公开(公告)号：US07906836B2

公开(公告)日：2011-03-15

申请号：US12347184

申请日：2008-12-31

申请人： Hsien-Wei Chen ,  Yu-Wen Liu ,  Jyh-Cherng Sheu ,  Hao-Yi Tsai ,  Shin-Puu Jeng ,  Chen-Hua Yu ,  Shang-Yun Hou

发明人： Hsien-Wei Chen ,  Yu-Wen Liu ,  Jyh-Cherng Sheu ,  Hao-Yi Tsai ,  Shin-Puu Jeng ,  Chen-Hua Yu ,  Shang-Yun Hou

IPC分类号： H01L23/34

CPC分类号： H01L23/3677 ,  B23K26/364 ,  B23K26/40 ,  B23K2103/172 ,  H01L21/78 ,  H01L22/34 ,  H01L23/585 ,  H01L2924/0002 ,  H01L2924/00

摘要： An integrated circuit structure includes a first chip including a first edge; and a second chip having a second edge facing the first edge. A scribe line is between and adjoining the first edge and the second edge. A heat spreader includes a portion in the scribe line, wherein the heat spreader includes a plurality of vias and a plurality of metal lines. The portion of the heat spreader in the scribe line has a second length at least close to, or greater than, a first length of the first edge.

摘要翻译： 集成电路结构包括：第一芯片，包括第一边缘; 以及具有面向第一边缘的第二边缘的第二芯片。 划线在第一边缘和第二边缘之间并相邻。 散热器包括划线中的一部分，其中散热器包括多个通孔和多个金属线。 散热器在划线中的部分具有至少接近或大于第一边缘的第一长度的第二长度。

公开(公告)号：US07776627B2

公开(公告)日：2010-08-17

申请号：US11971072

申请日：2008-01-08

申请人： Shin-Puu Jeng ,  Shang-Yun Hou ,  Hao-Yi Tsai ,  Anbiarshy N. F. Wu

发明人： Shin-Puu Jeng ,  Shang-Yun Hou ,  Hao-Yi Tsai ,  Anbiarshy N. F. Wu

IPC分类号： H01L21/66

CPC分类号： H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for forming an integrated circuit structure includes forming a test wafer. The step of forming the test wafer includes providing a first semiconductor substrate; and forming a first plurality of unit blocks over the first semiconductor substrate. Each of the first plurality of unit blocks includes a plurality of connection block cells arranged as an array. Each of the connection block cells includes two connection blocks, and a metal line connecting the two connection blocks. The method further includes forming a plurality of unit block boundary lines separating the first plurality of unit blocks from each other; and forming a first plurality of metal lines connecting a portion of the first plurality of unit blocks.

摘要翻译： 一种用于形成集成电路结构的方法包括形成测试晶片。 形成测试晶片的步骤包括提供第一半导体衬底; 以及在所述第一半导体衬底上形成第一多个单元块。 第一多个单元块中的每一个包括被排列成阵列的多个连接块单元。 每个连接块单元包括两个连接块和连接两个连接块的金属线。 该方法还包括形成将第一多个单元块彼此分离的多个单元块边界线; 以及形成连接所述第一多个单元块的一部分的第一多个金属线。

公开(公告)号：US20100187687A1

公开(公告)日：2010-07-29

申请号：US12619503

申请日：2009-11-16

申请人： Yu-Wen Liu ,  Hao-Yi Tsai ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Ying-Ju Chen ,  Shang-Yun Hou ,  Pei-Haw Tsao ,  Chen-Hua Yu

发明人： Yu-Wen Liu ,  Hao-Yi Tsai ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Ying-Ju Chen ,  Shang-Yun Hou ,  Pei-Haw Tsao ,  Chen-Hua Yu

IPC分类号： H01L23/488 ,  H01L21/60

CPC分类号： H01L24/05 ,  H01L23/3157 ,  H01L24/03 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02125 ,  H01L2224/0215 ,  H01L2224/0345 ,  H01L2224/03462 ,  H01L2224/0401 ,  H01L2224/05018 ,  H01L2224/05027 ,  H01L2224/0508 ,  H01L2224/05096 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05541 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05557 ,  H01L2224/05558 ,  H01L2224/05566 ,  H01L2224/05569 ,  H01L2224/05572 ,  H01L2224/05573 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11849 ,  H01L2224/13005 ,  H01L2224/13007 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2924/00013 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/05042 ,  H01L2924/05442 ,  H01L2924/00014 ,  H01L2924/2064 ,  H01L2224/13099 ,  H01L2224/05099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/29099 ,  H01L2224/29599

摘要： A system and method for forming an underbump metallization (UBM) is presented. A preferred embodiment includes a raised UBM which extends through a passivation layer so as to make contact with a contact pad while retaining enough of the passivation layer between the contact pad and the UBM to adequately handle the peeling and shear stress that results from CTE mismatch and subsequent thermal processing. The UBM contact is preferably formed in either an octagonal ring shape or an array of contacts.

