Wiring board and method for manufacturing the same
    11.
    发明授权
    Wiring board and method for manufacturing the same 有权
    接线板及其制造方法

    公开(公告)号:US07674989B2

    公开(公告)日:2010-03-09

    申请号:US11449673

    申请日:2006-06-09

    IPC分类号: H01R12/04

    摘要: A wiring board for mounting a semiconductor element or electronic component having a plurality of wiring layers, an insulating layer provided between these wiring layers, and a via which is provided to the insulating layer and which electrically connects the wiring layers. In this wiring board, the cross-sectional shape of the via in the plane parallel to the wiring layers is obtained by the partial overlapping of a plurality of similar shapes (circles). Stable operation can be obtained in a semiconductor element by minimizing obstacles to increased density, effectively increasing the cross-sectional area of the via, and preventing the wiring resistance from increasing by making the cross-sectional shape of the via into a shape obtained by the partial overlapping of a plurality of similar shapes.

    摘要翻译: 一种用于安装具有多个布线层的半导体元件或电子元件的布线板,设置在这些布线层之间的绝缘层,以及设置在绝缘层上并将布线层电连接的通孔。 在该布线板中,通过多个相似形状(圆圈)的部分重叠,获得与布线层平行的平面中的通孔的截面形状。 通过最小化增加密度的障碍物,有效地增加通孔的横截面积,并且通过使通孔的横截面形状成为由通孔形成的形状来防止布线电阻增加,可以在半导体元件中获得稳定的操作 多个类似形状的部分重叠。

    Plating apparatus and method of preventing substitute deposition
    20.
    发明授权
    Plating apparatus and method of preventing substitute deposition 失效
    电镀装置和防止替代沉积的方法

    公开(公告)号:US06391179B1

    公开(公告)日:2002-05-21

    申请号:US09624335

    申请日:2000-07-24

    申请人: Kenta Ogawa

    发明人: Kenta Ogawa

    IPC分类号: C25D2100

    CPC分类号: C25D21/12 C25D17/10

    摘要: The present invention provides a plating apparatus comprising: a plating bath filled with a plating solution; at least an anode in the plating solution; at least a plating object which serves as a cathode in the plating solution, so that the at least plating object is distanced from the at least anode; and at least a dummy cathode in the plating solution, so that the at least dummy cathode is applied with voltage to suppress a substitute-deposition of metal ions in the plating solution.

    摘要翻译: 本发明提供一种电镀装置,其特征在于,包括:填充有镀液的电镀液; 电镀溶液中的至少阳极; 至少镀覆对象,其在所述电镀溶液中用作阴极,使得所述至少电镀对象远离所述至少阳极; 以及至少在电镀液中的虚拟阴极,使得至少具有虚拟阴极的电压被施加以抑制电镀溶液中的金属离子的替代沉积。