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公开(公告)号：US20190221911A1
公开(公告)日：2019-07-18
申请号：US16167217
申请日：2018-10-22
申请人： Microfabrica Inc.
发明人： Elliott R. Brown , John D. Evans , Christopher A. Bang , Adam L. Cohen , Michael S. Lockard , Dennis R. Smalley , Morton Grosser
摘要： RF and microwave radiation directing or controlling components are provided that may be monolithic, that may be formed from a plurality of electrodeposition operations and/or from a plurality of deposited layers of material, that may include switches, inductors, antennae, transmission lines, filters, hybrid couplers, antenna arrays and/or other active or passive components. Components may include non-radiation-entry and non-radiation-exit channels that are useful in separating sacrificial materials from structural materials. Preferred formation processes use electrochemical fabrication techniques (e.g. including selective depositions, bulk depositions, etching operations and planarization operations) and post-deposition processes (e.g. selective etching operations and/or back filling operations).
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公开(公告)号：US20190218680A1
公开(公告)日：2019-07-18
申请号：US16182989
申请日：2018-11-07
申请人： Microfabrica Inc.
CPC分类号： C25D1/003 , B32B15/01 , B33Y10/00 , B33Y40/00 , B33Y70/00 , B33Y80/00 , C25D1/08 , C25D5/022 , C25D5/48 , C25D7/005
摘要： A counterfeiting deterrent device according to one implementation of the disclosure includes a plurality of layers formed by an additive process. Each of the layers may have a thickness of less than 100 microns. At least one of the layers has a series of indentations formed in an outer edge of the layer such that the indentations can be observed to verify that the device originated from a predetermined source. According to another implementation, a counterfeiting deterrent device includes at least one raised layer having outer edges in the shape of a logo. A light source is configured and arranged to shine a light through a slit in a substrate layer of the device and past an intermediate layer to light up the outer edge of the raised layer. The layers of the device are formed by an additive process and have a thickness of less than 100 microns each.
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公开(公告)号：US20180241112A1
公开(公告)日：2018-08-23
申请号：US15887921
申请日：2018-02-02
申请人： Microfabrica Inc.
发明人： Elliott R. Brown , John D. Evans , Christopher A. Bang , Adam L. Cohen , Michael S. Lockard , Dennis R. Smalley , Morton Grosser
摘要： RF and microwave radiation directing or controlling components are provided that may be monolithic, that may be formed from a plurality of electrodeposition operations and/or from a plurality of deposited layers of material, that may include switches, inductors, antennae, transmission lines, filters, hybrid couplers, antenna arrays and/or other active or passive components. Components may include non-radiation-entry and non-radiation-exit channels that are useful in separating sacrificial materials from structural materials. Preferred formation processes use electrochemical fabrication techniques (e.g. including selective depositions, bulk depositions, etching operations and planarization operations) and post-deposition processes (e.g. selective etching operations and/or back filling operations).
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公开(公告)号：US20170260636A1
公开(公告)日：2017-09-14
申请号：US15389149
申请日：2016-12-22
申请人： Microfabrica Inc.
IPC分类号： C25D1/00
CPC分类号： C25D1/003 , B32B15/01 , B33Y10/00 , B33Y40/00 , B33Y70/00 , B33Y80/00 , C25D1/08 , C25D5/022 , C25D5/48 , C25D7/005
摘要： A counterfeiting deterrent device according to one implementation of the disclosure includes a plurality of layers formed by an additive process. Each of the layers may have a thickness of less than 100 microns. At least one of the layers has a series of indentations formed in an outer edge of the layer such that the indentations can be observed to verify that the device originated from a predetermined source. According to another implementation, a counterfeiting deterrent device includes at least one raised layer having outer edges in the shape of a logo. A light source is configured and arranged to shine a light through a slit in a substrate layer of the device and past an intermediate layer to light up the outer edge of the raised layer. The layers of the device are formed by an additive process and have a thickness of less than 100 microns each.
