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公开(公告)号:US20070232023A1
公开(公告)日:2007-10-04
申请号:US11758386
申请日:2007-06-05
申请人: Qin-Yi Tong , Paul Enquist , Anthony Rose
发明人: Qin-Yi Tong , Paul Enquist , Anthony Rose
IPC分类号: H01L21/46
CPC分类号: H01L21/76251 , B23K20/02 , H01L21/481 , H01L24/09 , H01L24/11 , H01L24/12 , H01L24/16 , H01L24/28 , H01L24/32 , H01L24/73 , H01L24/81 , H01L24/83 , H01L24/89 , H01L24/90 , H01L25/50 , H01L2224/05568 , H01L2224/05573 , H01L2224/13011 , H01L2224/13099 , H01L2224/13109 , H01L2224/13144 , H01L2224/13147 , H01L2224/32145 , H01L2224/80801 , H01L2224/81011 , H01L2224/81013 , H01L2224/81014 , H01L2224/81136 , H01L2224/81143 , H01L2224/81193 , H01L2224/81208 , H01L2224/8121 , H01L2224/81801 , H01L2224/81815 , H01L2224/8183 , H01L2224/81894 , H01L2224/83095 , H01L2224/8319 , H01L2224/8334 , H01L2224/83801 , H01L2224/8383 , H01L2224/8384 , H01L2224/8385 , H01L2224/83894 , H01L2224/83895 , H01L2224/83907 , H01L2224/9202 , H01L2225/06513 , H01L2924/00013 , H01L2924/01003 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01039 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/0106 , H01L2924/01072 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/014 , H01L2924/07802 , H01L2924/10329 , H01L2924/12042 , H01L2924/1305 , H01L2924/14 , H01L2924/1532 , H01L2924/351 , Y10T29/49126 , H01L2924/3512 , H01L2924/00 , H01L2224/29099 , H01L2224/05644 , H01L2924/00014 , H01L2224/05664 , H01L2224/05669 , H01L2224/05124 , H01L2224/05147
摘要: A bonded device structure including a first substrate having a first set of metallic bonding pads, preferably connected to a device or circuit, and having a first non-metallic region adjacent to the metallic bonding pads on the first substrate, a second substrate having a second set of metallic bonding pads aligned with the first set of metallic bonding pads, preferably connected to a device or circuit, and having a second non-metallic region adjacent to the metallic bonding pads on the second substrate, and a contact-bonded interface between the first and second set of metallic bonding pads formed by contact bonding of the first non-metallic region to the second non-metallic region. At least one of the first and second substrates may be elastically deformed.
摘要翻译: 一种粘结器件结构,包括具有第一组金属接合焊盘的第一衬底,优选地连接到器件或电路,并且具有与第一衬底上的金属焊盘相邻的第一非金属区域,第二衬底具有第二衬底 一组金属接合焊盘与第一组金属焊盘对准,优选地连接到器件或电路,并且具有与第二衬底上的金属焊盘相邻的第二非金属区域,以及位于第二衬底之间的接触接合界面 通过第一非金属区域与第二非金属区域的接触接合形成的第一和第二组金属接合焊盘。 第一和第二基板中的至少一个可能弹性变形。
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公开(公告)号:US06242794B1
公开(公告)日:2001-06-05
申请号:US09311149
申请日:1999-05-13
申请人: Paul Enquist
发明人: Paul Enquist
IPC分类号: H01L27082
CPC分类号: H01L29/7722 , H01L29/66242 , H01L29/66318 , H01L29/7371
摘要: A semiconductor device and method of fabricating the device. An emitter region is formed self centered and self aligned symmetrically with a base region. Using frontside processing techniques, a collector is formed symmetrically self-aligned with the base region and the emitter region. The collector region may be further formed self-centered with the base region using backside processing techniques. The self-aligned and self-centered symmetric structure virtually eliminates parasitic elements in the device significantly improving the device performance. The device is scalable on the order of approximately 0.1 microns. The method also provides reproduceability and repeatability of device characteristics necessary for commercial manufacture of the symmetric device.
