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    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
    2.
    发明申请
    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开
    基板处理装置和基板处理方法

    公开(公告)号：US20080220621A1

    公开(公告)日：2008-09-11

    申请号：US12115308

    申请日：2008-05-05

    申请人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

    发明人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

    IPC分类号： H01L21/00

    CPC分类号： G03F7/7075 ,  G03F7/70808 ,  G03F7/70991 ,  G03F9/7003 ,  G03F9/7011 ,  H01L21/67017 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67748 ,  H01L21/68 ,  H01L21/681

    摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.

    摘要翻译： 处理基板的基板处理装置具有界面部，基板装载部，减压气体输送室，曝光处理室。 接口部分具有能够将处理中的基板自由地装载和卸载到设备中的输送机构，反之亦然。 处理后的基板可以通过界面部分的输送机构沿一个方向装载和卸载基板装载/卸载部分。 减压气氛输送室与基板装载/卸载部的方向相邻且垂直的方向配置，具有在减压气氛下处理基板的输送机构。 暴露处理室与减压气体输送室的方向相邻且平行地配置，对被处理基板进行曝光处理。

    Thin-film deposition apparatus
    4.
    发明授权
    Thin-film deposition apparatus 失效
    薄膜沉积装置

    公开(公告)号：US06176929B1

    公开(公告)日：2001-01-23

    申请号：US09118177

    申请日：1998-07-17

    申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

    发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

    IPC分类号： C23C1600

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/4557 ,  C23C16/45591 ,  C23C16/46

    摘要： A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. The apparatus comprises a vacuum-tight deposition chamber enclosing a substrate holding device for holding a substrate. An elevator device for moving the substrate holding device and a gas showering head for flowing a film forming gas towards the substrate are provided. A transport opening and an exhaust opening are provided on a wall section of the deposition chamber at a height corresponding to the transport position and the deposition position, respectively. The deposition chamber is provided with a flow guiding member, and the flow guiding member comprises a cylindrical member to surround an elevating path of the substrate holding device and a first ring member to vertically divide a chamber space at a height between the exhaust opening and the transport opening.

    摘要翻译： 紧凑的薄膜沉积装置可以促进质量均匀的高质量薄膜产品的稳定生长。 该装置包括一个真空密封的沉积室，其包围用于保持基板的基板保持装置。 提供了一种用于移动基板保持装置的电梯装置和用于使成膜气体朝向基板流动的气体淋浴头。 输送开口和排气口分别设置在沉积室的壁部分上，其高度分别对应于输送位置和沉积位置。 沉积室设置有导流构件，并且流动引导构件包括圆筒构件以包围基板保持装置的升降路径和第一环构件，以在排气口和排气口之间的高度垂直分隔腔室空间 运输开放。

    ELECTRO-OPTICAL INSPECTION APPARATUS AND METHOD WITH DUST OR PARTICLE COLLECTION FUNCTION
    5.
    发明申请
    ELECTRO-OPTICAL INSPECTION APPARATUS AND METHOD WITH DUST OR PARTICLE COLLECTION FUNCTION 有权
    电光检测装置和方法与尘埃或颗粒收集功能

    公开(公告)号：US20120074316A1

    公开(公告)日：2012-03-29

    申请号：US13195927

    申请日：2011-08-02

    申请人： Kenji WATANABE ,  Masahiro HATAKEYAMA ,  Yoshihiko NAITO ,  Tatsuya KOHAMA ,  Kenji TERAO ,  Takeshi MURAKAMI ,  Takehide HAYASHI ,  Kiwamu TSUKAMOTO ,  Hiroshi SOBUKAWA ,  Norio KIMURA

    发明人： Kenji WATANABE ,  Masahiro HATAKEYAMA ,  Yoshihiko NAITO ,  Tatsuya KOHAMA ,  Kenji TERAO ,  Takeshi MURAKAMI ,  Takehide HAYASHI ,  Kiwamu TSUKAMOTO ,  Hiroshi SOBUKAWA ,  Norio KIMURA

    IPC分类号： G01N23/20 ,  G01N23/00

    CPC分类号： H01J37/22 ,  H01J37/265 ,  H01J37/29 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2817

    摘要： An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied. In addition, adhesion of dust or particles can be further reduced by disposing a gap control plate (124) having a through hole (124a) at the center above the sample (200) and the dust collecting electrode (122).

