公开(公告)号：US20140183761A1

公开(公告)日：2014-07-03

申请号：US14070509

申请日：2013-11-02

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Pandi C. Marimuthu ,  Il Kwon Shim ,  Byung Joon Han

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L24/96 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L24/11 ,  H01L24/19 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/1134 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2924/01322 ,  H01L2924/10157 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device includes a semiconductor die and an encapsulant deposited over and around the semiconductor die. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. A groove is formed in the base semiconductor material. The semiconductor wafer is singulated through the groove to separate the semiconductor die. The semiconductor die are disposed over a carrier with a distance of 500 micrometers (μm) or less between semiconductor die. The encapsulant covers a sidewall of the semiconductor die. A fan-in interconnect structure is formed over the semiconductor die while the encapsulant remains devoid of the fan-in interconnect structure. A portion of the encapsulant is removed from a non-active surface of the semiconductor die. The device is singulated through the encapsulant while leaving encapsulant disposed covering a sidewall of the semiconductor die. The encapsulant covering the sidewall includes a thickness of 50 μm or less.

Abstract translation: 半导体器件包括沉积在半导体管芯上方和周围的半导体管芯和密封剂。 半导体晶片包括多个半导体管芯和基底半导体材料。 在基底半导体材料中形成凹槽。 半导体晶片通过沟槽分离，以分离半导体管芯。 将半导体管芯设置在半导体管芯之间的距离为500微米（μm）以下的载体上。 密封剂覆盖半导体管芯的侧壁。 在半导体管芯上形成扇形互连结构，而密封剂保持没有扇形互连结构。 密封剂的一部分从半导体管芯的非活性表面去除。 通过密封剂将器件分离，同时留下覆盖半导体管芯侧壁的密封剂。 覆盖侧壁的密封剂的厚度为50μm以下。

公开(公告)号：US20140054802A1

公开(公告)日：2014-02-27

申请号：US13795679

申请日：2013-03-12

Applicant: STATS CHIPPAC, LTD.

Inventor： Il Kwon Shim ,  Jun Mo Koo

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L23/28 ,  H01L21/4853 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/525 ,  H01L23/5328 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/11 ,  H01L24/19 ,  H01L24/96 ,  H01L2224/02311 ,  H01L2224/0239 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/1134 ,  H01L2224/12105 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die and first insulating layer formed over the semiconductor die. A patterned trench is formed in the first insulating layer. A conductive ink is deposited in the patterned trench by disposing a stencil over the first insulating layer with an opening aligned with the patterned trench and depositing the conductive ink through the opening in the stencil into the patterned trench.Alternatively, the conductive ink is deposited by dispensing the conductive ink through a nozzle into the patterned trench. The conductive ink is cured by ultraviolet light at room temperature. A second insulating layer is formed over the first insulating layer and conductive ink. An interconnect structure is formed over the conductive ink. An encapsulant can be deposited around the semiconductor die. The patterned trench is formed in the encapsulant and the conductive ink is deposited in the patterned trench in the encapsulant.

Abstract translation: 半导体器件具有形成在半导体管芯上的半导体管芯和第一绝缘层。 图案化的沟槽形成在第一绝缘层中。 通过将第一绝缘层上的模版设置在与图案化的沟槽对准的开口并将导电油墨沉积在模板中的开口中，将导电油墨沉积在图案化的沟槽中，形成图案化沟槽。 或者，通过将导电油墨通过喷嘴分配到图案化的沟槽中来沉积导电油墨。 导电油墨在室温下通过紫外光固化。 在第一绝缘层和导电油墨之上形成第二绝缘层。 在导电油墨上形成互连结构。 密封剂可以沉积在半导体管芯周围。 图案化的沟槽形成在密封剂中，并且导电油墨沉积在密封剂中的图案化沟槽中。

公开(公告)号：US20130075902A1

公开(公告)日：2013-03-28

申请号：US13683884

申请日：2012-11-21

Applicant: STATS CHIPPAC, LTD.

