公开(公告)号：US10535564B2

公开(公告)日：2020-01-14

申请号：US15649457

申请日：2017-07-13

Applicant: Invensas Corporation

Inventor： Cyprian Emeka Uzoh ,  Guilian Gao ,  Liang Wang ,  Hong Shen ,  Arkalgud R. Sitaram

IPC: H01L21/82 ,  H01L23/31 ,  H01L21/56 ,  H01L23/00 ,  H01L21/48 ,  H01L23/538

Abstract: A device and method of forming the device that includes cavities formed in a substrate of a substrate device, the substrate device also including conductive vias formed in the substrate. Chip devices, wafers, and other substrate devices can be mounted to the substrate device. Encapsulation layers and materials may be formed over the substrate device in order to fill the cavities.

公开(公告)号：US20190115323A1

公开(公告)日：2019-04-18

申请号：US16212248

申请日：2018-12-06

Applicant: Invensas Corporation

Inventor： Belgacem Haba ,  Arkalgud R. Sitaram

IPC: H01L25/065 ,  H01L23/64 ,  H01L25/00 ,  H01L23/00 ,  H01L21/311 ,  H01L21/02

Abstract: Capacitive couplings in a direct-bonded interface for microelectronic devices are provided. In an implementation, a microelectronic device includes a first die and a second die direct-bonded together at a bonding interface, a conductive interconnect between the first die and the second die formed at the bonding interface by a metal-to-metal direct bond, and a capacitive interconnect between the first die and the second die formed at the bonding interface. A direct bonding process creates a direct bond between dielectric surfaces of two dies, a direct bond between respective conductive interconnects of the two dies, and a capacitive coupling between the two dies at the bonding interface. In an implementation, a capacitive coupling of each signal line at the bonding interface comprises a dielectric material forming a capacitor at the bonding interface for each signal line. The capacitive couplings result from the same direct bonding process that creates the conductive interconnects direct-bonded together at the same bonding interface.

公开(公告)号：US09859234B2

公开(公告)日：2018-01-02

申请号：US14819744

申请日：2015-08-06

Applicant: Invensas Corporation

Inventor： Cyprian Emeka Uzoh ,  Guilian Gao ,  Bongsub Lee ,  Scott McGrath ,  Hong Shen ,  Charles G. Woychik ,  Arkalgud R. Sitaram ,  Akash Agrawal

IPC: H01L21/00 ,  H01L23/00 ,  H01L21/311 ,  H01L23/48 ,  H01L23/498 ,  H01L21/48 ,  H01L23/532

CPC classification number: H01L24/03 ,  H01L21/31144 ,  H01L21/486 ,  H01L23/291 ,  H01L23/293 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/53214 ,  H01L23/53228 ,  H01L23/53257 ,  H01L23/5329 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02126 ,  H01L2224/03009 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/05025 ,  H01L2224/05144 ,  H01L2224/05155 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/10126 ,  H01L2224/13016 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2924/01013 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01074 ,  H01L2924/3511 ,  H01L2924/00012 ,  H01L2924/014

Abstract: A method of processing an interconnection element can include providing a substrate element having front and rear opposite surfaces and electrically conductive structure, a first dielectric layer overlying the front surface and a plurality of conductive contacts at a first surface of the first dielectric layer, and a second dielectric layer overlying the rear surface and having a conductive element at a second surface of the second dielectric layer. The method can also include removing a portion of the second dielectric layer so as to reduce the thickness of the portion, and to provide a raised portion of the second dielectric layer having a first thickness and a lowered portion having a second thickness. The first thickness can be greater than the second thickness. At least a portion of the conductive element can be recessed below a height of the first thickness of the second dielectric layer.

公开(公告)号：US09685420B2

公开(公告)日：2017-06-20

申请号：US15144108

申请日：2016-05-02

Applicant: Invensas Corporation

Inventor： Rajesh Katkar ,  Cyprian Emeka Uzoh ,  Arkalgud R. Sitaram

IPC: H01L23/48 ,  H01L23/00 ,  H01L25/00 ,  H01L25/065 ,  H01L23/498 ,  H01L23/528 ,  H01L21/768

CPC classification number: H01L24/81 ,  H01L21/768 ,  H01L23/49838 ,  H01L23/528 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/10126 ,  H01L2224/1182 ,  H01L2224/13023 ,  H01L2224/13105 ,  H01L2224/13109 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13184 ,  H01L2224/13562 ,  H01L2224/1357 ,  H01L2224/1379 ,  H01L2224/13809 ,  H01L2224/13811 ,  H01L2224/13847 ,  H01L2224/13855 ,  H01L2224/1601 ,  H01L2224/16014 ,  H01L2224/16058 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2224/16503 ,  H01L2224/16507 ,  H01L2224/81007 ,  H01L2224/81048 ,  H01L2224/81143 ,  H01L2224/81193 ,  H01L2224/8181 ,  H01L2224/8182 ,  H01L2224/81862 ,  H01L2224/81895 ,  H01L2224/81903 ,  H01L2224/81905 ,  H01L2224/94 ,  H01L2924/01029 ,  H01L2924/01051 ,  H01L2924/01327 ,  H01L2924/364 ,  H01L2224/11 ,  H01L2224/81 ,  H01L2924/00014 ,  H01L2924/2064