摘要翻译： 提出了一种用于形成底部金属化（UBM）的系统和方法。 优选实施例包括凸起的UBM，其延伸穿过钝化层以便与接触焊盘接触，同时在接触焊盘和UBM之间保留足够的钝化层以充分地处理由CTE失配引起的剥离和剪切应力， 后续热处理。 UBM触点优选地形成为八边形环形或触点阵列。

公开(公告)号：US20080265378A1

公开(公告)日：2008-10-30

申请号：US11796202

申请日：2007-04-27

申请人： Hsin-Hui Lee ,  Mirng-Ji Lii ,  Shin-Puu Jeng ,  Shang-Yun Hou

发明人： Hsin-Hui Lee ,  Mirng-Ji Lii ,  Shin-Puu Jeng ,  Shang-Yun Hou

IPC分类号： H01L23/544

CPC分类号： H01L23/544 ,  H01L23/585 ,  H01L2223/5442 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A scribe line layout design to reduce the damage caused by sawing the wafer is presented. An embodiment comprises metal plates located within the scribe lines and at least partially within the junctions of the scribe lines. Each of these metal plates has one or more slots to help relieve the pressure. Alternatively, instead of metal plates, grooves that may be filled with metal could be placed into the scribe lines. These metal plates could also be used concurrently with a seal ring for better protection during sawing.

摘要翻译： 提出了一种划线设计，以减少锯切锯片造成的损坏。 一个实施例包括位于划线内且至少部分地位于划线内的金属板。 这些金属板中的每一个具有一个或多个槽以帮助减轻压力。 或者，代替金属板，可以将填充有金属的凹槽放置在划线中。 这些金属板也可以与密封环同时使用，以便在锯切期间更好地保护。

公开(公告)号：US20070224794A1

公开(公告)日：2007-09-27

申请号：US11390951

申请日：2006-03-27

申请人： Hao-Yi Tsai ,  Shang-Yun Hou ,  Anbiarshy Wu ,  Chia-Lun Tsai ,  Shin-Puu Jeng

发明人： Hao-Yi Tsai ,  Shang-Yun Hou ,  Anbiarshy Wu ,  Chia-Lun Tsai ,  Shin-Puu Jeng

IPC分类号： H01L21/44

CPC分类号： H01L23/5258 ,  H01L24/11 ,  H01L2224/13099 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01025 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/14

摘要： An integrated circuit structure comprising a fuse and a method for forming the same are provided. The integrated circuit structure includes a substrate, an interconnection structure over the substrate, a fuse connected to the interconnection structure, and an anti-reflective coating (ARC) on the fuse. The ARC has an increased thickness and acts as a remaining oxide, and no further remaining passivation layer exists on the ARC.

摘要翻译： 提供一种包括熔丝的集成电路结构及其形成方法。 集成电路结构包括衬底，衬底上的互连结构，连接到互连结构的熔丝以及熔丝上的抗反射涂层（ARC）。 ARC具有增加的厚度并用作剩余氧化物，并且ARC上不存在进一步的剩余钝化层。

公开(公告)号：US08294264B2

公开(公告)日：2012-10-23

申请号：US12750221

申请日：2010-03-30

申请人： Tzu-Yu Wang ,  Chi-Chun Hsieh ,  An-Jhih Su ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Liwei Lin

发明人： Tzu-Yu Wang ,  Chi-Chun Hsieh ,  An-Jhih Su ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Liwei Lin

IPC分类号： H01L23/48 ,  H01L23/52

CPC分类号： H01L24/05 ,  H01L24/03 ,  H01L24/04 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/0347 ,  H01L2224/03828 ,  H01L2224/0401 ,  H01L2224/05551 ,  H01L2224/05552 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05669 ,  H01L2224/1147 ,  H01L2224/13007 ,  H01L2224/13015 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/14 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

摘要： An under-bump metallization (UBM) structure for a semiconductor device is provided. The UBM structure has a center portion and extensions extending out from the center portion. The extensions may have any suitable shape, including a quadrangle, a triangle, a circle, a fan, a fan with extensions, or a modified quadrangle having a curved surface. Adjacent UBM structures may have the respective extensions aligned or rotated relative to each other. Flux may be applied to a portion of the extensions to allow an overlying conductive bump to adhere to a part of the extensions.

