COMPLIANT MICRO DEVICE TRANSFER HEAD
    11.
    发明申请
    COMPLIANT MICRO DEVICE TRANSFER HEAD 有权
    合格的微型器件传输头

    公开(公告)号:US20140196851A1

    公开(公告)日:2014-07-17

    申请号:US14173693

    申请日:2014-02-05

    Abstract: A compliant monopolar micro device transfer head array and method of forming a compliant monopolar micro device transfer array from an SOI substrate are described. In an embodiment, the micro device transfer head array including a base substrate and a patterned silicon layer over the base substrate. The patterned silicon layer may include a silicon interconnect and an array of silicon electrodes electrically connected with the silicon interconnect. Each silicon electrode includes a mesa structure protruding above the silicon interconnect, and each silicon electrode is deflectable into a cavity between the base substrate and the silicon electrode. A dielectric layer covers a top surface of each mesa structure.

    Abstract translation: 描述了一种兼容的单极微器件传输头阵列和从SOI衬底形成兼容单极微器件传输阵列的方法。 在一个实施例中,微器件转移头阵列包括基底衬底和在基底衬底上的图案化硅层。 图案化硅层可以包括硅互连和与硅互连电连接的硅电极阵列。 每个硅电极包括在硅互连上方突出的台面结构,并且每个硅电极可偏转到基底基板和硅电极之间的空腔中。 介电层覆盖每个台面结构的顶面。

    MICRO DEVICE TRANSFER HEAD ARRAY WITH METAL ELECTRODES
    12.
    发明申请
    MICRO DEVICE TRANSFER HEAD ARRAY WITH METAL ELECTRODES 有权
    带金属电极的微器件传输头阵列

    公开(公告)号:US20140158415A1

    公开(公告)日:2014-06-12

    申请号:US13710438

    申请日:2012-12-10

    CPC classification number: B81C99/002 H01L21/6835 H01L2221/68354

    Abstract: A monopolar and bipolar micro device transfer head array and method of forming a monopolar and bipolar micro device transfer array are described. In an embodiment, a micro device transfer head array includes a base substrate, a first insulating layer formed over the base substrate, and an array of mesa structures. A second insulating layer may be formed over the mesa structure, a patterned metal layer over the second insulating layer, and a dielectric layer covering the metal layer.

    Abstract translation: 描述了单极和双极微器件转移头阵列和形成单极和双极微器件转移阵列的方法。 在一个实施例中,微器件转移头阵列包括基底基板,形成在基底基板上的第一绝缘层和台面结构阵列。 可以在台面结构之上形成第二绝缘层,在第二绝缘层上形成图案化金属层,以及覆盖金属层的电介质层。

    LIGHT EMITTING DIODE STRUCTURE
    14.
    发明申请
    LIGHT EMITTING DIODE STRUCTURE 有权
    发光二极管结构

    公开(公告)号:US20130126827A1

    公开(公告)日:2013-05-23

    申请号:US13708695

    申请日:2012-12-07

    Abstract: A micro light emitting diode (LED) and a method of forming an array of micro LEDs for transfer to a receiving substrate are described. The micro LED structure may include a micro p-n diode and a metallization layer, with the metallization layer between the micro p-n diode and a bonding layer. A conformal dielectric barrier layer may span sidewalls of the micro p-n diode. The micro LED structure and micro LED array may be picked up and transferred to a receiving substrate.

    Abstract translation: 描述了微型发光二极管(LED)和形成用于传送到接收基板的微型LED阵列的方法。 微型LED结构可以包括微型p-n二极管和金属化层,金属化层位于微型p-n二极管和结合层之间。 保形介质阻挡层可以跨越微型p-n二极管的侧壁。 微型LED结构和微型LED阵列可以被拾取并转移到接收衬底。

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