Spin chuck for thin wafer cleaning
    61.
    发明授权
    Spin chuck for thin wafer cleaning 有权
    旋转夹头用于薄晶圆清洗

    公开(公告)号:US09153462B2

    公开(公告)日:2015-10-06

    申请号:US12964097

    申请日:2010-12-09

    CPC classification number: H01L21/67051 H01L21/68728

    Abstract: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

    Abstract translation: 公开了用于薄晶片清洁的装置和系统。 优选实施例包括具有至少三个保持夹具的旋转卡盘。 具有晶片框架的薄晶片通过带层安装在旋转卡盘上。 当保持夹具解锁时,不会干扰晶片框架的移除和放置。 另一方面,当保持夹具被锁定时,保持夹具与晶片框架的外边缘接触,以防止晶片框架横向移动。 此外,保持夹具处于锁定位置的形状能够防止晶片框架垂直移动。

    Plating process and structure
    68.
    发明授权
    Plating process and structure 有权
    电镀工艺和结构

    公开(公告)号:US08759118B2

    公开(公告)日:2014-06-24

    申请号:US13297845

    申请日:2011-11-16

    CPC classification number: H01L22/32

    Abstract: A system and method for plating a contact is provided. An embodiment comprises forming protective layers over a contact and a test pad, and then selectively removing the protective layer over the contact without removing the protective layer over the test pad. With the protective layer still on the test pad, a conductive layer may be plated onto the contact without plating it onto the test pad. After the contact has been plated, the protective layer over the contact may be removed.

    Abstract translation: 提供了一种用于电镀触点的系统和方法。 一个实施例包括在触点和测试垫上形成保护层,然后在触头上选择性地去除保护层,而不需要在测试垫上移除保护层。 在保护层仍在测试焊盘上的情况下,可以将导电层电镀到触点上,而不将其覆盖在测试焊盘上。 接触电镀后,触点上的保护层可以被去除。

    Controlling defects in thin wafer handling
    69.
    发明授权
    Controlling defects in thin wafer handling 有权
    控制薄晶片处理中的缺陷

    公开(公告)号:US08722540B2

    公开(公告)日:2014-05-13

    申请号:US12841874

    申请日:2010-07-22

    CPC classification number: H01L21/6835 H01L2221/68327 H01L2221/6834

    Abstract: A method includes bonding a wafer on a carrier through an adhesive, and performing a thinning process on the wafer. After the step of performing the thinning process, a portion of the adhesive not covered by the wafer is removed, while the portion of the adhesive covered by the wafer is not removed.

    Abstract translation: 一种方法包括通过粘合剂将晶片接合在载体上,并在晶片上进行稀化处理。 在进行稀化处理的步骤之后,去除未被晶片覆盖的粘合剂的一部分,同时由晶片覆盖的粘合剂部分未被除去。

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