Method for forming polyimide film by chemical vapor deposition
    3.
    发明授权
    Method for forming polyimide film by chemical vapor deposition 失效
    通过化学气相沉积法形成聚酰亚胺膜的方法

    公开(公告)号:US4759958A

    公开(公告)日:1988-07-26

    申请号:US76764

    申请日:1987-07-23

    CPC分类号: B05D1/60 H01L21/312

    摘要: A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprises evaporating an aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group, such as esters of 4-amino phthalic acid, and 4-(p-anilino) phthalic acid, thus a high strength polyimide is obtained represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR1## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.

    摘要翻译: 通过化学气相沉积在基板表面上形成聚酰亚胺膜的方法包括蒸发具有一个氨基和两个相邻羧基或其衍生基团的芳族单体化合物,例如4-氨基邻苯二甲酸的酯和4-(p - 苯胺基)邻苯二甲酸,因此由其酰亚胺基团单向排列在其主链中的通式表示的高强度聚酰亚胺:其中R为零或二价脂族或芳族基团,n为整数。

    Fluorine-containing polyamide acid and polyamide
    9.
    发明授权
    Fluorine-containing polyamide acid and polyamide 失效
    含氟聚酰胺酸和聚酰胺

    公开(公告)号:US5194579A

    公开(公告)日:1993-03-16

    申请号:US609103

    申请日:1990-11-05

    IPC分类号: C08G73/10

    CPC分类号: C08G73/1067

    摘要: Polyimides represented by general formula (I), (wherein Ar.sub.1 and Ar.sub.2 each represents an aromatic ring-containing group, Cf represents a fluorinated alkyl group directly bonded to Ar.sub.1, and m.gtoreq.1), and polyamide acids as their percursors. The polyimides have excellent humidity resistance and heat resistance, thus being useful as coating materials for semiconductor chips and insulating films for multi-layered wiring. ##STR1##

    摘要翻译: 由通式(I)表示的聚酰亚胺(其中Ar1和Ar2各自表示含芳环的基团,Cf表示与Ar1直接键合的氟化烷基,m≥0),聚酰胺酸作为其前体。 聚酰亚胺具有优异的耐湿性和耐热性,因此可用作半导体芯片用涂料和多层布线用绝缘膜。 (一)