公开(公告)号：US08629059B2

公开(公告)日：2014-01-14

申请号：US12969977

申请日：2010-12-16

Applicant: Ho-Jin Lee ,  Kang-Wook Lee ,  Myeong-Soon Park ,  Ju-il Choi ,  Son-Kwan Hwang

Inventor： Ho-Jin Lee ,  Kang-Wook Lee ,  Myeong-Soon Park ,  Ju-il Choi ,  Son-Kwan Hwang

IPC: H01L23/48

CPC classification number: H01L23/528 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/5226 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/06181 ,  H01L2224/13009 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/15311 ,  H01L2924/00012

Abstract: Methods of forming an integrated circuit device include forming an interlayer dielectric layer on a first surface of a semiconductor substrate and then forming an interconnect hole that extends through the interlayer dielectric layer and into the semiconductor substrate. A first sidewall spacer layer is formed on a sidewall of the interconnect hole. The semiconductor substrate at a bottom of the interconnect hole is isotropically etched to define an undercut recess in the semiconductor substrate. This etching step is performed using the first sidewall spacer layer as an etching mask. The interconnect hole and the uncut recess are then filled with a through-via electrode. A second surface of the semiconductor substrate is removed for a sufficient duration to expose the uncut recess containing the through-via electrode.

Abstract translation: 形成集成电路器件的方法包括在半导体衬底的第一表面上形成层间电介质层，然后形成延伸穿过层间电介质层并进入半导体衬底的互连孔。 第一侧壁间隔层形成在互连孔的侧壁上。 在互连孔的底部的半导体衬底被各向同性蚀刻以在半导体衬底中限定底切凹部。 该蚀刻步骤使用第一侧壁间隔层作为蚀刻掩模进行。 然后用通孔电极填充互连孔和未切割凹部。 去除半导体衬底的第二表面足够的持续时间以露出包含通孔电极的未切割凹部。

公开(公告)号：US08513802B2

公开(公告)日：2013-08-20

申请号：US13013290

申请日：2011-01-25

Applicant: Keum-Hee Ma ,  Woo-Dong Lee ,  Min-Seung Yoon ,  Ju-Il Choi ,  Sang-Sick Park ,  Son-Kwan Hwang

Inventor： Keum-Hee Ma ,  Woo-Dong Lee ,  Min-Seung Yoon ,  Ju-Il Choi ,  Sang-Sick Park ,  Son-Kwan Hwang

IPC: H01L23/48

CPC classification number: H01L25/0657 ,  H01L21/561 ,  H01L21/563 ,  H01L23/481 ,  H01L23/49816 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06555

Abstract: A semiconductor device having semiconductor chips of different thicknesses is provided. The semiconductor device may include a first semiconductor chip, a sub-board on a first side of the first semiconductor chip, at least one second semiconductor chip on a second side of the first semiconductor chip, at least one external contact terminal on the at least one second semiconductor chip. In example embodiments the at least one second semiconductor chip may include a plurality of through silicon vias and the at least one external contact terminal may be in electrical contact with the first semiconductor chip and the at least one second semiconductor chip via the plurality of through silicon vias. In example embodiments, the at least one second semiconductor chip may be thinner than the first semiconductor chip.

Abstract translation: 提供具有不同厚度的半导体芯片的半导体器件。 半导体器件可以包括第一半导体芯片，在第一半导体芯片的第一侧上的子板，在第一半导体芯片的第二侧上的至少一个第二半导体芯片，至少一个外部接触端子 一秒钟的半导体芯片。 在示例实施例中，所述至少一个第二半导体芯片可以包括多个通孔硅通孔，并且所述至少一个外部接触端子可以经由多个通孔与第一半导体芯片和至少一个第二半导体芯片电接触 通孔 在示例实施例中，至少一个第二半导体芯片可以比第一半导体芯片更薄。

公开(公告)号：US20090085224A1

公开(公告)日：2009-04-02

申请号：US12244591

申请日：2008-10-02

Applicant: Ju-Il CHOI ,  Hyun-Soo CHUNG ,  In-Young LEE ,  Ho-Jin LEE ,  Son-Kwan HWANG

