公开(公告)号：US09558980B2

公开(公告)日：2017-01-31

申请号：US12725508

申请日：2010-03-17

Applicant: William D. Lee ,  Ashwin M. Purohit ,  Marvin R. LaFontaine

Inventor： William D. Lee ,  Ashwin M. Purohit ,  Marvin R. LaFontaine

IPC: H01L21/687 ,  H01L21/683 ,  H01J37/20 ,  H01J37/317 ,  H01L21/67

CPC classification number: H01L21/6831 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/2065 ,  H01J2237/31701 ,  H01L21/67109

Abstract: Aspects of the present invention relate to ion implantation systems that make use of a vapor compression cooling system. In one embodiment, a thermal controller in the vapor compression system sends refrigeration fluid though a compressor and a condenser according to an ideal vapor compression cycle to help limit or prevent undesired heating of a workpiece during implantation, or to actively cool the workpiece.

Abstract translation: 本发明的方面涉及利用蒸气压缩冷却系统的离子注入系统。 在一个实施例中，蒸汽压缩系统中的热控制器根据理想的蒸汽压缩循环通过压缩机和冷凝器发送制冷流体，以帮助限制或防止在植入期间不期望的加热工件，或者主动冷却工件。

公开(公告)号：US09543114B2

公开(公告)日：2017-01-10

申请号：US14819402

申请日：2015-08-05

Applicant: Intevac, Inc.

Inventor： Babak Adibi ,  Vinay Prabhakar ,  Terry Bluck

IPC: G01N23/00 ,  H01J37/20 ,  H01J37/18 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/185 ,  H01J37/3045 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31711

Abstract: System and method to align a substrate under a shadow mask. A substrate holder has alignment mechanism, such as rollers, that is made to abut against an alignment straight edge. The substrate is then aligned with respect to the straight edge and is chucked to the substrate holder. The substrate holder is then transported into a vacuum processing chamber, wherein it is made to abut against a mask straight edge to which the shadow mask is attached and aligned to. Since the substrate was aligned to an alignment straight edge, and since the mask is aligned to the mask straight edge that is precisely aligned to the alignment straight edge, the substrate is perfectly aligned to the mask.

Abstract translation: 将底物对准荫罩的系统和方法。 衬底保持器具有对准机构，例如辊，其抵靠对准直边缘。 然后将衬底相对于直边对准，并被夹持到衬底保持器。 然后将衬底保持器输送到真空处理室中，其中它与邻接荫罩直线边缘抵接，荫罩直线边缘与阴罩对准。 由于衬底与对准直边对准，并且由于掩模与精确地对准直线对准的掩模直边对准，所以基板与掩模完全对准。

公开(公告)号：US20160358761A1

公开(公告)日：2016-12-08

申请号：US15173832

申请日：2016-06-06

Applicant: Watlow Electric Manufacturing Company

Inventor： Boris Atlas ,  Mohammad Nosrati ,  Kevin R. Smith ,  Ken Ames ,  Kevin Ptasienski

IPC: H01J37/32

CPC classification number: H01J37/32724 ,  H01J37/3244 ,  H01J37/32697 ,  H01J37/32715 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67

Abstract: A support pedestal device for an electrostatic chuck includes a base housing defining an internal cavity, and a base insert disposed proximate the internal cavity of the base housing. A fluid pathway is formed in the internal cavity and includes a plurality of linear-parallel cooling channels separated by corresponding plurality of linear-parallel cooling fins, a fluid supply channel, and a fluid return channel. A cooling fluid flows through the fluid supply channel, through the plurality of linear-parallel cooling channels, and back through the fluid return channel to cool the support pedestal device.

Abstract translation: 用于静电卡盘的支撑基座装置包括限定内腔的基座壳体和靠近基座壳体的内腔设置的基座插入件。 流体通道形成在内腔中，并且包括由对应的多个线性平行冷却翅片，流体供应通道和流体返回通道分隔开的多个线性平行冷却通道。 冷却流体流过流体供应通道，通过多个线性平行的冷却通道，并且通过流体返回通道返回以冷却支撑基座装置。

公开(公告)号：US09496116B2

公开(公告)日：2016-11-15

申请号：US14874969

申请日：2015-10-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Holger Doemer ,  Andreas Schmaunz

IPC: H01J37/00 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/023 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/10 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.

