Back side coating of semiconductor wafers
    7.
    发明授权
    Back side coating of semiconductor wafers 有权
    半导体晶片的背面涂层

    公开(公告)号:US06734532B2

    公开(公告)日:2004-05-11

    申请号:US10006576

    申请日:2001-12-06

    IPC分类号: H01L2358

    摘要: A semiconductor device comprising a semiconductor chip having an active and a passive surface; the active surface includes an integrated circuit and input/output pads suitable for metallurgical contacts. Further, the device has a protective plastic film (polyimide, epoxy resin, or silicone) of controlled and uniform thickness (20 to 60 &mgr;m) selectively attached to the passive surface. The film is suitable to absorb light of visible and ultraviolet wavelengths, to remain insensitive to moisture absorption, and to exert thermomechanical stress on the chip such that this stress at least partially neutralizes the stress exerted by an outside part after chip assembly.

    摘要翻译: 一种半导体器件,包括具有有源和无源表面的半导体芯片; 主动表面包括集成电路和适用于冶金接触的输入/输出焊盘。 此外,该装置具有选择性地连接到被动表面的受控均匀厚度(20至60μm)的保护性塑料膜(聚酰亚胺,环氧树脂或硅树脂)。 该膜适于吸收可见光和紫外线波长的光,对吸湿不敏感,并在芯片上施加热机械应力,使得该应力至少部分地中和芯片组装后由外部部分施加的应力。