摘要翻译: 一种半导体器件及其制造方法。 发射极区域与基极区域对称地形成为自对中和自对准。 使用前端处理技术,集电极形成为与基极区域和发射极区域对称自对准。 可以使用背面处理技术使收集器区域进一步与基部区域自身居中。 自对准和自对中结构的对称结构实际上消除了器件中的寄生元件,显着提高器件性能。 该器件的可扩展性约为0.1微米。 该方法还提供对称设备的商业制造所需的设备特性的可再现性和可重复性。
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公开(公告)号:US20080063878A1
公开(公告)日:2008-03-13
申请号:US11980415
申请日:2007-10-31
申请人: Qin-Yi Tong , Gaius Fountain , Paul Enquist
发明人: Qin-Yi Tong , Gaius Fountain , Paul Enquist
CPC分类号: H01L24/83 , H01L21/0206 , H01L21/2007 , H01L21/31105 , H01L21/31116 , H01L21/322 , H01L21/76251 , H01L24/26 , H01L24/75 , H01L25/0657 , H01L25/50 , H01L27/085 , H01L29/06 , H01L29/16 , H01L2224/8301 , H01L2224/8303 , H01L2224/83031 , H01L2224/8309 , H01L2224/83099 , H01L2224/8319 , H01L2224/8385 , H01L2224/83894 , H01L2224/83896 , H01L2224/83948 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01018 , H01L2924/0102 , H01L2924/01023 , H01L2924/01033 , H01L2924/01039 , H01L2924/0106 , H01L2924/01061 , H01L2924/01072 , H01L2924/01074 , H01L2924/01075 , H01L2924/01084 , H01L2924/01093 , H01L2924/0132 , H01L2924/05442 , H01L2924/07802 , H01L2924/10253 , H01L2924/10329 , H01L2924/14 , Y10S148/012 , Y10S438/974 , Y10T156/10 , Y10T156/1043 , H01L2924/01014 , H01L2924/01015 , H01L2924/01049 , H01L2924/01031 , H01L2924/3512 , H01L2924/00
摘要: A method for bonding at low or room temperature includes steps of surface cleaning and activation by cleaning or etching. One etching process The method may also include removing by-products of interface polymerization to prevent a reverse polymerization reaction to allow room temperature chemical bonding of materials such as silicon, silicon nitride and SiO2. The surfaces to be bonded are polished to a high degree of smoothness and planarity. VSE may use reactive ion etching or wet etching to slightly etch the surfaces being bonded. The surface roughness and planarity are not degraded and may be enhanced by the VSE process. The etched surfaces may be rinsed in solutions such as ammonium hydroxide or ammonium fluoride to promote the formation of desired bonding species on the surfaces.
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公开(公告)号:US20080053959A1
公开(公告)日:2008-03-06
申请号:US11980664
申请日:2007-10-31
申请人: Qin-Yi Tong , Gaius Fountain , Paul Enquist
发明人: Qin-Yi Tong , Gaius Fountain , Paul Enquist
CPC分类号: H01L24/83 , H01L21/0206 , H01L21/2007 , H01L21/31105 , H01L21/31116 , H01L21/322 , H01L21/76251 , H01L24/26 , H01L24/75 , H01L25/0657 , H01L25/50 , H01L27/085 , H01L29/06 , H01L29/16 , H01L2224/8301 , H01L2224/8303 , H01L2224/83031 , H01L2224/8309 , H01L2224/83099 , H01L2224/8319 , H01L2224/8385 , H01L2224/83894 , H01L2224/83896 , H01L2224/83948 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01018 , H01L2924/0102 , H01L2924/01023 , H01L2924/01033 , H01L2924/01039 , H01L2924/0106 , H01L2924/01061 , H01L2924/01072 , H01L2924/01074 , H01L2924/01075 , H01L2924/01084 , H01L2924/01093 , H01L2924/0132 , H01L2924/05442 , H01L2924/07802 , H01L2924/10253 , H01L2924/10329 , H01L2924/14 , Y10S148/012 , Y10S438/974 , Y10T156/10 , Y10T156/1043 , H01L2924/01014 , H01L2924/01015 , H01L2924/01049 , H01L2924/01031 , H01L2924/3512 , H01L2924/00
摘要: A method for bonding at low or room temperature includes steps of surface cleaning and activation by cleaning or etching. One etching process The method may also include removing by-products of interface polymerization to prevent a reverse polymerization reaction to allow room temperature chemical bonding of materials such as silicon, silicon nitride and SiO2. The surfaces to be bonded are polished to a high degree of smoothness and planarity. VSE may use reactive ion etching or wet etching to slightly etch the surfaces being bonded. The surface roughness and planarity are not degraded and may be enhanced by the VSE process. The etched surfaces may be rinsed in solutions such as ammonium hydroxide or ammonium fluoride to promote the formation of desired bonding species on the surfaces.