Abstract translation: 本文描述的系统确定粒子束装置的部件从物体到粒子束装置的距离，并且设置粒子束装置中部件的位置。 组件相对于位于第二起始位置的物体的方向相对地从组件的第一起始位置移动，直到部件与物体接触。 当组件与对象接触时，确定在移动期间被组件和/或对象覆盖的调整路径。 调整路径沿着将第一起始位置中的部件上的第一点连接到物体上的第二起始位置的直线延伸，该第二起始位置最靠近沿该线路的部件上的第一点布置。 调整路径对应于距离。

公开(公告)号：US09401297B2

公开(公告)日：2016-07-26

申请号：US14626116

申请日：2015-02-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi Ebizuka ,  Seiichiro Kanno ,  Masaya Yasukochi ,  Masakazu Takahashi ,  Naoya Ishigaki ,  Go Miya

IPC: H01J37/20 ,  H01L21/683 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/2007 ,  H01J2237/28

Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.

Abstract translation: 提出了一种静电卡盘机构和带电粒子束装置，其包括作为吸附样品的一侧的平面的第一平面，在第一平面和样品之间产生吸附力的电压为第一电极 以及第二电极，其布置在与所述样品相对分离的位置朝向所述第一平面，并且通过所述第二电极垂直于所述第一平面并接触所述样品的边缘的虚拟线通过，其中所述第一平面形成为 第一平面的平面方向的尺寸小于样品的尺寸。

公开(公告)号：US20160169782A1

公开(公告)日：2016-06-16

申请号：US14958354

申请日：2015-12-03

Applicant: Nikhilesh Chawla ,  James E. Mertens

Inventor： Nikhilesh Chawla ,  James E. Mertens

IPC: G01N1/44 ,  G01R31/12 ,  H01J37/20 ,  G01N23/04 ,  H01J37/28

CPC classification number: G01R31/1218 ,  G01R31/2858 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/2008

Abstract: Systems and fixtures for mounting, under mechanical constraint, wire-like or fiber-like samples of a high aspect ratio and down to 100 micrometers in diameter are disclosed. A region of interest along the length of the sample resides between and beyond a mechanical constraint on either side, allowing access to the region of interest for a wide number of characterization probes. The fixture may provide electrical isolation between two retaining blocks by means of a dielectric support member. The design may achieve minimal thermal expansion along the length of the sample by the material selection for the dielectric support member. Electrical contact may be introduced to the sample through conductive constraints in the retaining blocks. The fixture may have a minimal size perpendicular to the length axis of the sample to facilitate high probe fluxes when a diverging probe is used. The fixture may provide high x-ray transparency between the retaining blocks. The systems and fixtures as described therefore may provide a means for performing electrical and thermal testing on samples, including but not limited to solder butt-joints, across multimodal in situ characterization and imaging techniques to analyze dynamic electromigration.

Abstract translation: 公开了用于在机械约束下安装高纵横比且直径低至100微米的线状或纤维状样品的系统和固定装置。 沿着样品长度的感兴趣区域位于两侧的机械约束之间，并且超过了任何一侧的机械约束，允许进入大量表征探针的感兴趣区域。 固定装置可以通过介电支撑构件在两个保持块之间提供电隔离。 该设计可以通过电介质支撑构件的材料选择来实现沿样品长度的最小热膨胀。 可以通过导电限制在保持块中将电接触引入样品。 夹具可以具有垂直于样品的长度轴线的最小尺寸，以便当使用发散探针时促进高探针通量。 夹具可以在保持块之间提供高X射线透明度。 因此，所描述的系统和夹具可以提供用于对穿过多模式原位表征和成像技术的样品进行电和热测试的装置，包括但不限于焊接对接点，以分析动态电迁移。

公开(公告)号：US20160118216A1

公开(公告)日：2016-04-28

申请号：US14874969

申请日：2015-10-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Holger Doemer ,  Andreas Schmaunz

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/023 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/10 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.