Inventor： Seng Guan Chow ,  Il Kwon Shim ,  Heap Hoe Kuan ,  Rui Huang

IPC: H01L23/498 ,  H01L21/56

CPC classification number: H01L23/49811 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/18 ,  H01L24/19 ,  H01L24/48 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/18 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor package includes a post carrier having a base plate and plurality of conductive posts. A photosensitive encapsulant is deposited over the base plate of the post carrier and around the conductive posts. The photosensitive encapsulant is etched to expose a portion of the base plate of the post carrier. A semiconductor die is mounted to the base plate of the post carrier within the etched portions of the photosensitive encapsulant. A second encapsulant is deposited over the semiconductor die. A first circuit build-up layer is formed over the second encapsulant. The first circuit build-up layer is electrically connected to the conductive posts. The base plate of the post carrier is removed and a second circuit build-up layer is formed over the semiconductor die and the photosensitive encapsulant opposite the first circuit build-up layer. The second circuit build-up layer is electrically connected to the conductive posts.

Abstract translation: 半导体封装包括具有基板和多个导电柱的柱载体。 光敏密封剂沉积在柱载体的基板上并且在导电柱周围。 蚀刻光敏密封剂以暴露柱载体的基板的一部分。 在光敏密封剂的蚀刻部分内的半导体管芯安装到柱载体的基板上。 第二密封剂沉积在半导体管芯上。 在第二密封剂上形成第一电路堆积层。 第一电路堆积层电连接到导电柱。 去除柱载体的基板，并且在半导体管芯上形成第二电路堆积层，并且与第一电路堆积层相对的光敏封装体形成第二电路堆积层。 第二电路堆积层电连接到导电柱。

公开(公告)号：US20130075899A1

公开(公告)日：2013-03-28

申请号：US13682281

申请日：2012-11-20

Applicant: STATS ChipPAC, Ltd.

Inventor： Rui Huang ,  Il Kwon Shim ,  Seng Guan Chow ,  Heap Hoe Kuan

IPC: H01L23/498 ,  H01L21/56

CPC classification number: H01L23/49811 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49833 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L24/48 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor package is made using a prefabricated post carrier including a base plate and plurality of conductive posts. A film encapsulant is disposed over the base plate of the post carrier and around the conductive posts. A semiconductor die is mounted to a temporary carrier. The post carrier and temporary carrier are pressed together to embed the semiconductor die in the film encapsulant. The semiconductor die is disposed between the conductive posts in the film encapsulant. The temporary carrier and base plate of the post carrier are removed. A first circuit build-up layer is formed over a first side of the film encapsulant. The first circuit build-up layer is electrically connected to the conductive posts. A second circuit build-up layer is formed over a second side of the film encapsulant opposite the first side. The second circuit build-up layer is electrically connected to the conductive posts.

Abstract translation: 使用包括基板和多个导电柱的预制柱载体制成半导体封装。 胶片密封剂设置在柱载体的基板上并且在导电柱周围。 半导体管芯安装到临时载体上。 将载体和临时载体压在一起以将半导体管芯嵌入膜密封剂中。 半导体管芯设置在膜密封剂中的导电柱之间。 卸载载体的临时载体和基板。 在膜密封剂的第一侧上形成第一电路堆积层。 第一电路堆积层电连接到导电柱。 第二电路堆积层形成在与第一侧相对的膜密封剂的第二侧上。 第二电路堆积层电连接到导电柱。

公开(公告)号：US10083916B2

公开(公告)日：2018-09-25

申请号：US14637054

申请日：2015-03-03

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Seng Guan Chow ,  Yaojian Yaojian

IPC: H01L23/00 ,  H01L25/10 ,  H01L21/56 ,  H01L21/683 ,  H01L23/31 ,  H01L23/538 ,  H01L23/66

CPC classification number: H01L23/562 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/66 ,  H01L24/19 ,  H01L24/48 ,  H01L24/73 ,  H01L24/81 ,  H01L24/82 ,  H01L24/83 ,  H01L24/97 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2223/6677 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2924/00 ,  H01L2224/81805 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device is made by forming a first conductive layer over a sacrificial carrier. A conductive pillar is formed over the first conductive layer. An active surface of a semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the conductive pillar. The carrier and adhesive layer are removed. A stress relief insulating layer is formed over the active surface of the semiconductor die and a first surface of the encapsulant. The stress relief insulating layer has a first thickness over the semiconductor die and a second thickness less than the first thickness over the encapsulant. A first interconnect structure is formed over the stress relief insulating layer. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The first and second interconnect structures are electrically connected through the conductive pillar.