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公开(公告)号：US09752247B2
公开(公告)日：2017-09-05
申请号：US14017510
申请日：2013-09-04
发明人： Adam L. Cohen
IPC分类号： B81C1/00 , C25D5/10 , B33Y10/00 , C25D1/00 , C25D5/02 , C25D5/12 , H01L21/288 , H05K3/24 , C25D5/22
CPC分类号： C25D5/10 , B33Y10/00 , B33Y70/00 , B81C1/00126 , B81C2201/0181 , B81C2201/0197 , B81C2201/032 , C25D1/00 , C25D1/003 , C25D5/022 , C25D5/12 , C25D5/22 , C25D17/06 , H01L21/2885 , H05K3/241 , Y10T428/12486 , Y10T428/239
摘要： An electroplating method that includes: a) contacting a first substrate with a first article, which includes a substrate and a conformable mask disposed in a pattern on the substrate; b) electroplating a first metal from a source of metal ions onto the first substrate in a first pattern, the first pattern corresponding to the complement of the conformable mask pattern; and c) removing the first article from the first substrate, is disclosed. Electroplating articles and electroplating apparatus are also disclosed.
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公开(公告)号：US09658111B2
公开(公告)日：2017-05-23
申请号：US14709383
申请日：2015-05-11
申请人： FLIR Systems, Inc.
发明人： Eric A. Kurth , Patrick Franklin
摘要： Systems and methods are directed to contacts for an infrared detector. For example, an infrared imaging device includes a substrate having a first metal layer and an infrared detector array coupled to the substrate via a plurality of contacts. Each contact includes for an embodiment a plurality of metal studs each having a first end and a second end and each disposed between the first metal layer and a second metal layer, wherein the first end of each metal stud is disposed on a portion of the first metal layer that is at least partially on the surface of the substrate.
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公开(公告)号：US20170092957A1
公开(公告)日：2017-03-30
申请号：US15374251
申请日：2016-12-09
发明人： Kazuki OKUNO , Masahiro KATO , Masatoshi MAJIMA , Tomoyuki AWAZU , Hidetoshi SAITO , Junichi NISHIMURA , Keiji SHIRAISHI , Hitoshi TSUCHIDA , Kengo TSUKAMOTO
IPC分类号： H01M4/80 , C25D1/08 , C25D3/56 , C25D5/50 , C25D3/30 , H01G11/70 , C22F1/10 , H01M4/86 , H01M4/66 , H01M4/04 , H01G11/68 , C25D1/00 , C22C19/03
CPC分类号： H01M4/80 , B22F3/1137 , B22F2998/10 , B32B15/01 , C22C1/00 , C22C1/0433 , C22C19/03 , C22F1/10 , C23C10/28 , C23C30/00 , C23F17/00 , C25D1/003 , C25D1/08 , C25D3/30 , C25D3/562 , C25D5/48 , C25D5/50 , C25D5/505 , H01G11/68 , H01G11/70 , H01M4/0452 , H01M4/0469 , H01M4/661 , H01M4/662 , H01M4/667 , H01M4/8621 , H01M4/8657 , H01M8/0232 , H01M8/0245 , H01M10/0525 , Y02P70/56 , B22F2003/248
摘要： Provided are a porous metal body that is excellent in terms of corrosion resistance and that is suitable for a collector for batteries such as lithium-ion batteries, capacitors, or fuel cells; and methods for producing the porous metal body. A production method includes a step of coating a porous nickel body with an alloy containing at least nickel and tungsten or a metal containing at least tin; and a subsequent step of a heat treatment. Another production method includes a step of forming a nickel-plated layer on a porous base and then continuously forming an alloy-plated layer containing at least nickel and tungsten or tin, a step of removing the porous base, and a step of reducing metal. Such a method can provide a porous metal body in which tungsten or tin is diffused in a porous nickel body or a nickel-plated layer.
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公开(公告)号：US20170044680A1
公开(公告)日：2017-02-16
申请号：US15235460
申请日：2016-08-12
发明人： MURALI SUNDARAM
IPC分类号： C25D1/00 , C25D3/12 , C25D3/38 , B33Y70/00 , C25D21/12 , C25D17/00 , B33Y10/00 , B33Y30/00 , C25D1/20 , C25D3/46
CPC分类号： C25D1/003 , B33Y10/00 , B33Y30/00 , B33Y70/00 , C25D1/00 , C25D3/12 , C25D3/38 , C25D3/46 , C25D21/12
摘要： A method of electrolytic additive manufacturing provides 3-D parts. The method can be used to form parts from particulate material in an electrolytic bath. Metal is electrolytically deposited, binding the particles. Layers of the particles are built up to form the parts. The same process can be used to form parts without the particulate material. Layers of metal are electrolytically deposited in the electrolyte bath to form the parts.
