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公开(公告)号:US06757316B2
公开(公告)日:2004-06-29
申请号:US09854097
申请日:2001-05-11
申请人: Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人: Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号: H01S322
CPC分类号: H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译: 本发明提供了一种准分子激光器,其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数,并控制非常快的PZT驱动调光镜和脉冲功率充电电压,以将波长和脉冲能量保持在所需的极限内。 在优选实施例中,两个风扇马达驱动单个切向风扇,其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。
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公开(公告)号:US06882674B2
公开(公告)日:2005-04-19
申请号:US10036676
申请日:2001-12-21
申请人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号: H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号: G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译: 本发明提供了一种准分子激光器,其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数,并控制非常快的PZT驱动调光镜和脉冲功率充电电压,以将波长和脉冲能量保持在所需的极限内。 在优选实施例中,两个风扇马达驱动单个切向风扇,其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。
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公开(公告)号:US06317447B1
公开(公告)日:2001-11-13
申请号:US09490835
申请日:2000-01-25
申请人: William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
发明人: William N. Partlo , Igor V. Fomenkov , Jean-Marc Hueber , Zsolt Bor , Eckehard D. Onkels , Michael C. Cates , Richard C. Ujazdowski , Vladimir B. Fleurov , Dmitri V. Gaidarenko
IPC分类号: H01S322
CPC分类号: G03F7/70025 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382
摘要: Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.
摘要翻译: 气体放电激光器的方法和结构变化,以最大限度地减少高脉冲波长啁啾。 申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因,因为从反射回到放电区域的放电的压力波与随后的放电一致。 压力波的到达时间由波浪行进的激光气体的温度决定。 在突发模式操作期间,现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。 这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置,导致激光气体的压力变化,这反过来影响放电区域的折射率,导致激光束离开 激光稍微改变方向。 光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域,导致波长啁啾。 解决问题的方法是在激光室结构元件中包括中压或分散压力波,并将激光气体温度保持在尽可能接近的恒定值。
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公开(公告)号:US06914919B2
公开(公告)日:2005-07-05
申请号:US10187336
申请日:2002-06-28
申请人: Tom A. Watson , Richard C. Ujazdowski , Alex P. Ivaschenko , Richard L. Sandstrom , Robert A. Shannon , R. Kyle Webb , Frederick A. Palenschat , Thomas Hofmann , Curtis L. Rettig , Richard M. Ness , Paul C. Melcher , Alexander I. Ershov
发明人: Tom A. Watson , Richard C. Ujazdowski , Alex P. Ivaschenko , Richard L. Sandstrom , Robert A. Shannon , R. Kyle Webb , Frederick A. Palenschat , Thomas Hofmann , Curtis L. Rettig , Richard M. Ness , Paul C. Melcher , Alexander I. Ershov
IPC分类号: H01S3/134 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/10
CPC分类号: H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.
摘要翻译: 本发明提供一种气体放电激光系统,其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。 优选的实施例被配置为用于集成电路光刻的光源的KrF,ArF和F 2 N 2激光器。 改进包括一种改进的高压电源,其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次,以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。 公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。 在一个实施例中,放电区域的宽度从约3mm减小至约1mm,使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。 在其他实施例中,电极之间的气流充分增加,以允许10,000Hz的操作,放电区域宽度为3mm。 为了提供这些显着增加的气体流速,申请人已经公开了使用现有技术的切向形式的优选实施例,但是具有改进的和更强大的电动机和新颖的轴承设计。 新的轴承设计包括陶瓷轴承和磁性轴承。 在其他实施例中,一些或全部气体循环动力设置有位于激光室外部的鼓风机。 外部鼓风机可以位于激光柜内或分开的位置。
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公开(公告)号:US6034978A
公开(公告)日:2000-03-07
申请号:US310872
申请日:1999-05-12
申请人: Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
发明人: Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
CPC分类号: G03F7/70025 , H01S3/134 , H01S3/036
摘要: A gas discharge laser with fast response gas temperature control to maintain laser gas temperature within desired limits during burst mode operation. Preferred embodiments include a passive temperature stabilizer having fins with surface areas exposed to flowing laser gas at least equal to the surface area of the cooling fins of a laser gas heat exchanger. Preferred embodiments utilize heating elements and coolant flow control to regulate laser gas temperatures using processors programmed to anticipate idle periods.
摘要翻译: 一种具有快速响应气体温度控制的气体放电激光器,用于在脉冲串模式操作期间将激光气体温度保持在期望的限度内。 优选实施例包括具有散热片的被动温度稳定器,其表面积暴露于至少等于激光气体热交换器的冷却片的表面积的流动激光气体。 优选实施例利用加热元件和冷却剂流量控制来调节激光气体温度,使用编程为预期空闲周期的处理器。
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公开(公告)号:US06904073B2
公开(公告)日:2005-06-07
申请号:US10384967
申请日:2003-03-08
申请人: Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
发明人: Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
IPC分类号: G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.