公开(公告)号：US09721922B2

公开(公告)日：2017-08-01

申请号：US14139614

申请日：2013-12-23

Applicant: STATS ChipPAC, Ltd.

Inventor： Pandi C. Marimuthu ,  Yaojian Lin ,  Won Kyoung Choi ,  Il Kwon Shim

IPC: H01L29/66 ,  H01L25/065 ,  H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L21/56

CPC classification number: H01L25/0652 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/5383 ,  H01L23/5384 ,  H01L23/5385 ,  H01L23/5389 ,  H01L24/97 ,  H01L2224/16225 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/19105 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a first conductive layer including a plurality of conductive traces. The first conductive layer is formed over a substrate. The conductive traces are formed with a narrow pitch. A first semiconductor die and second semiconductor die are disposed over the first conductive layer. A first encapsulant is deposited over the first and second semiconductor die. The substrate is removed. A second encapsulant is deposited over the first encapsulant. A build-up interconnect structure is formed over the first conductive layer and second encapsulant. The build-up interconnect structure includes a second conductive layer. A first passive device is disposed in the first encapsulant. A second passive device is disposed in the second encapsulant. A vertical interconnect unit is disposed in the second encapsulant. A third conductive layer is formed over second encapsulant and electrically connected to the build-up interconnect structure via the vertical interconnect unit.

公开(公告)号：US09721862B2

公开(公告)日：2017-08-01

申请号：US14036525

申请日：2013-09-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Byung Joon Han ,  Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu

IPC: H01L23/31 ,  H01L21/56 ,  H01L23/00

CPC classification number: H01L24/96 ,  H01L21/561 ,  H01L21/568 ,  H01L21/78 ,  H01L23/3114 ,  H01L24/19 ,  H01L24/94 ,  H01L24/97 ,  H01L2224/02166 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05572 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/03

Abstract: A semiconductor device includes a standardized carrier. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. The semiconductor wafer is singulated through a first portion of the base semiconductor material to separate the semiconductor die. The semiconductor die are disposed over the standardized carrier. A size of the standardized carrier is independent from a size of the semiconductor die. An encapsulant is deposited over the standardized carrier and around the semiconductor die. An interconnect structure is formed over the semiconductor die while leaving the encapsulant devoid of the interconnect structure. The semiconductor device is singulated through the encapsulant. Encapsulant remains disposed on a side of the semiconductor die. Alternatively, the semiconductor device is singulated through a second portion of the base semiconductor and through the encapsulant to remove the second portion of the base semiconductor and encapsulant from the side of the semiconductor die.

公开(公告)号：US09701534B2

公开(公告)日：2017-07-11

申请号：US15008347

申请日：2016-01-27

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Il Kwon Shim

IPC: H01L21/44 ,  B81B7/00

CPC classification number: B81B7/007 ,  B81B2201/0257 ,  B81B2207/012 ,  B81B2207/096 ,  H01L2224/48091 ,  H01L2924/15151 ,  H01L2924/00014

Abstract: A microelectromechanical system (MEMS) semiconductor device has a first and second semiconductor die. A first semiconductor die is embedded within an encapsulant together with a modular interconnect unit. Alternatively, the first semiconductor die is embedded within a substrate. A second semiconductor die, such as a MEMS die, is disposed over the first semiconductor die and electrically connected to the first semiconductor die through an interconnect structure. In another embodiment, the first semiconductor die is flip chip mounted to the substrate, and the second semiconductor die is wire bonded to the substrate adjacent to the first semiconductor die. In another embodiment, first and second semiconductor die are embedded in an encapsulant and are electrically connected through a build-up interconnect structure. A lid is disposed over the semiconductor die. In a MEMS microphone embodiment, the lid, substrate, or interconnect structure includes an opening over a surface of the MEMS die.