摘要翻译： 提供了一种用于半导体器件的凸块下金属化（UBM）结构。 UBM结构具有从中心部分延伸出的中心部分和延伸部分。 延伸部可以具有任何合适的形状，包括四边形，三角形，圆形，风扇，具有延伸部的风扇或具有弯曲表面的改进的四边形。 相邻的UBM结构可以具有相对于彼此对准或旋转的相应延伸部。 焊剂可以施加到延伸部分的一部分，以允许覆盖的导电凸块粘附到延伸部分的一部分上。

公开(公告)号：US20110241201A1

公开(公告)日：2011-10-06

申请号：US12750221

申请日：2010-03-30

申请人： Tzu-Yu Wang ,  Chi-Chun Hsieh ,  An-Jhih Su ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Liwei Lin

发明人： Tzu-Yu Wang ,  Chi-Chun Hsieh ,  An-Jhih Su ,  Hsien-Wei Chen ,  Shin-Puu Jeng ,  Liwei Lin

IPC分类号： H01L23/498 ,  H01L21/768

CPC分类号： H01L24/05 ,  H01L24/03 ,  H01L24/04 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/0347 ,  H01L2224/03828 ,  H01L2224/0401 ,  H01L2224/05551 ,  H01L2224/05552 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05669 ,  H01L2224/1147 ,  H01L2224/13007 ,  H01L2224/13015 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/14 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

摘要： An under-bump metallization (UBM) structure for a semiconductor device is provided. The UBM structure has a center portion and extensions extending out from the center portion. The extensions may have any suitable shape, including a quadrangle, a triangle, a circle, a fan, a fan with extensions, or a modified quadrangle having a curved surface. Adjacent UBM structures may have the respective extensions aligned or rotated relative to each other. Flux may be applied to a portion of the extensions to allow an overlying conductive bump to adhere to a part of the extensions.

摘要翻译： 提供了一种用于半导体器件的凸块下金属化（UBM）结构。 UBM结构具有从中心部分延伸出的中心部分和延伸部分。 延伸部可以具有任何合适的形状，包括四边形，三角形，圆形，风扇，具有延伸部的风扇或具有弯曲表面的改进的四边形。 相邻的UBM结构可以具有相对于彼此对准或旋转的相应延伸部。 焊剂可以施加到延伸部分的一部分，以允许覆盖的导电凸块粘附到延伸部分的一部分上。

公开(公告)号：US09960088B2

公开(公告)日：2018-05-01

申请号：US13290879

申请日：2011-11-07

申请人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B24B49/10 ,  H01L21/66 ,  B24B37/013 ,  B24B7/22 ,  H01L23/31

CPC分类号： H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

公开(公告)号：US09349655B2

公开(公告)日：2016-05-24

申请号：US12391821

申请日：2009-02-24

申请人： Carlos H. Diaz ,  Yi-Ming Sheu ,  Anson Wang ,  Kong-Beng Thei ,  Sheng-Chen Chung ,  Hao-Yi Tsai ,  Hsien-Wei Chen ,  Harry Hak-Lay Chuang ,  Shin-Puu Jeng

发明人： Carlos H. Diaz ,  Yi-Ming Sheu ,  Anson Wang ,  Kong-Beng Thei ,  Sheng-Chen Chung ,  Hao-Yi Tsai ,  Hsien-Wei Chen ,  Harry Hak-Lay Chuang ,  Shin-Puu Jeng

IPC分类号： H01L21/70 ,  H01L21/8238 ,  H01L27/02 ,  H01L29/165 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L21/823807 ,  H01L21/823828 ,  H01L27/0207 ,  H01L29/165 ,  H01L29/66628 ,  H01L29/7848

摘要： The present disclosure provides an integrated circuit. The integrated circuit includes a semiconductor substrate having an active region; at least one operational device on the active region, wherein the operational device include a strained channel; and at least one first dummy gate disposed at a side of the operational device and on the active region.

摘要翻译： 本发明提供集成电路。 集成电路包括具有有源区的半导体衬底; 所述活动区域上的至少一个操作装置，其中所述操作装置包括应变通道; 以及设置在所述操作装置的一侧和所述有源区域上的至少一个第一伪栅极。

公开(公告)号：US20130087951A1

公开(公告)日：2013-04-11

申请号：US13270957

申请日：2011-10-11

申请人： Jing-Cheng Lin ,  Hsien-Wen Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Jing-Cheng Lin ,  Hsien-Wen Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： H05B6/64 ,  B29C35/08

CPC分类号： B29C35/0805 ,  B29C2035/0855 ,  H01L21/565 ,  H05B6/6491 ,  H05B6/806

摘要： An embodiment is a molding chamber. The molding chamber comprises a mold-conforming chase, a substrate-base chase, a first radiation permissive component, and a microwave generator coupled to a first waveguide. The mold-conforming chase is over the substrate-base chase, and the mold-conforming chase is moveable in relation to the substrate-base chase. The first radiation permissive component is in one of the mold-conforming chase or the substrate-base chase. The microwave generator and the first waveguide are together operable to direct microwave radiation through the first radiation permissive component.