Abstract translation: 本文描述的系统确定粒子束装置的部件从物体到粒子束装置的距离，并且设置粒子束装置中部件的位置。 组件相对于位于第二起始位置的物体的方向相对地从组件的第一起始位置移动，直到部件与物体接触。 当组件与对象接触时，确定在移动期间被组件和/或对象覆盖的调整路径。 调整路径沿着将第一起始位置中的部件上的第一点连接到物体上的第二起始位置的直线延伸，该第二起始位置最靠近沿该线路的部件上的第一点布置。 调整路径对应于距离。

公开(公告)号：US09312097B2

公开(公告)日：2016-04-12

申请号：US14513969

申请日：2014-10-14

Applicant: PROTOCHIPS, INC.

Inventor： David P. Nackashi ,  John Damiano, Jr. ,  Stephen E. Mick ,  Thomas G. Schmelzer ,  Michael Zapata, III

IPC: G21K5/08 ,  H01J37/20 ,  G01N1/28

CPC classification number: H01J37/20 ,  G01N1/28 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/26

Abstract: A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.

Abstract translation: 用于插入电子显微镜的样品支撑装置的新型样品架。 本发明的新型样品保持器为样品支撑装置提供机械支撑，以及对试样或样品支撑装置的电接触。

公开(公告)号：US09293331B2

公开(公告)日：2016-03-22

申请号：US14013604

申请日：2013-08-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yuan-Fu Yang ,  Ping-Fang Chen

IPC: H01L21/265 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01L21/265 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/24405

Abstract: In accordance with some embodiments, an assembly of an ion implanter system is provided. The assembly includes a control unit, a wafer holder and a detecting device. The wafer holder and the detecting device are respectively positioned at two sides of the control unit. The control unit is configured to drive the wafer holder and the detecting device to rotate about at least one rotation axis.

Abstract translation: 根据一些实施例，提供了离子注入机系统的组件。 组件包括控制单元，晶片保持器和检测装置。 晶片保持器和检测装置分别位于控制单元的两侧。 控制单元构造成驱动晶片保持器和检测装置围绕至少一个旋转轴线旋转。

公开(公告)号：US20160071687A1

公开(公告)日：2016-03-10

申请号：US14786446

申请日：2014-04-11

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Miki TSUCHIYA ,  Yasuhira NAGAKUBO ,  Satoshi TOMIMATSU

IPC: H01J37/20 ,  G01N1/42 ,  B25J7/00 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/20 ,  B25J7/00 ,  G01N1/42 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2801 ,  H01J2237/30461 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: The present invention enables a sample to be observed in a clean state directly after preparation of a final observation surface when preparing a sample for observing a material that is sensitive to heat. The present invention is a method of preparing a sample using a charged particle beam device including a microprobe having a cooling mechanism, a first sample holder having a mechanism for retaining a sample in a cooled state, and a stage into which the microprobe and the first sample holder can be introduced, the method including cutting a bulk-shaped sample piece from the sample on the first sample holder retained in a cooled state; adhering the sample piece to a distal end of the microprobe that is cooled to a fixed temperature and transferring the sample piece to a second sample holder for thin film observation retained in a cooled state, which is different from the first sample holder, within a vacuum chamber of the charged particle beam device; separating the sample piece that has been transferred to the second sample holder from the microprobe and thin film processing the sample piece to a thickness that is less than the thickness during cutting; and observing the sample piece after the thin film processing.

Abstract translation: 本发明使得在制备用于观察对热敏感的材料的样品时，在制备最终观察表面之后，可以直接在清洁状态下观察样品。 本发明是一种使用带电粒子束装置制备样品的方法，所述带电粒子束装置包括具有冷却机构的微探针，具有用于将样品保持在冷却状态的机构的第一样品保持器和所述微探针和第一 可以引入样品保持器，该方法包括从保持在冷却状态的第一样品保持器上的样品切割块状样品; 将样品块粘附到被冷却到固定温度的微探针的远端，并将样品片转移到第二样品保持器以进行薄膜观察，在与真空中的第一样品保持器不同的冷却状态下保持 带电粒子束装置的腔室; 将从所述微探针转移到所述第二样品保持器的样品片和将所述样品片处理的薄膜分离成小于切割时的厚度的厚度; 并在薄膜处理后观察样品。