公开(公告)号：US11892500B2

公开(公告)日：2024-02-06

申请号：US17857978

申请日：2022-07-05

申请人： SEMES CO., LTD.

发明人： Jin Ho Kang ,  Joo Hyun Seo

IPC分类号： G01P3/48 ,  G01R31/28 ,  H01L21/677 ,  B66B9/00

CPC分类号： G01R31/2867 ,  B66B9/00 ,  G01R31/2862 ,  H01L21/677

摘要： An elevator unit for transferring a tray includes a tray guide block on which a tray is seated, a wrapping connector driving member configured to elevate and lower the tray guide block, a fixed fastener connected to the tray guide block, and a corrective fastener connected to the wrapping connector driving member and configured to rotatably coupled to the fixed fastening member.

公开(公告)号：US11890864B2

公开(公告)日：2024-02-06

申请号：US17366322

申请日：2021-07-02

申请人： SEMES CO., LTD

发明人： Inseok Ha ,  Jinhyuck Yang ,  Jaeyoung Jang

IPC分类号： B41J11/00 ,  B05B7/06 ,  B05B13/02 ,  H01L21/683

CPC分类号： B41J11/0085 ,  B05B7/061 ,  B05B13/02 ,  H01L21/6838

摘要： An apparatus for supplying a chemical liquid may include a stage on which a substrate is placed, a chemical liquid discharging member and a direction changing member. The chemical liquid discharging member may supply the chemical liquid onto at least two first regions of the substrate for first pixels along a first direction. Additionally, the chemical liquid discharging member may supply the chemical liquid onto at least two second regions of the substrate for second pixels along a second direction. The direction changing member may change a direction of the substrate from the second direction to the first direction.

公开(公告)号：US20240034055A1

公开(公告)日：2024-02-01

申请号：US18347241

申请日：2023-07-05

申请人： SEMES CO., LTD.

发明人： Won Yong JIN ,  Suk Won JANG

IPC分类号： B41J2/045 ,  B41J29/17

CPC分类号： B41J2/04535 ,  B41J2/0456 ,  B41J29/17 ,  B41J2202/15

摘要： A droplet analysis unit capable of measuring and digitizing the meniscus shape, motion, and position of ink droplets and a substrate treatment apparatus including the droplet analysis unit are provided. The substrate treatment apparatus includes: a process treatment unit supporting a substrate while the substrate is being treated; an inkjet head unit treating the substrate by ejecting a substrate treatment liquid onto the substrate using a plurality of nozzles; a gantry unit moving the inkjet head unit over the substrate; and a droplet analysis unit measuring a meniscus in each of the nozzles that is associated with the substrate treatment liquid, wherein the droplet analysis unit measures and quantifies three-dimensional (3D) information regarding the meniscus.

公开(公告)号：US20240011158A1

公开(公告)日：2024-01-11

申请号：US18474493

申请日：2023-09-26

申请人： SEMES Co., Ltd.

发明人： Hee Hwan Kim ,  Cheol Yong Shin ,  Jae Youl Kim ,  Moon Sik Choi

IPC分类号： C23C16/458 ,  C23C16/455

CPC分类号： C23C16/4584 ,  C23C16/45565

摘要： According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.

公开(公告)号：US11869778B2

公开(公告)日：2024-01-09

申请号：US17137233

申请日：2020-12-29

申请人： SEMES CO., LTD.

发明人： Seungtae Yang ,  Gi Hun Choi ,  Buyoung Jung ,  Gui Su Park

IPC分类号： H01L21/67 ,  B08B3/12 ,  B08B3/08 ,  H01L21/687 ,  C02F9/00 ,  C02F1/00 ,  C02F1/36 ,  C02F1/48

CPC分类号： H01L21/67051 ,  B08B3/08 ,  B08B3/12 ,  C02F9/00 ,  H01L21/68764 ,  C02F1/001 ,  C02F1/36 ,  C02F1/484

摘要： An apparatus for processing a substrate includes a housing, a support unit that supports the substrate in the housing, a nozzle that dispenses a processing liquid onto the substrate, and a liquid supply unit that supplies the processing liquid to the nozzle. The liquid supply unit includes a container having a storage space in which the processing liquid is stored, a liquid supply tube through which the processing liquid flows from the container to the nozzle, and an ultrasonic-wave application member that applies ultrasonic waves to the processing liquid before the processing liquid is supplied to the nozzle. The ultrasonic-wave application member includes a liquid reservoir having an interior space in which a liquid is received and an ultrasonic generator that applies ultrasonic waves to the liquid received in the liquid reservoir. Part of the liquid supply tube is immersed in the liquid received in the liquid reservoir.