Inventor： Ju-Il CHOI ,  Hyun-Soo CHUNG ,  In-Young LEE ,  Ho-Jin LEE ,  Son-Kwan HWANG

IPC: H01L23/538 ,  H01L21/58

CPC classification number: H01L24/29 ,  H01L21/561 ,  H01L23/3121 ,  H01L24/24 ,  H01L24/82 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/24145 ,  H01L2224/29101 ,  H01L2224/9202 ,  H01L2224/97 ,  H01L2225/06541 ,  H01L2225/06551 ,  H01L2225/06575 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2224/82 ,  H01L2924/00

Abstract: Provided is a stack-type semiconductor package including a base chip having a circuit formed on one of its surfaces, at least one stack chip having a circuit stacked on the base chip, an adhesive interposed between the base chip and the stack chip, and signal transmission members formed along a lateral surface of the stack chip. The fabrication process of this stack-type semiconductor package may be simplified and the number of process operations may be lessened, thereby reducing the production time and cost. Also, a state of electrical contact of a terminal with a signal transmission member may be solidified, thereby improving the reliability of the stack-type semiconductor package. Furthermore, new post-type signal transmission members are adopted instead of wires or electrodes so that the structural stability and productivity of the stack-type semiconductor package may be markedly enhanced.

Abstract translation: 提供了一种堆叠型半导体封装，其包括具有形成在其一个表面上的电路的基底芯片，具有堆叠在基底芯片上的电路的至少一个堆叠芯片，插入在基底芯片和堆叠芯片之间的粘合剂，以及信号 传输构件沿着堆叠芯片的侧表面形成。 可以简化该堆叠型半导体封装的制造工艺，并且可以减少工艺操作的数量，从而减少生产时间和成本。 此外，端子与信号传输部件的电接触的状态可以被固化，从而提高堆叠型半导体封装的可靠性。 此外，采用新的后置型信号传输构件代替线或电极，从而可以显着提高堆叠型半导体封装的结构稳定性和生产率。

公开(公告)号：US20090008790A1

公开(公告)日：2009-01-08

申请号：US12132925

申请日：2008-06-04

Applicant: Ho-Jin LEE ,  Nam-Seog KIM ,  Yong-Chai KWON ,  Hyun-Soo CHUNG ,  In-Young LEE ,  Son-Kwan HWANG

Inventor： Ho-Jin LEE ,  Nam-Seog KIM ,  Yong-Chai KWON ,  Hyun-Soo CHUNG ,  In-Young LEE ,  Son-Kwan HWANG

IPC: H01L23/48

CPC classification number: H01L24/05 ,  H01L23/481 ,  H01L24/03 ,  H01L24/06 ,  H01L24/13 ,  H01L24/32 ,  H01L25/0657 ,  H01L2224/02372 ,  H01L2224/034 ,  H01L2224/036 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05011 ,  H01L2224/05552 ,  H01L2224/05559 ,  H01L2224/05561 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/06136 ,  H01L2224/06181 ,  H01L2224/08146 ,  H01L2224/32145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/0102 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/19041 ,  H01L2924/00014

Abstract: A semiconductor device having a through electrode and a method of fabricating the same are disclosed. In one embodiment, a semiconductor device includes a first insulating layer formed on a semiconductor substrate. A wiring layer having a first aperture to expose a portion of the first insulating layer is formed on the first insulating layer. A second insulating layer is formed on an upper portion of the wiring layer and in the first aperture. A conductive pad having a second aperture to expose a portion of the second insulating layer is formed on the second insulating layer. A through hole with a width narrower than widths of the first and second apertures is formed through the first and second insulating layers and an upper portion of the semiconductor substrate. A through electrode is formed in the through hole.

