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11.
公开(公告)号:US20070102683A1
公开(公告)日:2007-05-10
申请号:US11642697
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01B1/12
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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12.
公开(公告)号:US20070102682A1
公开(公告)日:2007-05-10
申请号:US11642695
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01B1/12
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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13.
公开(公告)号:US20070096065A1
公开(公告)日:2007-05-03
申请号:US11642696
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01B1/12
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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公开(公告)号:US09793198B2
公开(公告)日:2017-10-17
申请号:US14275519
申请日:2014-05-12
申请人: Invensas Corporation
发明人: Cyprian Emeka Uzoh , Rajesh Katkar
IPC分类号: H01L23/498 , B23K35/22 , B23K35/02 , B32B15/01 , H01L23/31 , H01L21/48 , H01L21/56 , H01L23/00 , H01L25/065 , H01L25/10 , H01L25/00 , B23K1/00 , B23K101/40
CPC分类号: H01L23/49811 , B23K1/0016 , B23K35/0244 , B23K35/0266 , B23K35/22 , B23K2101/40 , B32B15/01 , H01L21/4853 , H01L21/56 , H01L21/563 , H01L21/565 , H01L23/3114 , H01L23/3135 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/11 , H01L24/13 , H01L24/14 , H01L24/16 , H01L24/17 , H01L24/19 , H01L24/20 , H01L24/24 , H01L24/73 , H01L24/742 , H01L24/81 , H01L24/82 , H01L24/83 , H01L24/98 , H01L25/0652 , H01L25/0657 , H01L25/105 , H01L25/50 , H01L2224/03 , H01L2224/03001 , H01L2224/03009 , H01L2224/03318 , H01L2224/0332 , H01L2224/0333 , H01L2224/03334 , H01L2224/0348 , H01L2224/03848 , H01L2224/03849 , H01L2224/039 , H01L2224/03901 , H01L2224/0391 , H01L2224/04105 , H01L2224/05022 , H01L2224/051 , H01L2224/05294 , H01L2224/05547 , H01L2224/05567 , H01L2224/05573 , H01L2224/05582 , H01L2224/056 , H01L2224/05794 , H01L2224/05839 , H01L2224/05844 , H01L2224/05847 , H01L2224/05855 , H01L2224/0603 , H01L2224/06102 , H01L2224/10145 , H01L2224/11001 , H01L2224/11005 , H01L2224/11009 , H01L2224/111 , H01L2224/11318 , H01L2224/1132 , H01L2224/11334 , H01L2224/1134 , H01L2224/11848 , H01L2224/11849 , H01L2224/119 , H01L2224/11901 , H01L2224/1191 , H01L2224/13005 , H01L2224/13017 , H01L2224/13018 , H01L2224/13021 , H01L2224/13022 , H01L2224/13082 , H01L2224/131 , H01L2224/13116 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13169 , H01L2224/1319 , H01L2224/13294 , H01L2224/133 , H01L2224/13339 , H01L2224/13344 , H01L2224/13347 , H01L2224/13355 , H01L2224/13561 , H01L2224/13562 , H01L2224/13565 , H01L2224/136 , H01L2224/13609 , H01L2224/13611 , H01L2224/1403 , H01L2224/16058 , H01L2224/16059 , H01L2224/16145 , H01L2224/16147 , H01L2224/16148 , H01L2224/16227 , H01L2224/16238 , H01L2224/1701 , H01L2224/1703 , H01L2224/17181 , H01L2224/17505 , H01L2224/2101 , H01L2224/211 , H01L2224/2401 , H01L2224/2402 , H01L2224/24137 , H01L2224/24146 , H01L2224/2919 , H01L2224/32145 , H01L2224/73104 , H01L2224/73204 , H01L2224/73267 , H01L2224/75253 , H01L2224/81 , H01L2224/81138 , H01L2224/81141 , H01L2224/81193 , H01L2224/81203 , H01L2224/8121 , H01L2224/8122 , H01L2224/81224 , H01L2224/81815 , H01L2224/82005 , H01L2224/82101 , H01L2224/82102 , H01L2224/82105 , H01L2224/83 , H01L2224/8385 , H01L2224/9211 , H01L2225/06513 , H01L2225/1023 , H01L2225/1058 , H01L2924/00 , H01L2924/00012 , H01L2924/00014 , H01L2924/014 , H01L2924/07025 , H01L2924/15192 , H01L2924/15311 , H01L2924/15321 , H01L2924/3512 , H01L2924/381 , H01L2924/3841
摘要: A solder connection may be surrounded by a solder locking layer (1210, 2210) and may be recessed in a hole (1230) in that layer. The recess may be obtained by evaporating a vaporizable portion (1250) of the solder connection. Other features are also provided.
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15.
公开(公告)号:US07691664B2
公开(公告)日:2010-04-06
申请号:US11642664
申请日:2006-12-21
申请人: Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01L21/00
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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16.
公开(公告)号:US20080108218A1
公开(公告)日:2008-05-08
申请号:US11642664
申请日:2006-12-21
申请人: Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01L21/44
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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17.
公开(公告)号:US20070104881A1
公开(公告)日:2007-05-10
申请号:US11642720
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: B05D3/02
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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18.
公开(公告)号:US20070104869A1
公开(公告)日:2007-05-10
申请号:US11642749
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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19.
公开(公告)号:US20070102685A1
公开(公告)日:2007-05-10
申请号:US11642748
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01B1/12
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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20.
公开(公告)号:US20070096063A1
公开(公告)日:2007-05-03
申请号:US11642667
申请日:2006-12-21
申请人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
IPC分类号: H01B1/12
CPC分类号: H05K3/105 , C23C18/06 , C23C18/08 , H01B1/026 , H01L24/03 , H01L24/05 , H01L2224/05294 , H01L2224/053 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H05K1/097 , H05K2201/0154 , H05K2203/1131 , H01L2924/00
摘要: A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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