摘要:
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
摘要:
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
摘要:
A method is provided for forming a microlithographic relief image having a width of less than one half micron in a bilayer resist composition. The resist composition comprises a single component, silicon-containing photoimageable layer and a polymeric underlayer having a high optical density and a refractive index similar to the refractive index of the overlaying resist. The method provides for the formation of a relief image in the top layer using an i-line (365 nm) or deep ultra violet (170 to 300 nm) light source, followed by O.sub.2 RIE transfer of the relief image into the polymeric underlayer.
摘要:
The use of silicon-containing polyimide as an oxygen etch barrier in a metal lift-off process and as an oxygen etch stop in the fabrication of multi-layer metal structures is described. In practice, a lift-off layer is applied on a substrate, followed by a layer of silicon-containing polyimide and a layer of photoresist. The photoresist is lithographically patterned, and the developed image is transferred into the silicon-containing polyimide layer with a reactive ion etch using a CF.sub.4 /O.sub.2 gas mixture. The pattern is transferred to the lift-off layer in a reactive ion etch process using oxygen. Subsequent blanket metal evaporation followed by removal of the lift-off stencil results in the desired metal pattern on the substrate. In an alternate embodiment, the silicon-containing polyimide can be doped with a photoactive compound reducing the need for a separate photoresist imaging layer on the top.
摘要翻译:描述了在制造多层金属结构中使用含硅聚酰亚胺作为金属剥离工艺中的氧蚀刻阻挡层和作为氧蚀刻停止。 实际上,将剥离层施加在基底上,随后是一层含硅聚酰亚胺和一层光致抗蚀剂。 光致抗蚀剂被光刻图案化,并且使用CF 4 / O 2气体混合物通过反应离子蚀刻将显影的图像转移到含硅聚酰亚胺层中。 在使用氧的反应离子蚀刻工艺中将图案转移到剥离层。 随后的毯式金属蒸发,随后去除剥离模板,导致基材上所需的金属图案。 在替代实施例中,含硅聚酰亚胺可以掺杂光活性化合物,减少了在顶部上分离的光致抗蚀剂成像层的需要。
摘要:
An improved resistive ribbon for resistive thermal transfer printing is described in which the resistive layer of the ribbon has enhanced thermal and mechanical properties. The ribbon is a multi-layer ribbon including a resistive layer, an electrical current return layer, and an ink layer. The resistive layer has an additive therein which phase separates and concentrates in a thin surface region near the interface of the resistive layer and the current return layer. This thin region has superior thermal and mechanical properties, and protects the remainder of the resistive layer during the printing operation, without adversely affecting the mechanical, electrical, and thermal properties of the overall resistive layer. These additives are those which will form a polymer having a sufficiently high dissociation temperature to withstand the adverse effects of heat build-up at the interface. Suitable additives include graphite fluorides, fluorocarbon resins such as Teflon.RTM., and CeF.sub.4.
摘要:
Electroerosion recording materials are provided with a surface lubricant film of particulate lubricating nonconductive graphite fluoride and optional conductive materials in a polymeric binder. The lubricating agents reduce stylus scratching of the conductive layer during electroerosion printing, improve contrast, provide a beneficial coating on the writing electrode or stylus and improve the handling and writing characteristics of the recording material. The lubricating agents/polymer films are especially useful (1) where the substrate of the recording material is light transmissive and, after the electroerosion process, the resulting product is suitable for direct-negative applications and (2) where direct offset masters are produced by removal of noneroded lubricant film.
摘要:
Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and specifically hydrazone derivatives which are substantially colorless, and have a molecular weight in the approximate range 150-650.
摘要:
An improved lift-off process for multilevel metal structure in the fabrication of integrated circuits by employing lift-off layer formed from polymers which undergo clean depolymerization under the influence of heat or radiation and allow rapid and residue-free release of an "expendable mask". An embedded interconnection metallurgy system is formed by application of the lift-off layer of this invention over a cured polymer film or on an oxygen RIE barrier layer previously deposited on organic or inorganic substrate, followed by another barrier over which is then coated a radiation sensitive resist layer. After definition of the desired resist pattern by imagewise exposure and development, the image is replicated into the barrier by sputter etching in a fluorine containing ambient and subsequently into the base layer down to the substrate by oxygen reactive ion etching which is followed by blanket metal evaporation and finally the lift-off by brief heat treatment at the depolymerization temperature of the lift-off layer, and brief solvent soak.
摘要:
There are described photographic products, processes and compositions wherein cyclic crown ether ligands are utilized as silver halide solvents. Also disclosed are novel cyclic crown ether ligands.
摘要:
There are described novel acyclic silver complexing agents which are useful as silver halide solvents in photographic products, processes and compositions. Also disclosed are photographic compositions, products and processes in which the complexing agents are utilized.