摘要翻译： 电解添加剂制造方法提供3-D部件。 该方法可用于在电解浴中从颗粒材料形成部件。 金属电解沉积，结合颗粒。 颗粒层被构建成部分。 可以使用相同的方法来形成没有颗粒材料的部件。 电解液中的金属层被电沉积在电解槽中以形成部件。
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89.发明申请Curved Grating Structure Manufacturing Method, Curved Grating Structure, Grating Unit, And X-Ray Imaging Device 有权曲线光栅结构制造方法，曲线光栅结构，光栅单元和X射线成像装置公开(公告)号：US20160265125A1
公开(公告)日：2016-09-15
申请号：US15031598
申请日：2014-10-02
申请人： KONICA MINOLTA, INC.
发明人： Mitsuru YOKOYAMA
CPC分类号： C25D1/00 , A61B6/00 , A61B6/06 , A61B6/40 , A61B6/484 , C25D1/003 , C25D5/02 , C25D5/10 , C25D5/48 , C25D7/00 , C25D7/12 , G01N23/205 , G01T7/00 , G02B5/18 , G02B5/1838 , G02B5/1857 , G21K1/06 , G21K2207/005
摘要： In one aspect, the present invention provides a curved grating structure manufacturing method which comprises: a grating forming step of forming, in one surface of a grating-forming workpiece, a grating region in which a plurality of members mutually having the same shape are periodically provided; a stress layer forming step of forming a stress layer capable of generating stress, on a grating plane-defining surface of the grating region; a boding step of bonding a support substrate to the stress layer; a polishing step of polishing the other surface of the grating-forming workpiece on a side opposite to the one surface having the support substrate bonded thereto; and a peeling step of peeling off the support substrate from the stress layer, wherein the polishing step includes performing the polishing to allow the grating-forming workpiece to be curved by a stress arising from the stress layer, after the peeling step.
摘要翻译： 一方面，本发明提供了一种弯曲光栅结构的制造方法，其特征在于，包括：光栅形成工序，在光栅形成工件的一个面上形成光栅区域，在该光栅区域中，相互具有相同形状的多个部件周期性地形成 提供; 在光栅区域的光栅平面限定表面上形成能够产生应力的应力层的应力层形成步骤; 将支撑基板接合到应力层的焊接步骤; 抛光步骤，在与形成有所述支撑基板的所述一个表面相对的一侧上研磨所述光栅形成工件的另一表面; 以及从所述应力层剥离所述支撑基板的剥离步骤，其中，所述研磨步骤包括进行所述抛光，以在所述剥离步骤之后，通过由所述应力层产生的应力使所述光栅形成工件弯曲。
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90.发明授权公开(公告)号：US09410261B2
公开(公告)日：2016-08-09
申请号：US14528028
申请日：2014-10-30
申请人： GLOBALFOUNDRIES INC.
发明人： Gareth G. Hougham , Gerard McVicker , Anna Pratt
CPC分类号： C25D17/12 , C25D1/003 , C25D5/022 , C25D13/00 , G03F7/0037 , G03F7/2022 , G03F7/203 , Y10T428/24562
摘要： A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative electrophoretic photoresist that laterally surround the plurality of protruding disposable template portions. The negative electrophoretic photoresist is lithographically exposed employing the silo structure and a first lithographic mask, which includes a transparent substrate with isolated opaque patterns thereupon. After removal of the silo structure, the negative electrophoretic photoresist is lithographically exposed employing a second lithographic mask, which includes a pattern of transparent areas overlying the planar portions of the negative electrophoretic photoresist less the areas for bases of metal structure to be subsequently formed by electroplating. The negative electrophoretic photoresist is developed to form cavities therein, and metal structures are formed by electroplating within the cavities. The negative electrophoretic photoresist and the plurality of protruding disposable template portions can be subsequently removed.
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