公开(公告)号：US20170316915A1

公开(公告)日：2017-11-02

申请号：US15487561

申请日：2017-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Nobuhiro OKAI ,  Natsuki TSUNO ,  Naomasa SUZUKI ,  Tomoyasu SHOJO

IPC: H01J37/244 ,  H01J37/14 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/14 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/2809

Abstract: Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam optical system that includes an objective lens and emits a charged particle beam emitted from the charged particle source onto the sample, a plurality of detectors which detect secondary particles emitted from the sample when being irradiated with the charged particle beam, and a rotation member which magnetically, electrically, or mechanically changes a detected azimuth angle of the secondary particles emitted from the sample.

公开(公告)号：US09646805B2

公开(公告)日：2017-05-09

申请号：US14533494

申请日：2014-11-05

Applicant: JEOL Ltd.

Inventor： Tomohiro Mihira

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/304 ,  H01J37/21 ,  H01J37/30

CPC classification number: H01J37/304 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/10 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/2448 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: A focused ion beam system is offered which can make a focal adjustment without relying on the structure of a sample while suppressing damage to the sample to a minimum. Also, a method of making this focal adjustment is offered. The focused ion beam system has an ion source for producing an ion beam, a lens system for focusing the beam onto the sample, a detector for detecting secondary electrons emanating from the sample, and a controller for controlling the lens system. The controller is operative to provide control such that the sample is irradiated with the ion beam without scanning the beam and that a focus of the ion beam is varied by varying the intensity of the objective lens during the ion beam irradiation. Also, the controller measures the intensity of a signal indicating secondary electrons emanating from the sample while the intensity of the objective lens is being varied. Furthermore, the controller makes a focal adjustment of the ion beam on the basis of the intensity of the objective lens obtained when the measured intensity of the signal indicating secondary electrons is minimal.

公开(公告)号：US09496116B2

公开(公告)日：2016-11-15

申请号：US14874969

申请日：2015-10-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Holger Doemer ,  Andreas Schmaunz

IPC: H01J37/00 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/023 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/10 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.

Abstract translation: 本文描述的系统确定粒子束装置的部件从物体到粒子束装置的距离，并且设置粒子束装置中部件的位置。 组件相对于位于第二起始位置的物体的方向相对地从组件的第一起始位置移动，直到部件与物体接触。 当组件与对象接触时，确定在移动期间被组件和/或对象覆盖的调整路径。 调整路径沿着将第一起始位置中的部件上的第一点连接到物体上的第二起始位置的直线延伸，该第二起始位置最靠近沿该线路的部件上的第一点布置。 调整路径对应于距离。

公开(公告)号：US09466460B2

公开(公告)日：2016-10-11

申请号：US14891494

申请日：2014-03-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Taku Sakazume ,  Sukehiro Ito

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US20160118216A1

公开(公告)日：2016-04-28

申请号：US14874969

申请日：2015-10-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Holger Doemer ,  Andreas Schmaunz

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/023 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/10 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.

Abstract translation: 本文描述的系统确定粒子束装置的部件从物体到粒子束装置的距离，并且设置粒子束装置中部件的位置。 组件相对于位于第二起始位置的物体的方向相对地从组件的第一起始位置移动，直到部件与物体接触。 当组件与对象接触时，确定在移动期间被组件和/或对象覆盖的调整路径。 调整路径沿着将第一起始位置中的部件上的第一点连接到物体上的第二起始位置的直线延伸，该第二起始位置最靠近沿该线路的部件上的第一点布置。 调整路径对应于距离。

公开(公告)号：US09269527B2

公开(公告)日：2016-02-23

申请号：US14653138

申请日：2014-02-14

Applicant: Lawrence Livermore National Security, LLC

Inventor： Bryan W. Reed ,  William J. DeHope ,  Glenn Huete ,  Thomas B. LaGrange ,  Richard M. Shuttlesworth

IPC: H01J37/075 ,  H01J37/073 ,  H01J37/21 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US09208995B2

公开(公告)日：2015-12-08

申请号：US14379291

申请日：2013-02-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

IPC: G21K5/00 ,  H01J37/28 ,  H01J37/16 ,  H01J37/18 ,  H01J37/09

CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束穿过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

公开(公告)号：US09177758B2

公开(公告)日：2015-11-03

申请号：US14564921

申请日：2014-12-09

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren ,  Chiyan Kuan ,  Yixiang Wang ,  Xiaoli Guo ,  Feng Cao

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/261 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.

Abstract translation: 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。

公开(公告)号：US09040911B2

公开(公告)日：2015-05-26

申请号：US14397079

申请日：2013-03-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Takeshi Ogashiwa ,  Mitsugu Sato ,  Mitsuru Konno

IPC: H01J37/26 ,  H01J37/28 ,  G01N23/225 ,  H01J37/22 ,  H01J37/21

CPC classification number: H01J37/222 ,  H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24507 ,  H01J2237/2802 ,  H01J2237/2804 ,  H01J2237/2805 ,  H01J2237/2826

Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron. The electron beam enters the sample at a predetermined convergence semi-angle, and a lattice image is acquired at a second convergence semi-angle larger than a first convergence semi-angle at which a beam diameter is minimized on the sample.

Abstract translation: 通常，在通用扫描电子显微镜中，可以设定的最大加速电压低，因此在正常高分辨率观察条件下可以观察到的薄晶体样品限于具有大格子间距的样品。 因此，没有准确地执行放大校准的方法。 作为解决该问题的手段，本发明包括产生电子束的电子源，使电子束偏转以使电子束扫描样品的偏转器，将电子束聚焦在样品上的物镜， 检测器，其检测透射通过样品的弹性散射电子和非弹性散射电子;以及孔，设置在样品和检测器之间，以控制弹性散射电子和非弹性散射电子的检测角。 电子束以预定的会聚半角进入样品，并且以比样品上的光束直径最小化的第一会聚半角的第二会聚半角获取晶格图像。

公开(公告)号：US20150129763A1

公开(公告)日：2015-05-14

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。