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    Corona/plasma treatment machine
    82.
    发明授权
    Corona/plasma treatment machine 有权

    公开(公告)号：US11848175B2

    公开(公告)日：2023-12-19

    申请号：US17702391

    申请日：2022-03-23

    Applicant: 3DT LLC

    Inventor： Donald J. Weyer ,  Alex E. Kiel ,  Phillip Pulvermacher

    IPC: H01J37/32 ,  H01J37/24

    CPC classification number: H01J37/32073 ,  H01J37/241 ,  H01J2237/038 ,  H01J2237/06375

    Abstract: A corona/plasma treatment machine includes an array of electrodes arranged in a helix along a conductive central cylinder, allowing for the efficient surface treatment of materials with greater cross-sectional heights and widths than what is conventionally possible. The corona/plasma treatment machine further includes of a high frequency, high voltage power source, a dielectric, and a contact plate. The array of electrodes is driven using a motor and rotates about its longitudinal axis and is electrically isolated from its surroundings. When power is supplied to the electrode array, electrical energy is discharged from the tips of the electrodes near the contact plate and creates a plasma corona aura formed from the ionization of the surrounding air between the electrode array and the contact plate. A conveyor is positioned below the electrode array and configured to feed material through the plasma corona aura.

    CHARGED PARTICLE BEAM DEVICE PROVIDED WITH ION PUMP
    83.
    发明申请
    CHARGED PARTICLE BEAM DEVICE PROVIDED WITH ION PUMP 审中-公开

    公开(公告)号：US20180158648A1

    公开(公告)日：2018-06-07

    申请号：US15570803

    申请日：2015-05-01

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Masazumi TONE ,  Hiroshi TOUDA ,  Fujio ONISHI

    IPC: H01J37/24 ,  H01J37/244 ,  H01J37/22 ,  H01J37/08 ,  H01J37/248 ,  H01J37/26

    CPC classification number: H01J37/241 ,  H01J37/08 ,  H01J37/18 ,  H01J37/222 ,  H01J37/244 ,  H01J37/248 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/2448

    Abstract: In a charged particle apparatus with an ion pump, which is a charged particle beam apparatus with an ion pump including a charged particle beam irradiation detecting unit for irradiating a sample with a charged particle beam in a chamber and detecting a secondary charged particle, an image processing unit for forming a secondary charged particle image from a detection signal of the detected secondary charged particle, an output unit for processing at the image processing unit and outputting an image, an ion pump for maintaining the interior of the processing chamber in a vacuum state, a driving power supply unit of the ion pump, and a high voltage cable for connecting the ion pump and the driving power supply unit, the driving power supply unit of the ion pump is structured to include a high voltage power supply circuit unit for operating the ion pump, a load current detection circuit unit for detecting a load current applied to the ion pump, and a canceller circuit unit for reducing low frequency noise applied to the load current detection circuit unit in order to sufficiently reduce low frequency noise of the power supply of the ion and to measure the degree of vacuum with a high accuracy.

    Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus
    87.
    发明授权
    Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus 有权
    带电粒子束产生装置，带电粒子束装置，高压发生装置和高电位装置

    公开(公告)号：US09548182B2

    公开(公告)日：2017-01-17

    申请号：US14406909

    申请日：2013-05-08

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Takashi Onishi ,  Shunichi Watanabe ,  Minoru Kaneda

    IPC: H01J37/04 ,  H01J37/073 ,  H01J37/02 ,  H01J37/067 ,  H01J37/248 ,  H01J37/24 ,  H01J27/02 ,  H01J29/48 ,  H01J37/16

    CPC classification number: H01J37/04 ,  H01J27/024 ,  H01J29/485 ,  H01J37/026 ,  H01J37/067 ,  H01J37/073 ,  H01J37/16 ,  H01J37/241 ,  H01J37/248 ,  H01J2237/16

    Abstract: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

    Abstract translation: 根据本发明的产生带电粒子束的仪器具有：带电粒子源; 多个第一电极，其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成，并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个，所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

    RF IMPEDANCE MATCHING NETWORK
    88.
    发明申请
    RF IMPEDANCE MATCHING NETWORK 有权
    射频阻抗匹配网络

    公开(公告)号：US20150200079A1

    公开(公告)日：2015-07-16

    申请号：US14669568

    申请日：2015-03-26

    Applicant: Reno Technologies, Inc.