    摘要翻译： 提供一种电光检查装置，其能够尽可能地防止灰尘或颗粒附着到样品表面。 将其上放置有样品（200）的载物台（100）设置在能够抽真空的真空室（112）的内部，并且设置集尘电极（122）以包围样品（200）的周围， 。 集尘电极（122）施加与施加到样品（200）的电压相同极性的电压和与电压的绝对值相同或更大的绝对值。 因此，由于灰尘或颗粒例如颗粒附着在集尘电极122上，所以可以降低灰尘或颗粒对样品表面的粘附。 代替使用集尘电极，可以在包含载物台的真空室的壁上形成凹部，或者在壁上配置具有施加了预定电压的网状结构的金属板。 此外，通过在样品（200）上方的中心和集尘电极（122）设置具有通孔（124a）的间隙控制板（124），可以进一步减少灰尘或颗粒的附着。

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    6.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 审中-公开
    基板处理装置和基板处理方法

    公开(公告)号：US20070092646A1

    公开(公告)日：2007-04-26

    申请号：US11614310

    申请日：2006-12-21

    申请人： Hiroyuki SHINOZAKI ,  Yasushi KOJIMA ,  Shunichi AIYOSHIZAWA ,  Kiwamu TSUKAMOTO

    发明人： Hiroyuki SHINOZAKI ,  Yasushi KOJIMA ,  Shunichi AIYOSHIZAWA ,  Kiwamu TSUKAMOTO

    IPC分类号： C23C16/00

    CPC分类号： G03F7/7075 ,  G03F7/70808 ,  G03F7/70991 ,  G03F9/7003 ,  G03F9/7011 ,  H01L21/67017 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67748 ,  H01L21/68 ,  H01L21/681

    摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.

    摘要翻译： 处理基板的基板处理装置具有界面部，基板装载部，减压气体输送室，曝光处理室。 接口部分具有能够将处理中的基板自由地装载和卸载到设备中的输送机构，反之亦然。 处理后的基板可以通过界面部分的输送机构沿一个方向装载和卸载基板装载/卸载部分。 减压气氛输送室与基板装载/卸载部的方向相邻且垂直的方向配置，具有在减压气氛下处理基板的输送机构。 暴露处理室与减压气体输送室的方向相邻且平行地配置，对被处理基板进行曝光处理。

    Valving device
    7.
    发明授权
    Valving device 失效
    阀门装置

    公开(公告)号：US6116267A

    公开(公告)日：2000-09-12

    申请号：US172146

    申请日：1998-10-14

    申请人： Hidenao Suzuki ,  Kuniaki Horie ,  Kiwamu Tsukamoto ,  Yuji Araki

    发明人： Hidenao Suzuki ,  Kuniaki Horie ,  Kiwamu Tsukamoto ,  Yuji Araki

    IPC分类号： F16K7/17 ,  F16K41/10 ,  F16K41/12 ,  F16K49/00

    CPC分类号： F16K41/12 ,  F16K41/10 ,  F16K49/005 ,  Y10T137/6579

    摘要： A valving device can operate stably to provide switching or flow rate control operations, even when it is used for controlling thermodynamically unstable gases. The valving device including a valve casing having an internal passage for process fluids. A valve body is movable against a valve seat for adjusting opening of the internal passage, and a valve driving mechanism can drive the valve body. A flexible member is provided for separating a fluid handling space including the internal passage from a valve mechanism space for housing the valve driving mechanism. A thermal medium space is formed within the valve mechanism space for receiving a thermal medium for providing heat to the valve body.

    摘要翻译： 即使用于控制热力学不稳定的气体，阀门装置也可以稳定运行，以提供切换或流量控制操作。 阀装置包括具有用于处理流体的内部通道的阀壳体。 阀体可以抵靠阀座移动，用于调节内部通道的开口，阀驱动机构可以驱动阀体。 提供了一种柔性构件，用于将包括内部通道的流体处理空间与用于容纳阀驱动机构的阀机构空间分离。 在阀机构空间内形成有热介质空间，用于接收用于向阀体提供热量的热介质。