Laser alignment system
    1.
    发明授权
    Laser alignment system 失效
    激光对准系统

    公开(公告)号:US4532014A

    公开(公告)日:1985-07-30

    申请号:US670235

    申请日:1984-11-13

    摘要: The present invention relates to a system for aligning a plurality of rollers in a metal or metal alloy foil production line. The alignment system comprises a reference frame having a longitudinal dimension parallel to the direction of foil travel through the production line and an optical alignment system movably mounted to the frame. The optical alignment system comprises a laser beam generator, beam splitters and a mirror for generating an orthogonal reference frame for aligning each foil contacting roller in the production line.

    摘要翻译: 本发明涉及一种用于对准金属或金属合金箔生产线中的多个辊的系统。 对准系统包括参考框架,其具有平行于通过生产线的箔片行进方向的纵向尺寸和可移动地安装到框架的光学对准系统。 光学对准系统包括激光束发生器,分束器和用于产生用于对准生产线中的每个箔接触辊的正交参考系的反射镜。

    Systems for producing electroplated and/or treated metal foil
    2.
    发明授权
    Systems for producing electroplated and/or treated metal foil 失效
    用于生产电镀和/或处理的金属箔的系统

    公开(公告)号:US4549950A

    公开(公告)日:1985-10-29

    申请号:US670232

    申请日:1984-11-13

    摘要: The present invention relates to a system and a process for producing improved quality electrodeposited and/or treated metal or metal alloy foil to be used in electrical and electronic applications. The quality of the foil being produced and/or treated by the system is improved by providing each treatment tank in the system with a dual filtration system. The dual filtration system for each tank comprises a filter conditioning loop for substantially continuously withdrawing solution from the tank and removing particulate matter from the withdrawn solution and a system for removing surface impurities from the solution. In a first embodiment, the surface impurities removing system comprises an off-line solution filtration and replenishment system. In a second embodiment, the surface impurities removing system comprises a skimmer floating on the surface of the solution. The present invention has particular utility in systems for producing electrodeposited and/or treated copper foils.

    摘要翻译: 本发明涉及用于生产用于电气和电子应用的改进质量的电沉积和/或处理的金属或金属合金箔的系统和方法。 通过向系统中的每个处理槽提供双过滤系统来改善由系统生产和/或处理的箔的质量。 用于每个罐的双过滤系统包括过滤器调节回路,用于基本上连续地从罐中取出溶液并从排出的溶液中除去颗粒物质,以及用于从溶液中除去表面杂质的系统。 在第一实施例中,表面杂质去除系统包括离线溶液过滤和补充系统。 在第二实施例中,表面杂质去除系统包括浮在溶液表面上的撇渣器。 本发明在用于生产电沉积和/或处理的铜箔的系统中具有特别的用途。

    Process for producing electroplated and/or treated metal foil
    3.
    发明授权
    Process for producing electroplated and/or treated metal foil 失效
    用于生产电镀和/或处理的金属箔的方法

    公开(公告)号:US4568431A

    公开(公告)日:1986-02-04

    申请号:US748104

    申请日:1985-06-24

    摘要: The present invention relates to a system and a process for producing improved quality electrodeposited and/or treated metal or metal alloy foil to be used in electrical and electronic applications. The quality of the foil being produced and/or treated by the system is improved by providing each treatment tank in the system with a dual filtration system. The dual filtration system for each tank comprises a filter conditioning loop for substantially continuously withdrawing solution from the tank and removing particulate matter from the withdrawn solution and a system for removing surface impurities from the solution. In a first embodiment, the surface impurities removing system comprises an off-line solution filtration and replenishment system. In a second embodiment, the surface impurities removing system comprises a skimmer floating on the surface of the solution. The present invention has particular utility in systems for producing electrodeposited and/or treated copper foils.

    摘要翻译: 本发明涉及用于生产用于电气和电子应用的改进质量的电沉积和/或处理的金属或金属合金箔的系统和方法。 通过向系统中的每个处理槽提供双过滤系统来改善由系统生产和/或处理的箔的质量。 用于每个罐的双过滤系统包括过滤器调节回路,用于基本上连续地从罐中取出溶液并从排出的溶液中除去颗粒物质,以及用于从溶液中除去表面杂质的系统。 在第一实施例中,表面杂质去除系统包括离线溶液过滤和补充系统。 在第二实施例中,表面杂质去除系统包括浮在溶液表面上的撇渣器。 本发明在用于生产电沉积和/或处理的铜箔的系统中具有特别的用途。

    Copper stainproofing technique
    4.
    发明授权
    Copper stainproofing technique 失效
    铜防污技术

    公开(公告)号:US4647315A

    公开(公告)日:1987-03-03

    申请号:US750573

    申请日:1985-07-01

    摘要: The present invention relates to a technique for improving the tarnish and oxidation resistance of copper and copper base alloy materials. The technique of the present invention involves immersing the copper or copper base alloy material in a dilute aqueous chromic acid-phosphoric acid solution. After emerging from the chromic acid-phosphoric acid solution, the copper or copper base alloy material is preferably rinsed with a dilute aqueous caustic solution and dried. Copper and copper base alloy materials treated in accordance with the present invention have particular utility in printed circuit applications.

    摘要翻译: 本发明涉及一种提高铜和铜基合金材料的抗褪色和抗氧化性能的技术。 本发明的技术包括将铜或铜基合金材料浸入稀酸铬酸 - 磷酸水溶液中。 在从铬酸 - 磷酸溶液中出来之后,铜或铜基合金材料优选用稀的苛性碱水溶液冲洗并干燥。 根据本发明处理的铜和铜基合金材料在印刷电路应用中具有特殊的用途。

    Electrochemical surface preparation for improving the adhesive
properties of metallic surfaces
    5.
    发明授权
    Electrochemical surface preparation for improving the adhesive properties of metallic surfaces 失效
    用于改善金属表面的粘合性能的电化学表面处理

    公开(公告)号:US4549941A

    公开(公告)日:1985-10-29

    申请号:US670236

    申请日:1984-11-13

    摘要: The present invention relates to a treatment for improving the adhesive properties of metallic foils to be used in electrical and electronic applications. The treatment of the present invention comprises applying a light substantially uniform layer of metal to at least one surface of the metallic foil just prior to the formation of a plurality of dendritic structures on the surface. The metal layer renders the surface or surfaces to be treated more uniformly electrochemically active and consequently more receptive to the subsequent dendritic treatment. The treatment of the present invention has particular utility in improving the adhesive properties of wrought copper and copper alloy foils. An apparatus for performing the present treatment is also described.

    摘要翻译: 本发明涉及一种用于改善用于电气和电子应用的金属箔的粘合性能的处理。 本发明的处理包括在表面上形成多个树枝状结构之前,在金属箔的至少一个表面上施加光基本均匀的金属层。 金属层使待处理的表面或表面更均匀地具有电化学活性,因此更容易接受后续的树枝状处理。 本发明的处理在提高锻铜和铜合金箔的粘合性方面具有特别的用途。 还描述了用于执行本处理的装置。