Hermetic seal and reliable bonding structures for 3D applications
    43.
    发明授权
    Hermetic seal and reliable bonding structures for 3D applications 失效
    密封密封和3D应用的可靠结合结构

    公开(公告)号:US07683478B2

    公开(公告)日:2010-03-23

    申请号:US12026776

    申请日:2008-02-06

    Abstract: A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

    Abstract translation: 一种密封的微电子结构,其提供机械应力耐久性并且包括在多个位置处电连接到半导体结构的至少两个芯片。 每个芯片沿着其周边包括连续的接合材料,以及连接到位于每个芯片的周边内的每个芯片的至少一个支撑柱。 每个支撑柱向外延伸,使得当至少两个芯片彼此定位时,支撑柱彼此配合。 至少两个芯片之间的密封由芯片彼此的重叠关系产生,使得接合材料和支撑柱彼此配合。 因此,当至少两个芯片配合在一起时形成密封,并且导致粘合芯片结构。

    SEMICONDUCTOR DEVICES HAVING TENSILE AND/OR COMPRESSIVE STRESS AND METHODS OF MANUFACTURING
    45.
    发明申请
    SEMICONDUCTOR DEVICES HAVING TENSILE AND/OR COMPRESSIVE STRESS AND METHODS OF MANUFACTURING 有权
    具有拉伸和/或压缩应力的半导体器件及其制造方法

    公开(公告)号:US20090206407A1

    公开(公告)日:2009-08-20

    申请号:US12033280

    申请日:2008-02-19

    Abstract: A semiconductor device and method of manufacturing is disclosed which has a tensile and/or compressive strain applied thereto. The method includes forming at least one trench in a material; and filling the at least one trench by an oxidation process thereby forming a strain concentration in a channel of a device. The structure includes a gate structure having a channel and a first oxidized trench on a first of the channel, respectively. The first oxidized trench creates a strain component in the channel to increase device performance.

    Abstract translation: 公开了一种半导体器件和制造方法,其具有施加到其上的拉伸和/或压缩应变。 该方法包括在材料中形成至少一个沟槽; 以及通过氧化工艺填充所述至少一个沟槽,从而在器件的通道中形成应变集中。 该结构包括分别在第一通道上具有沟道和第一氧化沟槽的栅极结构。 第一氧化沟槽在通道中产生应变分量以增加器件性能。

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