摘要翻译: 在低温或室温下接合的方法包括通过清洗或蚀刻进行表面清洁和活化的步骤。 一种蚀刻方法该方法还可以包括除去界面聚合的副产物,以防止反向聚合反应以允许诸如硅,氮化硅和SiO 2的材料的室温化学键合。 要结合的表面被抛光到高度的平滑度和平坦度。 VSE可以使用反应离子蚀刻或湿蚀刻来稍微蚀刻被结合的表面。 表面粗糙度和平面度不会降低,并且可以通过VSE工艺增强。 蚀刻的表面可以在诸如氢氧化铵或氟化铵的溶液中冲洗以促进在表面上形成所需的粘结物质。
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公开(公告)号:US20050161795A1
公开(公告)日:2005-07-28
申请号:US11085131
申请日:2005-03-22
申请人: Qin-Yi Tong , Paul Enquist , Anthony Rose
发明人: Qin-Yi Tong , Paul Enquist , Anthony Rose
CPC分类号: H01L21/76251 , B23K20/02 , H01L21/481 , H01L24/09 , H01L24/11 , H01L24/12 , H01L24/16 , H01L24/28 , H01L24/32 , H01L24/73 , H01L24/81 , H01L24/83 , H01L24/89 , H01L24/90 , H01L25/50 , H01L2224/05568 , H01L2224/05573 , H01L2224/13011 , H01L2224/13099 , H01L2224/13109 , H01L2224/13144 , H01L2224/13147 , H01L2224/32145 , H01L2224/80801 , H01L2224/81011 , H01L2224/81013 , H01L2224/81014 , H01L2224/81136 , H01L2224/81143 , H01L2224/81193 , H01L2224/81208 , H01L2224/8121 , H01L2224/81801 , H01L2224/81815 , H01L2224/8183 , H01L2224/81894 , H01L2224/83095 , H01L2224/8319 , H01L2224/8334 , H01L2224/83801 , H01L2224/8383 , H01L2224/8384 , H01L2224/8385 , H01L2224/83894 , H01L2224/83895 , H01L2224/83907 , H01L2224/9202 , H01L2225/06513 , H01L2924/00013 , H01L2924/01003 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01039 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/0106 , H01L2924/01072 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/014 , H01L2924/07802 , H01L2924/10329 , H01L2924/12042 , H01L2924/1305 , H01L2924/14 , H01L2924/1532 , H01L2924/351 , Y10T29/49126 , H01L2924/3512 , H01L2924/00 , H01L2224/29099 , H01L2224/05644 , H01L2924/00014 , H01L2224/05664 , H01L2224/05669 , H01L2224/05124 , H01L2224/05147
摘要: A bonded device structure including a first substrate having a first set of metallic bonding pads, preferably connected to a device or circuit, and having a first non-metallic region adjacent to the metallic bonding pads on the first substrate, a second substrate having a second set of metallic bonding pads aligned with the first set of metallic bonding pads, preferably connected to a device or circuit, and having a second non-metallic region adjacent to the metallic bonding pads on the second substrate, and a contact-bonded interface between the first and second set of metallic bonding pads formed by contact bonding of the first non-metallic region to the second non-metallic region. At least one of the first and second substrates may be elastically deformed.
