Method and apparatus for vapor deposition of material onto a substrate
    1.
    发明授权
    Method and apparatus for vapor deposition of material onto a substrate 失效
    用于将材料蒸发沉积到基材上的方法和装置

    公开(公告)号:US5104695A

    公开(公告)日:1992-04-14

    申请号:US404803

    申请日:1989-09-08

    IPC分类号: C23C14/24

    CPC分类号: C23C14/243

    摘要: A method and apparatus for depositing the material onto a substrate is provided. The apparatus includes a mesh member which has impregnated therein the material which is to be vapor deposited. The mesh member with the material thereon is heated to vaporize the material and the vaporized material is then deposited onto the desired substrate. Preferably the material that is deposited is maintained in a crucible having an opening and the mesh member is disposed over the opening. The material in the crucible is vaporized and condensed onto the mesh member, and the condensed material wicks through the mesh member and then revaporizes from the top of the mesh member and is deposited onto the substrates.