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    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM
    12.
    发明申请
    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM 审中-公开

    公开(公告)号：US20180301319A1

    公开(公告)日：2018-10-18

    申请号：US16012888

    申请日：2018-06-20

    Applicant: FEI Company

    Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC: H01J37/317 ,  H01J37/305

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

    Fiducial design for tilted or glancing mill operations with a charged particle beam
    13.
    发明授权
    Fiducial design for tilted or glancing mill operations with a charged particle beam 有权

    公开(公告)号：US10026590B2

    公开(公告)日：2018-07-17

    申请号：US14758466

    申请日：2013-12-30

    Applicant: FEI Company

    Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC: H01J37/317 ,  H01J37/305

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

    METHOD FOR PREPARING SAMPLES FOR IMAGING
    15.
    发明申请
    METHOD FOR PREPARING SAMPLES FOR IMAGING 审中-公开
    制备图像样本的方法

    公开(公告)号：US20150330877A1

    公开(公告)日：2015-11-19

    申请号：US14758150

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley ,  Trevan Landin

    IPC: G01N1/32 ,  H01L21/3065

    CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    Method for preparing samples for imaging
    16.
    发明授权
    Method for preparing samples for imaging 有权
    准备成像样品的方法

    公开(公告)号：US09111720B2

    公开(公告)日：2015-08-18

    申请号：US14572626

    申请日：2014-12-16

    Applicant: FEI Company

    Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: G01N23/00 ,  H01J37/305 ,  C23C14/30

    CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    Face-on, gas-assisted etching for plan-view lamellae preparation
    18.
    发明授权
    Face-on, gas-assisted etching for plan-view lamellae preparation 有权

    公开(公告)号：US10546719B2

    公开(公告)日：2020-01-28

    申请号：US15987847

    申请日：2018-05-23

    Applicant: FEI Company

    Inventor： Noel Thomas Franco ,  Kenny Mani ,  Chad Rue ,  Joe Christian ,  Jeffrey Blackwood

    IPC: H01J37/305 ,  H01L21/67 ,  H01L21/263 ,  H01L21/3065 ,  H01J37/22 ,  G01N1/44 ,  G01N1/28

    Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

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