公开(公告)号：US09508621B2

公开(公告)日：2016-11-29

申请号：US14564427

申请日：2014-12-09

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Il Kwon Shim ,  Seng Guan Chow

IPC: H01L23/31 ,  H01L21/56 ,  H01L21/683 ,  H01L23/16 ,  H01L23/552 ,  H01L23/00

CPC classification number: H01L23/3128 ,  H01L21/56 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/16 ,  H01L23/3121 ,  H01L23/552 ,  H01L24/11 ,  H01L24/19 ,  H01L24/20 ,  H01L24/48 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/20 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19105 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a stress relief buffer mounted to a temporary substrate in locations designated for bump formation. The stress relief buffer can be a multi-layer composite material such as a first compliant layer, a silicon layer formed over the first compliant layer, and a second compliant layer formed over the silicon layer. A semiconductor die is also mounted to the temporary substrate. The stress relief buffer can be thinner than the semiconductor die. An encapsulant is deposited between the semiconductor die and stress relief buffer. The temporary substrate is removed. An interconnect structure is formed over the semiconductor die, encapsulant, and stress relief buffer. The interconnect structure is electrically connected to the semiconductor die. A stiffener layer can be formed over the stress relief buffer and encapsulant. A circuit layer containing active devices, passive devices, conductive layers, and dielectric layers can be formed within the stress relief buffer.

Abstract translation: 半导体器件具有在指定用于凸块形成的位置中安装到临时衬底的应力释放缓冲器。 应力消除缓冲器可以是多层复合材料，例如第一顺应层，在第一柔性层上形成的硅层，以及形成在硅层上的第二柔性层。 半导体管芯也安装在临时衬底上。 应力消除缓冲器可以比半导体管芯更薄。 密封剂沉积在半导体管芯和应力释放缓冲器之间。 移除临时衬底。 在半导体管芯，密封剂和应力释放缓冲器上形成互连结构。 互连结构电连接到半导体管芯。 可以在应力消除缓冲器和密封剂上形成加强层。 可以在应力消除缓冲器内形成包含有源器件，无源器件，导电层和电介质层的电路层。

公开(公告)号：US20160300797A1

公开(公告)日：2016-10-13

申请号：US15089151

申请日：2016-04-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Pandi C. Marimuthu ,  Yaojian Lin

IPC: H01L23/538 ,  H01L21/48 ,  H01L25/10 ,  H01L21/56

CPC classification number: H01L23/5389 ,  H01L21/486 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/5384 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/29 ,  H01L24/32 ,  H01L24/45 ,  H01L24/48 ,  H01L24/73 ,  H01L24/83 ,  H01L24/85 ,  H01L24/92 ,  H01L24/97 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16227 ,  H01L2224/24195 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/2939 ,  H01L2224/32225 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/83 ,  H01L2224/83005 ,  H01L2224/83192 ,  H01L2224/85 ,  H01L2224/85005 ,  H01L2224/92164 ,  H01L2224/92244 ,  H01L2224/92247 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00012 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/32245 ,  H01L2224/48247

Abstract: A semiconductor device comprises a first conductive layer formed on a carrier over an insulating layer. A portion of the insulating layer is removed prior to forming the first conductive layer. A first semiconductor die is disposed over the first conductive layer. A discrete electrical component is disposed over the first conductive layer adjacent to the first semiconductor die. A first encapsulant is deposited over the first conductive layer and first semiconductor layer. A conductive pillar is formed through the first encapsulant between the first conductive layer and second conductive layer. A second encapsulant is deposited around the first encapsulant, first conductive layer, and first semiconductor die. A second conductive layer is formed over the first semiconductor die, first encapsulant, and second encapsulant opposite the first conductive layer. The carrier is removed after forming the second conductive layer. A semiconductor package is mounted to the first conductive layer.

Abstract translation: 半导体器件包括在绝缘层上形成在载体上的第一导电层。 在形成第一导电层之前去除绝缘层的一部分。 第一半导体管芯设置在第一导电层上。 离散的电子部件布置在与第一半导体管芯相邻的第一导电层上。 第一密封剂沉积在第一导电层和第一半导体层上。 在第一导电层和第二导电层之间通过第一密封剂形成导电柱。 围绕第一密封剂，第一导电层和第一半导体管芯沉积第二密封剂。 在第一半导体管芯，第一密封剂和与第一导电层相对的第二密封剂之上形成第二导电层。 在形成第二导电层之后移除载体。 半导体封装被安装到第一导电层。