Abstract translation: 公开了一种具有通孔的半导体器件及其制造方法。 在一个实施例中，半导体器件包括形成在半导体衬底上的第一绝缘层。 具有用于露出第一绝缘层的一部分的第一孔的布线层形成在第一绝缘层上。 第二绝缘层形成在布线层的上部和第一孔中。 具有第二孔径以暴露第二绝缘层的一部分的导电焊盘形成在第二绝缘层上。 通过第一和第二绝缘层和半导体衬底的上部形成宽度比第一和第二孔的宽度窄的通孔。 在通孔中形成贯通电极。

公开(公告)号：US20080251939A1

公开(公告)日：2008-10-16

申请号：US12100359

申请日：2008-04-09

Applicant: Hyun-Soo Chung ,  Dong-Ho Lee ,  Nam-Seog Kim ,  Son-Kwan Hwang

Inventor： Hyun-Soo Chung ,  Dong-Ho Lee ,  Nam-Seog Kim ,  Son-Kwan Hwang

IPC: H01L23/498

CPC classification number: H01L23/525 ,  H01L23/3128 ,  H01L24/45 ,  H01L24/48 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/05554 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45139 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06527 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/10161 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2924/01049

Abstract: A chip stack package is provided, wherein semiconductor chips having different die sizes are stacked by arranging pads in a scribe region through a redistribution process, so that the thickness of the package can be reduced. A method of fabricating the chip stack package is also provided. In the chip stack package, a plurality of circuit patterns are arranged on one surface of a substrate, and a unit semiconductor chip is mounted thereon. The unit semiconductor chip includes a plurality of semiconductor chips sequentially stacked on the substrate. The semiconductor chips of the unit semiconductor chip have different die sizes. One of the semiconductor chips includes a plurality of first pads arranged in a first chip region, and the other semiconductor chips include second pads arranged in a scribe region at an outside of a second chip region defined by the scribe region.

Abstract translation: 提供了一种芯片堆叠封装，其中具有不同管芯尺寸的半导体芯片通过经由再分配工艺在划线区域中布置衬垫来堆叠，从而可以减小封装的厚度。 还提供了一种制造芯片堆叠封装的方法。 在芯片堆叠封装中，在基板的一个表面上布置多个电路图案，并且在其上安装单元半导体芯片。 单元半导体芯片包括顺序堆叠在基板上的多个半导体芯片。 单元半导体芯片的半导体芯片具有不同的管芯尺寸。 半导体芯片中的一个包括布置在第一芯片区域中的多个第一焊盘，并且其它半导体芯片包括布置在由划线区域限定的第二芯片区域的外侧的划线区域中的第二焊盘。

公开(公告)号：US20080230912A1

公开(公告)日：2008-09-25

申请号：US12053478

申请日：2008-03-21

Applicant: In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

Inventor： In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

IPC: H01L23/48 ,  H01L21/4763

CPC classification number: H01L21/76898 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11462 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13147 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01055 ,  H01L2924/0106 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/19043 ,  H01L2224/05552

Abstract: A method of manufacturing a semiconductor device includes forming an integrated circuit region on a semiconductor wafer. A first metal layer pattern is formed over the integrated circuit region. A via hole is formed to extend through the first metal layer pattern and the integrated circuit region. A final metal layer pattern is formed over the first metal layer pattern and within the via hole. A plug is formed within the via hole. Thereafter, a passivation layer is formed to overlie the final metal layer pattern.

Abstract translation: 一种制造半导体器件的方法包括在半导体晶片上形成集成电路区域。 在集成电路区域上形成第一金属层图案。 通孔形成为延伸穿过第一金属层图案和集成电路区域。 最终的金属层图案形成在第一金属层图案之上并且在通孔内。 在通孔内形成插头。 此后，形成钝化层以覆盖最终金属层图案。