摘要翻译: 一种粘结器件结构,包括具有第一组金属接合焊盘的第一衬底,优选地连接到器件或电路,并且具有与第一衬底上的金属焊盘相邻的第一非金属区域,第二衬底具有第二衬底 一组金属接合焊盘与第一组金属焊盘对准,优选地连接到器件或电路,并且具有与第二衬底上的金属焊盘相邻的第二非金属区域,以及位于第二衬底之间的接触接合界面 通过第一非金属区域与第二非金属区域的接触接合形成的第一和第二组金属接合焊盘。 第一和第二基板中的至少一个可能弹性变形。
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公开(公告)号:US06756281B2
公开(公告)日:2004-06-29
申请号:US10096742
申请日:2002-03-14
申请人: Paul Enquist
发明人: Paul Enquist
IPC分类号: H01L21331
CPC分类号: H01L29/7722 , H01L29/66242 , H01L29/66318 , H01L29/7371
摘要: A semiconductor device and method of fabricating the device. An emitter region is formed self centered and self aligned symmetrically with a base region. Using frontside processing techniques, a collector is formed symmetrically self-aligned with the base region and the emitter region. The collector region may be further formed self-centered with the base region using backside processing techniques. The self-aligned and self-centered symmetric structure virtually eliminates parasitic elements in the device significantly improving the device performance. The device is scalable on the order of approximately 0.1 microns. The method also provides reproduceability and repeatability of device characteristics necessary for commercial manufacture of the symmetric device.
摘要翻译: 一种半导体器件及其制造方法。 发射极区域与基极区域对称地形成为自对中和自对准。 使用前端处理技术,集电极形成为与基极区域和发射极区域对称自对准。 可以使用背面处理技术使收集器区域进一步与基部区域自身居中。 自对准和自对中结构的对称结构实际上消除了器件中的寄生元件,显着提高器件性能。 该器件的可扩展性约为0.1微米。 该方法还提供对称设备的商业制造所需的设备特性的可再现性和可重复性。
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公开(公告)号:US06740909B2
公开(公告)日:2004-05-25
申请号:US09822335
申请日:2001-04-02
申请人: Paul Enquist
发明人: Paul Enquist
IPC分类号: H01L310328
CPC分类号: H01L29/7722 , H01L29/66242 , H01L29/66318 , H01L29/7371
摘要: A semiconductor device and method of fabricating the device. An emitter region is formed self centered and self aligned symmetrically with a base region. Using frontside processing techniques, a collector is formed symmetrically self-aligned with the base region and the emitter region. The collector region may be further formed self-centered with the base region using backside processing techniques. The self-aligned and self-centered symmetric structure virtually eliminates parasitic elements in the device significantly improving the device performance. The device is scalable on the order of approximately 0.1 microns. The method also provides reproduceability and repeatability of device characteristics necessary for commercial manufacture of the symmetric device.