公开(公告)号：US20240006166A1

公开(公告)日：2024-01-04

申请号：US18332088

申请日：2023-06-09

申请人： SEMES CO., LTD.

发明人： Minyoung KIM ,  Hanglim LEE

IPC分类号： H01J37/32

CPC分类号： H01J37/32715 ,  H01J37/32541 ,  H01J37/32449

摘要： Provided is a substrate processing apparatus and substrate processing method capable of processing a substrate by using plasma, the substrate processing apparatus including a process chamber providing an internal space where a substrate is processed, a spin chuck serving as a lower electrode, supporting the substrate in the internal space of the process chamber, and rotating the supported substrate, and a plasma generation unit mounted in an upper portion of the process chamber to face the spin chuck, including a discharge space where an upper electrode is provided, generating plasma by using a process gas supplied from outside, linearly ejecting the plasma onto the substrate rotated by the spin chuck, and controlling a density of the plasma to change along an extension direction of the linearly ejected plasma.

公开(公告)号：US20240006160A1

公开(公告)日：2024-01-04

申请号：US18142442

申请日：2023-05-02

申请人： SEMES CO., LTD.

发明人： Kwangryul KIM ,  Yunsang KIM

IPC分类号： H01J37/32 ,  B23K26/352

CPC分类号： H01J37/32449 ,  H01J37/32568 ,  H01J37/32082 ,  B23K26/352 ,  H01J2237/002 ,  H01J2237/334

摘要： Provided is a substrate processing apparatus including a chamber including a processing space; a support table provided within the processing space of the chamber and configured to support a substrate; a dielectric plate covering an opening in an upper wall of the chamber; a transparent electrode provided on the dielectric plate; a laser supply head configured to supply a laser beam toward the substrate supported on the support table via the transparent electrode and the dielectric plate; and a cooling device configured to cool the transparent electrode by injecting a cooling gas toward the transparent electrode.

公开(公告)号：US20240001401A1

公开(公告)日：2024-01-04

申请号：US18099911

申请日：2023-01-20

申请人： SEMES CO., LTD.

发明人： Bong Moon LEE

IPC分类号： B05C13/00 ,  B05C5/02 ,  B08B7/04 ,  B08B5/04 ,  B08B3/02 ,  B65G49/06

CPC分类号： B05C13/00 ,  B05C5/0291 ,  B08B7/04 ,  G02B5/201 ,  B08B3/022 ,  B65G49/061 ,  B08B5/043

摘要： An apparatus for preventing blockage of a floating stage includes a moving member moving between a floating stage for lifting a substrate and a nozzle disposed above the floating stage, and a cover installed on the moving member and moving between the floating stage and the nozzle by the moving member to cover the floating stage.

公开(公告)号：US20230415207A1

公开(公告)日：2023-12-28

申请号：US18328203

申请日：2023-06-02

申请人： SEMES CO., LTD.

发明人： Sunghun EOM ,  Kangsul KIM ,  Youngjun SON ,  Seongyeol CHOI

IPC分类号： B08B3/12 ,  H01L21/67 ,  H01L21/02

CPC分类号： B08B3/12 ,  H01L21/67057 ,  H01L21/02052

摘要： An apparatus for cleaning a back side of a substrate may include a cleaning assembly which may include a cleaning solution supply part receiving a cleaning solution and an ultrasonic wave supply part applying an ultrasonic wave to the cleaning solution such that a column of the cleaning solution is formed from the cleaning solution supply part toward the back side of the substrate. The back side of the substrate may be cleaned by contacting the column of the cleaning solution with the back side of the substrate.

公开(公告)号：US11856680B2

公开(公告)日：2023-12-26

申请号：US17243954

申请日：2021-04-29

申请人： SEMES CO., LTD.

发明人： Sun Whan Kim ,  Byung Du Jeon

IPC分类号： H05F3/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B13/00

CPC分类号： H05F3/02 ,  B08B3/02 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/68764 ,  H01L21/67023

摘要： A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.