公开(公告)号：US20080230877A1

公开(公告)日：2008-09-25

申请号：US12050343

申请日：2008-03-18

Applicant: Hyun-soo Chung ,  Dong-hyeon Jang ,  Son-kwan Hwang ,  Nam-seog Kim

Inventor： Hyun-soo Chung ,  Dong-hyeon Jang ,  Son-kwan Hwang ,  Nam-seog Kim

IPC: H01L23/495 ,  H01L21/768

CPC classification number: H01L23/525 ,  H01L24/05 ,  H01L24/48 ,  H01L2224/04042 ,  H01L2224/05556 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/45139 ,  H01L2224/45144 ,  H01L2224/45147 ,  H01L2224/48463 ,  H01L2224/48624 ,  H01L2224/48647 ,  H01L2224/48847 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/05042 ,  H01L2224/48824 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor package and a method of fabricating the same. The method includes providing a semiconductor substrate on which a chip pad is formed. A wire redistribution layer connected to the chip pad is formed. An insulating layer which includes an opening exposing a portion of the wire redistribution layer is formed. A metal ink is applied within the opening to thereby form a bonding pad. The applied metal ink within the opening and the insulating layer can be cured simultaneously.

Abstract translation: 一种半导体封装及其制造方法。 该方法包括提供其上形成有芯片焊盘的半导体衬底。 形成连接到芯片焊盘的导线再分配层。 形成绝缘层，该绝缘层包括露出导线再分布层的一部分的开口。 在开口内施加金属墨，从而形成接合垫。 开口和绝缘层内的施加的金属油墨可以同时固化。

公开(公告)号：US08564102B2

公开(公告)日：2013-10-22

申请号：US13108231

申请日：2011-05-16

Applicant: Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

Inventor： Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC: H01L29/40 ,  H01L23/48 ,  H01L23/52

CPC classification number: H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

Abstract: A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

Abstract translation: 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US08119448B2

公开(公告)日：2012-02-21

申请号：US12817304

申请日：2010-06-17

Applicant: Son-Kwan Hwang ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

Inventor： Son-Kwan Hwang ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

IPC: H01L21/00

CPC classification number: H01L24/11 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05599 ,  H01L2224/05647 ,  H01L2224/1147 ,  H01L2224/11902 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/9201 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/10329 ,  H01L2224/05552

Abstract: A semiconductor chip comprises a substrate including a front surface and a rear surface, the substrate having a first via hole formed in the front surface and a second via hole formed in the rear surface, a first conductive plug formed on the substrate, the first conductive plug including a first portion formed in the first via hole and a second portion protruding from the front surface of the substrate, and a second conductive plug formed on the first conductive plug, the second conductive plug having a smaller cross-sectional area than the first conductive plug.

Abstract translation: 一种半导体芯片，包括：具有前表面和后表面的基板，所述基板具有形成在所述前表面上的第一通孔和形成在所述后表面中的第二通孔，形成在所述基板上的第一导电塞，所述第一导电 所述插头包括形成在所述第一通孔中的第一部分和从所述基板的前表面突出的第二部分，以及形成在所述第一导电插塞上的第二导电插塞，所述第二导电插塞具有比所述第一通孔更小的横截面积 导电插头

公开(公告)号：US07847416B2

公开(公告)日：2010-12-07

申请号：US12498913

申请日：2009-07-07

Applicant: Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

Inventor： Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC classification number: H01L25/50 ,  H01L21/76898 ,  H01L25/0657 ,  H01L29/0657 ,  H01L2224/0401 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13025 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06555 ,  H01L2225/06586 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01038 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01093 ,  H01L2224/11 ,  H01L2224/05552

Abstract: Wafer level packages and methods of fabricating the same are provided. In one embodiment, one of the methods comprises forming semiconductor chips having a connection pad on a wafer, patterning a bottom surface of the wafer to form a trench under the connection pad, patterning a bottom surface of the trench to form a via hole exposing the bottom surface of the connection pad, and forming a connecting device connected to the connection pad through the via hole. The invention provides a wafer level package having reduced thickness, lower fabrication costs, and increased reliability compared to conventional packages.

Abstract translation: 提供了晶片级封装及其制造方法。 在一个实施例中，方法之一包括形成在晶片上具有连接焊盘的半导体芯片，图案化晶片的底表面以在连接焊盘下方形成沟槽，图案化沟槽的底表面以形成通孔， 并且通过通孔形成连接到连接垫的连接装置。 本发明提供了与传统封装相比，具有减小的厚度，较低的制造成本和增加的可靠性的晶片级封装。