Abstract: An apparatus relates generally to a microelectronic device. In such an apparatus, a first substrate has a first surface with first interconnects located on the first surface, and a second substrate has a second surface spaced apart from the first surface with a gap between the first surface and the second surface. Second interconnects are located on the second surface. Lower surfaces of the first interconnects and upper surfaces of the second interconnects are coupled to one another for electrical conductivity between the first substrate and the second substrate. A conductive collar is around sidewalls of the first and second interconnects, and a dielectric layer is around the conductive collar.

公开(公告)号：US09502347B2

公开(公告)日：2016-11-22

申请号：US14629271

申请日：2015-02-23

Applicant: Invensas Corporation

Inventor： Hong Shen ,  Liang Wang ,  Arkalgud R. Sitaram

IPC: H01L27/092 ,  H01L23/522 ,  H01L23/532

CPC classification number: H01L24/09 ,  H01L21/486 ,  H01L23/147 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/5226 ,  H01L23/53209 ,  H01L24/89 ,  H01L25/0652 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/08168 ,  H01L2224/08501 ,  H01L2224/73204 ,  H01L2224/80487 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2924/05442 ,  H01L2924/1304 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/3511

Abstract: Two microelectronic components (110, 120), e.g. a die and an interposer, are bonded to each other. One of the components' contact pads (110C) include metal, and the other component has silicon (410) which reacts with the metal to form metal silicide (504). Then a hole (510) is made through one of the components to reach the metal silicide and possibly even the unreacted metal (110C) of the other component. The hole is filled with a conductor (130), possibly metal, to provide a conductive via that can be electrically coupled to contact pads (120C.B) attachable to other circuit elements or microelectronic components, e.g. to a printed circuit board.

Abstract translation: 两个微电子部件（110,120），例如 模具和插入件彼此结合。 部件的接触焊盘（110C）中的一个包括金属，另一部件具有与金属反应形成金属硅化物（504）的硅（410）。 然后通过其中一个部件制成一个孔（510），以到达金属硅化物，甚至可能连接另一部件的未反应的金属（110C）。 该孔填充有可能是金属的导体（130），以提供可电耦合到可附接到其它电路元件或微电子部件的接触焊盘（120C.B）的导电通孔，例如。 到印刷电路板。

公开(公告)号：US09368479B2

公开(公告)日：2016-06-14

申请号：US14201585

申请日：2014-03-07

Applicant: Invensas Corporation

Inventor： Rajesh Katkar ,  Arkalgud R. Sitaram ,  Cyprian Emeka Uzoh

IPC: H01L23/42 ,  H01L25/065 ,  H01L23/538 ,  H01L21/768 ,  H01L23/48 ,  H01L21/306 ,  H01L21/308 ,  H01L21/311 ,  H01L25/00 ,  H01L23/367

CPC classification number: H01L25/0657 ,  H01L21/30604 ,  H01L21/308 ,  H01L21/31105 ,  H01L21/76897 ,  H01L21/76898 ,  H01L23/3675 ,  H01L23/3677 ,  H01L23/42 ,  H01L23/481 ,  H01L23/5386 ,  H01L25/50 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/15311 ,  H01L2924/16152 ,  H01L2924/00

Abstract: An apparatus relates generally to a three-dimensional stacked integrated circuit. In such an apparatus, the three-dimensional stacked integrated circuit has at least a first die and a second die interconnected to one another using die-to-die interconnects. A substrate of the first die has at least one thermal via structure extending from a lower surface of the substrate toward a well of the substrate without extending to the well and without extending through the substrate. A first end of the at least one thermal via structure is at least sufficiently proximate to the well of the substrate for conduction of heat away therefrom. The substrate has at least one through substrate via structure extending from the lower surface of the substrate to an upper surface of the substrate. A second end of the at least one thermal via structure is coupled to at least one through die via structure of the second die for thermal conductivity.

Abstract translation: 装置一般涉及三维堆叠集成电路。 在这种装置中，三维堆叠集成电路具有至少第一管芯和第二管芯，使用管芯到管芯互连彼此互连。 第一管芯的衬底具有至少一个热通孔结构，其从衬底的下表面朝向衬底的阱延伸，而不延伸到阱并且不延伸通过衬底。 所述至少一个热通孔结构的第一端至少足够靠近所述衬底的阱，用于将热量传导出来。 衬底具有从衬底的下表面延伸到衬底的上表面的至少一个穿过衬底通孔结构。 所述至少一个热通孔结构的第二端与所述第二管芯的至少一个通孔通孔结构耦合以进行导热。