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公开(公告)号:US20080061418A1
公开(公告)日:2008-03-13
申请号:US11980452
申请日:2007-10-31
申请人: Paul Enquist , Gaius Fountain
发明人: Paul Enquist , Gaius Fountain
CPC分类号: H01L24/08 , H01L21/187 , H01L21/2007 , H01L21/6835 , H01L21/76251 , H01L21/76898 , H01L21/8221 , H01L23/13 , H01L23/36 , H01L23/481 , H01L23/5384 , H01L23/5385 , H01L23/5389 , H01L23/552 , H01L24/24 , H01L24/26 , H01L24/27 , H01L24/30 , H01L24/48 , H01L24/80 , H01L24/82 , H01L24/83 , H01L24/94 , H01L25/0652 , H01L25/0655 , H01L25/0657 , H01L25/16 , H01L25/167 , H01L25/18 , H01L25/50 , H01L27/0688 , H01L27/14634 , H01L2221/6835 , H01L2221/68359 , H01L2221/68363 , H01L2223/6677 , H01L2224/0807 , H01L2224/08123 , H01L2224/1134 , H01L2224/16 , H01L2224/24011 , H01L2224/24225 , H01L2224/24226 , H01L2224/24227 , H01L2224/3005 , H01L2224/30104 , H01L2224/305 , H01L2224/48091 , H01L2224/48101 , H01L2224/48227 , H01L2224/48247 , H01L2224/80896 , H01L2224/81894 , H01L2224/8303 , H01L2224/83092 , H01L2224/83099 , H01L2224/8319 , H01L2224/83193 , H01L2224/83345 , H01L2224/83359 , H01L2224/8385 , H01L2224/83894 , H01L2224/83896 , H01L2224/83912 , H01L2224/83948 , H01L2224/9202 , H01L2224/9212 , H01L2225/06513 , H01L2225/06524 , H01L2225/06541 , H01L2225/06555 , H01L2225/06589 , H01L2924/00013 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01015 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01057 , H01L2924/01074 , H01L2924/01082 , H01L2924/0132 , H01L2924/014 , H01L2924/05442 , H01L2924/07802 , H01L2924/10253 , H01L2924/10329 , H01L2924/1305 , H01L2924/13062 , H01L2924/13063 , H01L2924/13064 , H01L2924/13091 , H01L2924/14 , H01L2924/1461 , H01L2924/15153 , H01L2924/15165 , H01L2924/19041 , H01L2924/19043 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/3025 , H01L2924/351 , Y10S148/012 , Y10S438/977 , H01L2224/13099 , H01L2924/01049 , H01L2924/01031 , H01L2924/00 , H01L2224/45099 , H01L2224/45015 , H01L2924/207 , H01L2224/8203 , H01L2224/821 , H01L2224/80001 , H01L2224/82
摘要: A device integration method and integrated device. The method may include the steps of directly bonding a semiconductor device having a substrate to an element; and removing a portion of the substrate to expose a remaining portion of the semiconductor device after bonding. The element may include one of a substrate used for thermal spreading, impedance matching or for RF isolation, an antenna, and a matching network comprised of passive elements. A second thermal spreading substrate may be bonded to the remaining portion of the semiconductor device. Interconnections may be made through the first or second substrates. The method may also include bonding a plurality of semiconductor devices to an element, and the element may have recesses in which the semiconductor devices are disposed. A conductor array having a plurality of contact structures may be formed on an exposed surface of the semiconductor device, vias may be formed through the semiconductor device to device regions, and interconnection may be formed between said device regions and said contact structures.
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公开(公告)号:US20070037379A1
公开(公告)日:2007-02-15
申请号:US11201321
申请日:2005-08-11
申请人: Paul Enquist , Gaius Fountain , Qin-Yi Tong
发明人: Paul Enquist , Gaius Fountain , Qin-Yi Tong
IPC分类号: H01L21/4763
CPC分类号: H01L21/76838 , H01L21/76898 , H01L23/481 , H01L24/02 , H01L24/81 , H01L24/94 , H01L24/97 , H01L25/0657 , H01L25/50 , H01L27/0688 , H01L2224/0401 , H01L2224/81121 , H01L2224/81201 , H01L2224/8123 , H01L2224/81801 , H01L2224/81894 , H01L2224/81931 , H01L2224/83894 , H01L2224/9202 , H01L2224/97 , H01L2225/06513 , H01L2225/06541 , H01L2924/01002 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01049 , H01L2924/0105 , H01L2924/01055 , H01L2924/01059 , H01L2924/01073 , H01L2924/01074 , H01L2924/01075 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/04941 , H01L2924/04953 , H01L2924/05042 , H01L2924/10329 , H01L2924/12044 , H01L2924/14 , H01L2924/19043 , H01L2924/3025 , H01L2224/81
摘要: A method of three-dimensionally integrating elements such as singulated die or wafers and an integrated structure having connected elements such as singulated dies or wafers. Either or both of the die and wafer may have semiconductor devices formed therein. A first element having a first contact structure is bonded to a second element having a second contact structure. First and second contact structures can be exposed at bonding and electrically interconnected as a result of the bonding. A via may be etched and filled after bonding to expose and form an electrical interconnect to interconnected first and second contact structures and provide electrical access to this interconnect from a surface. Alternatively, first and/or second contact structures are not exposed at bonding, and a via is etched and filled after bonding to electrically interconnect first and second contact structures and provide electrical access to interconnected first and second contact structure to a surface. Also, a device may be formed in a first substrate, the device being disposed in a device region of the first substrate and having a first contact structure. A via may be etched, or etched and filled, through the device region and into the first substrate before bonding and the first substrate thinned to expose the via, or filled via after bonding.