摘要翻译: 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲,平均输出脉冲强度大于1.75×6 /瓦/ cm 2,并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比,数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别:(1)由申请人发现的CaF 2 2表面损伤的解决方案,(2)高功率ArF MOPA激光系统的描述( 3)光束传输单元的描述,(4)偏振考虑(5)高速水冷自动快门能量检测器模块和(6)其他改进。
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17.
公开(公告)号:US5978405A
公开(公告)日:1999-11-02
申请号:US36158
申请日:1998-03-06
申请人: Tibor Juhasz , Richard C. Ujazdowski , Herve A. Besaucele , Robert G. Ozarski , James H. Azzola
发明人: Tibor Juhasz , Richard C. Ujazdowski , Herve A. Besaucele , Robert G. Ozarski , James H. Azzola
CPC分类号: H01S3/036
摘要: A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber are modulated with grooves, such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.
摘要翻译: 激光室具有倾斜的反射器,其将声波和冲击波反射离开激光放电区域,以最小化声波和冲击波干扰。 成角度的反射器可以具有不同的构造以辅助声波和冲击波的消散。 例如,成角度的反射器可以具有调制的反射表面,例如在表面内限定有凹槽或孔。 此外,成角度的反射器可以具有具有声波和冲击波吸收特性的反射表面。 具有吸收性能的反射表面可以是毡状金属或具有多层多孔表面。 此外,可以调制激光室的壁,以通过吸收,散射和在反射波内产生干涉来帮助消除声波和冲击波。 沿着壁可以使用多层多孔表面来吸收和散射入射波。 激光室的壁也可以用诸如毛毡金属的声波和冲击波吸收材料覆盖。 在其他实施例中,激光室的壁由诸如三角形或矩形水平凹槽的凹槽调制,这些凹槽散射入射波并在反射波内产生干涉。
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公开(公告)号:US5848089A
公开(公告)日:1998-12-08
申请号:US893904
申请日:1997-07-11
IPC分类号: F04D25/08 , F04D29/04 , F04D29/056 , F04D29/058 , G03F7/20 , H01S3/036 , H01S3/041 , H01S3/225
CPC分类号: G03F7/70575 , H01S3/036 , H01S3/041
摘要: An electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported by an active magnetic bearing system and driven by a brushless DC motor in which the rotor of the motor and at least two magnetic bearings sealed within the gas environment of the laser cavity and the motor stator and the coils of the bearing magnets are located outside the gas environment.
摘要翻译: 一种具有激光腔的放电气体激光器,其中包含激光气体和用于使激光气体循环的风扇。 风扇由主动磁轴承系统支撑,由无刷直流电动机驱动,电动机的转子和至少两个磁性轴承密封在激光腔的气体环境中,电动机定子和轴承磁体的线圈 位于天然气环境之外。
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公开(公告)号:US09620920B2
公开(公告)日:2017-04-11
申请号:US12590307
申请日:2009-11-05
CPC分类号: H01S3/036 , H01S3/0384
摘要: A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise an aerodynamic fairing attached to the high voltage electrode to present an aerodynamically smooth surface to the gas flow.
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公开(公告)号:US07633989B2
公开(公告)日:2009-12-15
申请号:US11169203
申请日:2005-06-27
IPC分类号: H01S3/22
CPC分类号: H01S3/036 , H01S3/0384
摘要: A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise the high voltage electrode being disposed in an electrode receiving pocket in the main insulator and formed to present an elongated discharge receiving area facing another electrode within the gas discharge chamber, an aerodynamic fairing attached to the high voltage electrode and substantially closing the gas flow disturbance pocket and presenting an aerodynamically smooth surface to the gas flow.
摘要翻译: 公开了以大于4kHz的输出激光脉冲重复率操作的脉冲气体放电激光器及其操作方法,其可以包括具有纵向范围的高压电极; 将高电压电极与接地气体放电室电绝缘的主绝缘体; 前置电离器,其沿所述高压电极的所述纵向延伸部分的至少一部分纵向延伸; 与电极一体的预电离垫片朝向前置电离器延伸。 前置电离器可以与主绝缘体一体地形成。 预电离垫片可以基本上覆盖电极和前置离子机之间的间隙。 所述装置和方法可以包括高压电极设置在主绝缘体中的电极接收凹槽中并且形成为呈现面对气体放电室内的另一电极的细长放电接收区域,附接到高压电极的空气动力学整流罩,并且基本上 关闭气体流动扰动袋并向气体流动呈空气动力学平滑的表面。
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