公开(公告)号：US09673023B2

公开(公告)日：2017-06-06

申请号：US14710297

申请日：2015-05-12

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alex Goldenshtein

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/073 ,  H01J37/026 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/04 ,  H01J2237/063 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

公开(公告)号：US20160336146A1

公开(公告)日：2016-11-17

申请号：US14710297

申请日：2015-05-12

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alex GOLDENSHTEIN

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/073 ,  H01J37/026 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/04 ,  H01J2237/063 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

Abstract translation: 一种用于对物体进行成像的方法和系统，该系统可以包括电子光学器件，其可被配置为用至少一个电子束扫描物体的第一区域; 其中所述电子光学器件可包括第一电极; 以及可以被配置为照亮（a）第一电极和（b）物体的至少一个靶的光学元件，从而在第一电极和物体之间引起电子的发射。

公开(公告)号：US09401260B2

公开(公告)日：2016-07-26

申请号：US14217064

申请日：2014-03-17

Applicant: GLENN LANE FAMILY LIMITED LIABILITY LIMITED PARTNERSHIP

Inventor： Glenn E. Lane

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

Abstract translation: 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径，该离子注入系统基于离子束中不需要的注入质量比（和/或质荷比）来选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径，该质量分辨孔径被分段，可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭的等离子体通道（CPC）超导体或玻色子能量传输系统对带电粒子的流过滤。

公开(公告)号：US20160035536A1

公开(公告)日：2016-02-04

申请号：US14451289

申请日：2014-08-04

Applicant: Raytheon Company

Inventor： Bruce Chignola ,  Timothy M. Norcott ,  Brandon W. Blackburn ,  Paul F. Martin ,  Kenneth A. Levenson

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/224 ,  H01J37/244 ,  H01J37/261 ,  H01J2237/04 ,  H01J2237/2446 ,  H01J2237/24585

Abstract: A particle beam detector is disclosed. The particle beam detector can include a particle beam receiving portion configured to convert particle beam energy to heat, and a plurality of temperature measuring devices disposed about the particle beam receiving portion. A location of a particle beam on the particle beam receiving portion can be determined by a temperature difference between at least two of the plurality of temperature measuring devices.

Abstract translation: 公开了一种粒子束检测器。 粒子束检测器可以包括被配置为将粒子束能量转换成热的粒子束接收部分，以及围绕粒子束接收部分设置的多个温度测量装置。 颗粒束在粒子束接收部分上的位置可以通过多个温度测量装置中的至少两个之间的温度差来确定。

公开(公告)号：US20150380197A1

公开(公告)日：2015-12-31

申请号：US14849373

申请日：2015-09-09

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.

Inventor： Luca POPPI ,  Paolo BENEDETTI

IPC: H01J9/26 ,  B23K20/02

CPC classification number: H01J9/263 ,  B23K20/02 ,  H01J5/18 ,  H01J9/24 ,  H01J33/04 ,  H01J37/16 ,  H01J2237/04 ,  H01J2237/164 ,  H01J2237/166 ,  Y10T156/10 ,  Y10T428/13

Abstract: A method for assembling an electron exit window of an electron beam generating device comprises arranging a foil support plate on a housing of the electron beam generating device, bonding a window foil to a frame along at least one continuous bonding line, thus creating an exit window sub-assembly, and attaching the exit window sub-assembly onto the housing.

Abstract translation: 一种用于组装电子束产生装置的电子出射窗的方法包括：在电子束产生装置的壳体上布置箔片支撑板，沿着至少一个连续的接合线将窗口箔结合到框架上，从而形成出口窗口 子组件，并将出口窗子组件附接到壳体上。

公开(公告)号：US09207539B1

公开(公告)日：2015-12-08

申请号：US14607821

申请日：2015-01-28

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: H01J37/08 ,  H01J37/30 ,  G03F7/20 ,  H01J37/317 ,  H01J37/304

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

公开(公告)号：US09165693B2

公开(公告)日：2015-10-20

申请号：US14541236

申请日：2013-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: H01J37/141 ,  H05H1/28 ,  G21K1/02 ,  G21K5/04 ,  H01J37/30 ,  H01J37/24 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape.The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

Abstract translation: 本发明涉及一种准直器电极，包括设置有中心电极孔（82）的电极体（81），其中电极体限定两个相对的主表面之间的电极高度，并且其中电极体容纳冷却导管 （105），用于传送冷却液（102）。 电极体优选具有盘状或扁圆形状。 本发明还涉及一种用于带电粒子束发生器的准直器电极叠层，其包括第一准直器电极和第二准直器电极，每个准直器电极和第二准直器电极都设置有用于传送冷却液体（102）的冷却导管（105） 连接导管（110）用于第一和第二准直仪电极的冷却管道之间的液体连接。

公开(公告)号：US20150206708A1

公开(公告)日：2015-07-23

申请号：US14601446

申请日：2015-01-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masashi MURAMATSU ,  Tomokazu KOZAKAI ,  Fumio ARAMAKI

IPC: H01J37/304 ,  H01J37/28 ,  G21K5/02

CPC classification number: H01J37/304 ,  G21K5/02 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/2806 ,  H01J2237/317

Abstract: A charged particle beam apparatus is provided with: a charged particle beam column configured to irradiate a charged particle beam; and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.

Abstract translation: 带电粒子束装置具有：被配置成照射带电粒子束的带电粒子束柱; 以及控制器，其被配置为控制所述带电粒子束列以第一像素间隔照射所述带电粒子束用于第一区域，并且对于包含在所述第一区域中的第二区域以不同于所述第一像素间隔的第二像素间隔照射所述带电粒子束 第一个地区。

公开(公告)号：US20150136995A1

公开(公告)日：2015-05-21

申请号：US14541233

申请日：2014-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Willem Henk URBANUS

IPC: G21K1/02 ,  G21K5/04 ,  H01J37/30

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to a collimator electrode stack (70), comprising: at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160).The invention further relates to a method of operating a charged particle beam generator.

Abstract translation: 本发明涉及一种准直电极堆叠（70），包括：用于沿着光轴（A）准直带电粒子束的至少三个准直器电极（71-80），其中每个准直器电极包括具有电极孔 允许通过所述带电粒子束，其中所述电极体沿着与所述光轴基本平行的轴向方向（Z）间隔开，并且其中所述电极孔沿着所述光轴同轴对准; 以及设置在每对相邻的准直器电极之间并由电绝缘材料制成的多个间隔结构（89），用于沿着轴向将准直器电极定位在预定距离。 每个准直器电极（71-80）电连接到单独的电压输出（151-160）。 本发明还涉及一种操作带电粒子束发生器的方法。

公开(公告)号：US20130214156A1

公开(公告)日：2013-08-22

申请号：US13816466

申请日：2011-08-10

Applicant: Eric Kneedler ,  Jonathan H. Orloff

Inventor： Eric Kneedler ,  Jonathan H. Orloff

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。