公开(公告)号：US09252127B1

公开(公告)日：2016-02-02

申请号：US14328380

申请日：2014-07-10

Applicant: Invensas Corporation

Inventor： Hong Shen ,  Charles G. Woychik ,  Arkalgud R. Sitaram

IPC: H01L23/52 ,  H01L23/48 ,  H01L23/538 ,  H01L21/98 ,  H01L21/50 ,  H01L21/67 ,  H01L25/065 ,  H01L23/00 ,  H01L21/52

CPC classification number: H01L25/0652 ,  H01L21/52 ,  H01L21/561 ,  H01L23/3121 ,  H01L23/49811 ,  H01L23/49827 ,  H01L23/49844 ,  H01L23/5384 ,  H01L24/09 ,  H01L24/33 ,  H01L24/73 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/50 ,  H01L2224/08165 ,  H01L2224/08235 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/48091 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73209 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/8182 ,  H01L2224/85205 ,  H01L2224/9202 ,  H01L2224/92125 ,  H01L2224/92224 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2225/06589 ,  H01L2924/15153 ,  H01L2924/15311 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2224/85 ,  H01L2224/81 ,  H01L2224/83 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/00014

Abstract: Semiconductor integrated circuits (110) or assemblies are disposed at least partially in cavities between two interposers (120). Conductive vias (204M) pass through at least one of the interposers or at least through the interposer's substrate, and reach a semiconductor integrated circuit or an assembly. Other conductive vias (204M.1) pass at least partially through multiple interposers and are connected to conductive vias that reach, or are capacitively coupled to, a semiconductor IC or an assembly. Other features are also provided.

Abstract translation: 半导体集成电路（110）或组件至少部分地设置在两个插入件（120）之间的空腔中。 导电通孔（204M）通过至少一个插入件或至少穿过插入器的衬底，并到达半导体集成电路或组件。 其他导电通孔（204M.1）至少部分地通过多个插入件并且连接到到达或者电容耦合到半导体IC或组件的导电通孔。 还提供其他功能。

公开(公告)号：US11302616B2

公开(公告)日：2022-04-12

申请号：US16288720

申请日：2019-02-28

Applicant: INVENSAS CORPORATION

Inventor： Hong Shen ,  Charles G. Woychik ,  Arkalgud R. Sitaram ,  Guilian Gao

IPC: H01L23/498 ,  H01L21/56 ,  H01L25/16 ,  H01L23/31 ,  H01L21/48 ,  H01L23/538 ,  H01L23/13 ,  H01L25/065 ,  H01L23/10 ,  H01L23/00 ,  H01L23/14

Abstract: An integrated circuit (IC) package includes a first substrate having a backside surface and a top surface with a cavity disposed therein. The cavity has a floor defining a front side surface. A plurality of first electroconductive contacts are disposed on the front side surface, and a plurality of second electroconductive contacts are disposed on the back side surface. A plurality of first electroconductive elements penetrate through the first substrate and couple selected ones of the first and second electroconductive contacts to each other. A first die containing an IC is electroconductively coupled to corresponding ones of the first electroconductive contacts. A second substrate has a bottom surface that is sealingly attached to the top surface of the first substrate, and a dielectric material is disposed in the cavity so as to encapsulate the first die.

公开(公告)号：US10811388B2

公开(公告)日：2020-10-20

申请号：US16212248

申请日：2018-12-06

Applicant: Invensas Corporation

Inventor： Belgacem Haba ,  Arkalgud R. Sitaram

IPC: H01L25/065 ,  H01L21/311 ,  H01L25/00 ,  H01L23/00 ,  H01L21/02 ,  H01L23/64

Abstract: Capacitive couplings in a direct-bonded interface for microelectronic devices are provided. In an implementation, a microelectronic device includes a first die and a second die direct-bonded together at a bonding interface, a conductive interconnect between the first die and the second die formed at the bonding interface by a metal-to-metal direct bond, and a capacitive interconnect between the first die and the second die formed at the bonding interface. A direct bonding process creates a direct bond between dielectric surfaces of two dies, a direct bond between respective conductive interconnects of the two dies, and a capacitive coupling between the two dies at the bonding interface. In an implementation, a capacitive coupling of each signal line at the bonding interface comprises a dielectric material forming a capacitor at the bonding interface for each signal line. The capacitive couplings result from the same direct bonding process that creates the conductive interconnects direct-bonded together at the same bonding interface.

公开(公告)号：US10522457B2

公开(公告)日：2019-12-31

申请号：US16238786

申请日：2019-01-03

Applicant: Invensas Corporation

Inventor： Cyprian Emeka Uzoh ,  Charles G. Woychik ,  Arkalgud R. Sitaram ,  Hong Shen ,  Zhuowen Sun ,  Liang Wang ,  Guilian Gao

IPC: H01L23/04 ,  H01L23/52 ,  H01L23/522 ,  H01L49/02 ,  H01L21/768 ,  H01L21/8234

Abstract: In a microelectronic component having conductive vias (114) passing through a substrate (104) and protruding above the substrate, one or more conductive features (120E.A, 120E.B, or both) are provided above the substrate that wrap around the conductive vias' protrusions (114′) to form capacitors, electromagnetic shields, and possibly other elements. Other features and embodiments are also provided.