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    SCANNING ELECTRON MICROSCOPE
    31.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号：US20120145899A1

    公开(公告)日：2012-06-14

    申请号：US13313606

    申请日：2011-12-07

    Applicant: Kenji Matsumoto

    Inventor： Kenji Matsumoto

    IPC: H01J37/28

    CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J2237/162 ,  H01J2237/2006

    Abstract: A seal member to be contacted with an observation object is provided at an open end of a lens barrel so that the observation object can be attracted to the lens barrel via the seal member and fixed in direct and close contact with the lens barrel when a vacuum is created in the lens barrel by a vacuum pump. In other words, instead of providing a sample chamber, the observation object is fixed in close contact with the lens barrel to prevent relative movement therebetween by a suction force even without a sample chamber. In this configuration, the interior of the lens barrel can be maintained in a vacuum state despite the absence of a sample chamber and no adverse effect occurs during observation because the lens barrel and the observation object are not moved relative to each other by vibration.

    Abstract translation: 与观察对象接触的密封构件设置在镜筒的开口端，使得观察对象可以经由密封构件被吸引到镜筒并且当真空直接和紧密接触时被固定在镜筒上 通过真空泵在镜筒中产生。 换句话说，代替提供样品室，观察对象被固定成与透镜筒紧密接触，以防止即使没有样品室也可以通过吸力而相对移动。 在这种构造中，尽管没有样品室，镜筒的内部可以保持在真空状态，并且在观察期间不会发生不利影响，因为透镜镜筒和观察对象不通过振动相对于彼此移动。

    Chamberless substrate handling
    32.
    发明授权
    Chamberless substrate handling 失效
    无腔基板处理

    公开(公告)号：US07550744B1

    公开(公告)日：2009-06-23

    申请号：US11690454

    申请日：2007-03-23

    Applicant: George R. Koch ,  Douglas K. Masnaghetti

    Inventor： George R. Koch ,  Douglas K. Masnaghetti

    IPC: H02K41/00 ,  H01J37/18

    CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/162 ,  H01J2237/2006 ,  H01J2237/2605

    Abstract: without substantially touching the surface, having annular rings forming annular orifices, one of the rings forming an air bearing portion and having passages through which a flow of a gas can be established in a first direction, where the flow of the gas is sufficient to create a cushion of air between the puck and the surface, and at least some of the orifices for drawing vacuums through the orifices in a second direction opposite to the first direction against the surface.

    Abstract translation: 没有基本接触表面，具有形成环形孔的环形环，其中一个环形成空气轴承部分并且具有通道，通过该通道可以沿第一方向建立气体流，其中气体的流动足以产生 在圆盘和表面之间的空气缓冲器，以及用于在与第一方向相反的第二方向上抽吸真空通过孔口的至少一些孔抵靠表面。

    Material processing system and method
    33.
    发明授权
    Material processing system and method 有权
    材料加工系统及方法

    公开(公告)号：US07435973B2

    公开(公告)日：2008-10-14

    申请号：US11499776

    申请日：2006-08-07

    Applicant: Hans W. P. Koops ,  Peter Hoffrogge

    Inventor： Hans W. P. Koops ,  Peter Hoffrogge

    IPC: G21K7/00

    CPC classification number: H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

    Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

    Abstract translation: 提供了一种用于处理工件的材料处理系统。 材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。 辐射优选由电子显微镜提供。 电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。 材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。 气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

    Portable scanning electron microscope
    34.
    发明申请
    Portable scanning electron microscope 审中-公开
    便携式扫描电子显微镜

    公开(公告)号：US20070145267A1

    公开(公告)日：2007-06-28

    申请号：US11450758

    申请日：2006-06-09

    Applicant: David L. Adler ,  Ady Levy ,  Mark A. McCord

    Inventor： David L. Adler ,  Ady Levy ,  Mark A. McCord

    IPC: G21K7/00

    CPC classification number: H01J37/06 ,  H01J37/04 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/04924 ,  H01J2237/06316 ,  H01J2237/162 ,  H01J2237/2813

    Abstract: One embodiment relates to a portable scanning electron microscope (SEM) system. The system includes a portable SEM device including a CRT-type gun and deflectors to generate and scan the electron beam. Another embodiment relates to a portable SEM device which includes a CRT-type gun and deflectors to generate and scan the electron beam, a chamber through which the electron beam is scanned, and a detector in the chamber for detecting radiation emitted as a result of scanning the electron beam. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及便携式扫描电子显微镜（SEM）系统。 该系统包括便携式SEM装置，其包括CRT型枪和用于产生和扫描电子束的偏转器。 另一个实施例涉及一种便携式SEM器件，其包括CRT型枪和用于产生和扫描电子束的偏转器，扫描电子束的腔室和用于检测作为扫描结果发射的辐射的腔室中的检测器 电子束。 另一实施例涉及一种获得便携式SEM装置移动到散装试样的散装试样的表面的电子束图像的方法。 还公开了其它实施例和特征。

    Method and apparatus for cleaning surfaces with plasma
    35.
    发明授权
    Method and apparatus for cleaning surfaces with plasma 失效
    用等离子体清洗表面的方法和设备

    公开(公告)号：US5236512A

    公开(公告)日：1993-08-17

    申请号：US745457

    申请日：1991-08-14

    Applicant: Ernest E. Rogers ,  Blaine A. Frandsen ,  C. Lamont Hislop

    Inventor： Ernest E. Rogers ,  Blaine A. Frandsen ,  C. Lamont Hislop

    IPC: A47L11/00 ,  B08B7/00 ,  C23G5/00 ,  H01J37/32

    CPC classification number: H01J37/32366 ,  A47L11/00 ,  A47L11/4013 ,  A47L11/4036 ,  A47L11/4044 ,  A47L11/405 ,  C23G5/00 ,  H01J37/32082 ,  H01J2237/162