摘要翻译: 三维集成元件如单片或晶片的方法以及具有诸如单模裸片或晶片的连接元件的集成结构。 芯片和晶片中的任一个或两者可以具有形成在其中的半导体器件。 具有第一接触结构的第一元件被结合到具有第二接触结构的第二元件。 第一和第二接触结构可以在结合时暴露,并且由于接合而电连接。 可以在接合之后蚀刻和填充通孔,以暴露并形成互连的第一和第二接触结构的电互连并提供从表面到该互连的电接入。 或者,第一接触结构和/或第二接触结构在接合时不暴露,并且在接合之后蚀刻并填充通孔以将第一和第二接触结构电互连并且提供对互连的第一和第二接触结构到表面的电接触。 此外,器件可以形成在第一衬底中,该器件设置在第一衬底的器件区域中并且具有第一接触结构。 通孔可以在结合之前被蚀刻或蚀刻和填充穿过器件区域并进入第一衬底,并且第一衬底被稀释以暴露通孔,或者在结合之后填充通孔。
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公开(公告)号:US20050194668A1
公开(公告)日:2005-09-08
申请号:US10792757
申请日:2004-03-05
申请人: Paul Enquist , Gaius Fountain , Carl Petteway
发明人: Paul Enquist , Gaius Fountain , Carl Petteway
IPC分类号: H01L23/495
CPC分类号: H01L21/67333 , H01L2924/0002 , Y10S414/135 , Y10S414/14 , Y10S414/141 , H01L2924/00
摘要: A waffle pack device including a member having recesses in a surface of the member to accommodate die from at least one semiconductor wafer. The member is compatible with semiconductor wafer handling equipment and/or semiconductor wafer processing. Preferably, the member accommodates at least a majority of die from a semiconductor wafer. Further, one semiconductor device assembly method is provided which removes die from a singular waffle pack device, places die from the single waffle pack device on a semiconductor package to assemble from the placed die all die components required for an integrated circuit, and electrically interconnects the placed die in the semiconductor package to form the integrated circuit. Another semiconductor device assembly method is provided which removes die from at least one waffle pack device, places die from the at least one waffle pack device on a semiconductor package to assemble from the placed die device components required for an integrated circuit, and electrically interconnects the placed die in the semiconductor package to form the integrated circuit.
摘要翻译: 一种华夫饼包装置,包括在所述构件的表面中具有凹部以容纳来自至少一个半导体晶片的模具的构件。 该元件与半导体晶片处理设备和/或半导体晶片处理兼容。 优选地,构件容纳来自半导体晶片的至少大部分管芯。 此外,提供了一种半导体器件组装方法,其从单个华夫饼包装置中去除裸片,将来自单个华夫饼包装置的管芯放置在半导体封装上,以从放置的管芯组装集成电路所需的所有管芯部件,并将 放置在半导体封装中以形成集成电路。 提供了另一种半导体器件组装方法,其从至少一个华夫饼包装置去除管芯,将来自至少一个华夫饼包装置的管芯放置在半导体封装上,以从集成电路所需的放置的管芯器件组件中组装,并将 放置在半导体封装中以形成集成电路。
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