    Inventor： Imran Ahmed Bhutta

    IPC: H01J37/32 ,  H01L21/67 ,  H01J37/244 ,  H01J37/248 ,  H01J37/24

    CPC classification number: H01J37/32183 ,  H01J37/241 ,  H01J37/244 ,  H01J37/248 ,  H01L21/67253 ,  H03H7/40 ,  H03H11/30

    Abstract: An RF impedance matching network includes an RF input; an RF output configured to operably couple to a plasma chamber; a series electronically variable capacitor (“series EVC”), the series EVC electrically coupled in series between the RF input and the RF output; and a shunt electronically variable capacitor (“shunt EVC”), the shunt EVC electrically coupled in parallel between a ground and one of the RF input and the RF output; a control circuit to control the series variable capacitance and the shunt variable capacitance, wherein the control circuit is configured to determine the variable plasma impedance of the plasma chamber, determine a series capacitance value and a shunt capacitance value, and generate a control signal to alter at least one of the series variable capacitance and the shunt variable capacitance; wherein the alteration is caused by at least one of a plurality of switching circuits.

    Abstract translation: RF阻抗匹配网络包括RF输入; 被配置为可操作地耦合到等离子体室的RF输出; 串联电可变电容器（“EVC”系列），串联EVC串联在RF输入和RF输出之间; 和分流电可变电容器（“并联EVC”），并联电气并联在地与RF输入和RF输出中的一个之间的并联EVC; 用于控制串联可变电容和分流可变电容的控制电路，其中控制电路被配置为确定等离子体室的可变等离子体阻抗，确定串联电容值和并联电容值，并产生控制信号以改变 串联可变电容和分流可变电容中的至少一个; 其中所述改变由多个开关电路中的至少一个引起。

    Variable energy charged particle systems
    89.
    发明授权
    Variable energy charged particle systems 有权
    可变能量带电粒子系统

    公开(公告)号：US08766210B2

    公开(公告)日：2014-07-01

    申请号：US13328326

    申请日：2011-12-16

    Applicant: Raymond Hill ,  John Notte, IV

    Inventor： Raymond Hill ,  John Notte, IV

    IPC: H01J49/10 ,  H01J27/02 ,  H01J27/26

    CPC classification number: H01J37/26 ,  H01J37/06 ,  H01J37/08 ,  H01J37/241 ,  H01J37/243 ,  H01J2237/08 ,  H01J2237/24564

    Abstract: Charged particle system are disclosed and include a first voltage source, a second voltage source electrically isolated from the first voltage source, a charged particle source electrically connected to the first voltage source, and an extractor electrically connected to the second voltage source. Methods relating to the charged particle systems are also disclosed.

    Abstract translation: 公开了带电粒子系统，并且包括第一电压源，与第一电压源电隔离的第二电压源，电连接到第一电压源的带电粒子源，以及电连接到第二电压源的提取器。 还公开了与带电粒子系统有关的方法。

    Calibrated energy transfer
    90.
    发明授权
    Calibrated energy transfer 有权
    校准能量转移

    公开(公告)号：US08742306B2

    公开(公告)日：2014-06-03

    申请号：US12984305

    申请日：2011-01-04

    Applicant: Daniella Atzmony ,  Eran Ben-Shmuel ,  Steven Robert Rogers ,  Amichai Ron ,  Daniel Selinger ,  Eyal Torres

    Inventor： Daniella Atzmony ,  Eran Ben-Shmuel ,  Steven Robert Rogers ,  Amichai Ron ,  Daniel Selinger ,  Eyal Torres

    IPC: H05B6/50 ,  A61N5/00

    CPC classification number: H01J37/241 ,  H02J17/00 ,  H02J50/12 ,  H02J50/20 ,  H02J50/30 ,  H02J50/80 ,  H02J50/90 ,  H05B6/6441 ,  H05B6/68 ,  H05B6/687 ,  H05B6/701 ,  H05B6/705 ,  Y02B40/143 ,  Y02B40/146

    Abstract: Apparatuses, methods, kits, and systems relating to transferring electromagnetic energy to an energy application zone via a source of electromagnetic energy are disclosed. Some apparatuses may include a processor configured to determine a preliminary amount of energy to be dissipated in an object located at least partially in the energy application zone and determine a corrected amount of energy based on the preliminary amount of energy and calibration information. The processor may be further configured to estimate an amount of energy dissipated in the object. The processor may also be configured to cause the source to transfer energy to the energy application zone at least until the energy dissipated in the object as estimated equals the corrected amount of energy.

    Abstract translation: 公开了通过电磁能量将电磁能传递到能量施加区域的装置，方法，试剂盒和系统。 一些设备可以包括处理器，其被配置为确定要在至少部分地位于能量施加区域中的物体中消耗的能量的初步量，并且基于初步的能量量和校准信息确定校正的能量量。 处理器可以被进一步配置为估计物体中耗散的能量的量。 处理器还可以被配置为使源将能量传递到能量施加区域，至少直到被估计的消耗在物体中的能量等于校正的能量量。

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