    Abstract: A device is provided for cleaning a surface by introducing a highly reactive gas mixture to the surface. The highly reactive gas mixture may include excited species such as ozone and relate excited ions, atoms, and electrons. The excited gas mixture then oxidizes undesirable materials on the surface. The device includes a structure which defines an enclosed space when placed against the surface to be cleaned. A set of one or more electrodes are positioned within the device such that an electrical discharge across the electrodes excites the selected gases species. The electrodes are attached to a power supply capable of generating a high frequency, high voltage discharge. A tube is provided for transporting selected gases, such as air or oxygen, to the enclosed space. Another tube is provide for removing reaction products from the enclosed space. This tube is place in communication with a source of suction for establishing a flow of gases into and out of the enclosed space.

    Abstract translation: 提供一种用于通过将高反应性气体混合物引入到表面来清洁表面的装置。 高反应性气体混合物可以包括诸如臭氧的激发物质，并且涉及激发的离子，原子和电子。 激发的气体混合物然后氧化表面上不需要的材料。 该装置包括当抵靠待清洁表面放置时限定封闭空间的结构。 一组一个或多个电极定位在装置内，使得穿过电极的放电激发所选择的气体种类。 电极连接到能够产生高频，高压放电的电源。 提供管用于将选择的气体（例如空气或氧气）输送到封闭空间。 提供另一个管用于从封闭空间除去反应产物。 该管与用于建立气体进入和离开封闭空间的抽吸源连通。

    Charged particle beam lithography machine incorporating localized vacuum envelope
    36.
    发明授权
    Charged particle beam lithography machine incorporating localized vacuum envelope 失效
    带有局部真空包络的带电粒子束光刻机

    公开(公告)号：US4607167A

    公开(公告)日：1986-08-19

    申请号：US701439

    申请日：1985-02-12

    Applicant: Paul F. Petric

    Inventor： Paul F. Petric

    IPC: H01J37/301 ,  H01J37/317 ,  H01J37/18 ,  H01J33/02

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J37/3174 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/20

    Abstract: A charged particle beam lithography machine includes a beam source and beam steering and forming elements within an evacuated column. A stage assembly for supporting a semiconductor wafer or mask is positioned in ambient and proximate the exit end of said beam steering and forming elements. A vacuum envelope apparatus is affixed to the exit end of the beam steering and forming elements so that the outer surface or tip of the vacuum envelope apparatus rests in spaced apart, close coupled opposition to the wafer or mask supported on the stage. The vacuum envelope apparatus includes internal structural members which define an internal vacuum processing zone and at least one surrounding intermediate vacuum zone. A graded vacuum seal is formed between the tip of the vacuum envelope and the mask or wafer. The seal extends from the internal vacuum processing zone to the external ambient. Lithographic operations are conducted on the mask or wafer as relative motion between the stage assembly and the beam steering and forming elements is accomplished.

    Abstract translation: 带电粒子束光刻机包括一个射束源和一个抽真空柱内的光束转向和成形元件。 用于支撑半导体晶片或掩模的台架组件被定位在环境中并且靠近所述光束转向和成形元件的出口端。 真空包封装置固定到光束转向和成形元件的出口端，使得真空包封装置的外表面或尖端以与支撑在平台上的晶片或掩模隔开，紧密耦合的方式相对。 真空包封装置包括限定内部真空处理区和至少一个周围的中间真空区的内部结构构件。 在真空外壳的尖端和掩模或晶片之间形成渐变的真空密封。 密封件从内部真空处理区域延伸到外部环境。 在平台组件和光束转向和成形元件之间的相对运动完成时，在掩模或晶片上进行平版印刷操作。

    ARC-PLASMA FILM FORMATION DEVICE
    37.
    发明申请
    ARC-PLASMA FILM FORMATION DEVICE 审中-公开
    ARC等离子体膜形成装置

    公开(公告)号：US20160071702A1

    公开(公告)日：2016-03-10

    申请号：US14773573

    申请日：2013-10-29

    Applicant: Shimadzu Corporation

    Inventor： Masayasu SUZUKI ,  Yosuke MORIMOTO

    IPC: H01J37/32

    CPC classification number: H01J37/32669 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32568 ,  H01J37/32596 ,  H01J37/3266 ,  H01J37/32899 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/06375 ,  H01J2237/152 ,  H01J2237/162 ,  H01J2237/327 ,  H01J2237/3326

    Abstract: An arc-plasma film formation device includes a film formation chamber in which a substrate to be treated is stored, a plasma chamber in which at least a part of a target is stored, the plasma chamber being configured to be connected to the film formation chamber, and a plurality of hollow coils configured to generate a continuous line of magnetic force between the target and the film formation chamber and having at least one curved section, the plurality of hollow coils being arrange in the plasma chamber and covered by an outer coat made of a non-magnetic metal. Plasma containing ions derived from the target material and generated in the plasma chamber as a result of arc discharge is transported from the target to the substrate by passing an inside of the plurality of hollow coils.

    Abstract translation: 电弧等离子体成膜装置包括：成膜室，其中存储有待处理的基板;等离子体室，其中存储有至少一部分靶;等离子体室被配置为连接到成膜室 以及多个中空线圈，其被配置为在所述靶和成膜室之间产生连续的磁力线，并且具有至少一个弯曲部分，所述多个中空线圈布置在所述等离子体室中并被外部涂层覆盖 的非磁性金属。 通过使多个中空线圈的内部通过，从目标材料产生并在等离子体室中产生的由于电弧放电而产生的等离子体从目标物传送到基板。

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