的驱动力或驱动力的影响。 这种薄金属膜通常制造在具有不同于膜本身的不同热膨胀系数的基板上,并且在热循环过程中可以将应力引入膜中。 这种压力可能作为原子运动的驱动力,因此可能是形成小丘。 通过缺陷运动,膜中的诱发应力导致必需的原子运动的载体,并且当力被压缩时,这引起小丘。 在本公开的实践中,引入膜中的杂质添加物通过与引起必需原子运动的缺陷的相互作用影响小丘生长。 在其制造期间,将系统选择的杂质添加物引入到膜中,其抑制由缺陷偏移,线性缺陷和平面缺陷组成的类别中的缺陷运动,其中线性缺陷是位错并且平面缺陷是晶界。 通常,将杂质添加到金属膜中称为合金化,所得到的膜称为合金膜。 合金添加可以是可溶的或不溶于膜。 这将决定可能的制造方式的选择。 当合金添加是可溶的时,它被包括在其引入温度下的溶解度范围内。 当合金添加不溶时,其在制造过程中被引入,并且其量可以显着地优于合金添加和处于热平衡的膜中能够持续的量。

    MOLECULAR MANIPULATOR, A METHOD OF MAKING THE SAME, AND A METHOD OF MOVING A NANOSTRUCTURE
    40.
    发明申请
    MOLECULAR MANIPULATOR, A METHOD OF MAKING THE SAME, AND A METHOD OF MOVING A NANOSTRUCTURE 审中-公开
    分子操纵器,其制造方法和移动纳米结构的方法

    公开(公告)号:US20090312529A1

    公开(公告)日:2009-12-17

    申请号:US12544899

    申请日:2009-08-20

    IPC分类号: C09B31/02

    CPC分类号: G02B21/34 C07C323/48

    摘要: A molecular manipulator includes a light-sensitive molecule, including a double bond, which changes a cis-trans configuration of the double bond in response to illumination by light of a selected wavelength, and a probe, for example, a probe of a scanned-proximity probe microscope, to which the light-sensitive molecule is attached. A method of making the molecular manipulator includes covalently bonding the light-sensitive molecule to the probe. A method of moving a nanostructure includes controllably grasping, moving, and releasing the nanostructure with the molecular manipulator.

    摘要翻译: 分子操纵器包括包含双键的光敏分子,其响应于所选波长的光的照射而改变双键的顺式 - 反式构型,以及探针,例如扫描型探针的探针, 邻近探针显微镜,光敏分子附着于其上。 制造分子操纵器的方法包括将光敏分子共价键合到探针。 移动纳米结构的方法包括用分子操纵器可控地掌握,移动和释放纳米结构。