公开(公告)号：US08564102B2

公开(公告)日：2013-10-22

申请号：US13108231

申请日：2011-05-16

申请人： Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

发明人： Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC分类号： H01L29/40 ,  H01L23/48 ,  H01L23/52

CPC分类号： H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

摘要： A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

摘要翻译： 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US20110284936A1

公开(公告)日：2011-11-24

申请号：US13108231

申请日：2011-05-16

申请人： Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

发明人： Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC分类号： H01L29/772 ,  H01L23/48

CPC分类号： H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

摘要： A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

摘要翻译： 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US09219035B2

公开(公告)日：2015-12-22

申请号：US14153478

申请日：2014-01-13

申请人： Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-il Choi ,  Son-kwan Hwang

发明人： Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-il Choi ,  Son-kwan Hwang

IPC分类号： H01L23/48 ,  H01L23/528 ,  H01L21/768 ,  H01L25/065 ,  H01L25/00 ,  H01L23/522

CPC分类号： H01L23/528 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/5226 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/06181 ,  H01L2224/13009 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/15311 ,  H01L2924/00012

摘要： Methods of forming an integrated circuit device include forming an interlayer dielectric layer on a first surface of a semiconductor substrate and then forming an interconnect hole that extends through the interlayer dielectric layer and into the semiconductor substrate. A first sidewall spacer layer is formed on a sidewall of the interconnect hole. The semiconductor substrate at a bottom of the interconnect hole is isotropically etched to define an undercut recess in the semiconductor substrate. This etching step is performed using the first sidewall spacer layer as an etching mask. The interconnect hole and the uncut recess are then filled with a through-via electrode. A second surface of the semiconductor substrate is removed for a sufficient duration to expose the uncut recess containing the through-via electrode.

摘要翻译： 形成集成电路器件的方法包括在半导体衬底的第一表面上形成层间电介质层，然后形成延伸穿过层间电介质层并进入半导体衬底的互连孔。 第一侧壁间隔层形成在互连孔的侧壁上。 在互连孔的底部的半导体衬底被各向同性蚀刻以在半导体衬底中限定底切凹部。 该蚀刻步骤使用第一侧壁间隔层作为蚀刻掩模进行。 然后用通孔电极填充互连孔和未切割凹部。 去除半导体衬底的第二表面足够的持续时间以露出包含通孔电极的未切割凹部。

公开(公告)号：US08637989B2

公开(公告)日：2014-01-28

申请号：US13569653

申请日：2012-08-08

申请人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

发明人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

IPC分类号： H01L23/48

CPC分类号： H01L23/48 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05647 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/01327 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/04953 ,  H01L2924/04941

摘要： A semiconductor device includes a semiconductor substrate and a via electrode. The via electrode has a first portion on the substrate and extends towards the substrate and has a plurality of spikes that extends from the first portion into the substrate, each of the spikes being spaced apart form one another.

摘要翻译： 半导体器件包括半导体衬底和通孔电极。 通孔电极在基板上具有第一部分并且朝向基板延伸并且具有从第一部分延伸到基板中的多个尖峰，每个尖峰彼此间隔开。

公开(公告)号：US08586477B2

公开(公告)日：2013-11-19

申请号：US13195128

申请日：2011-08-01

申请人： Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

发明人： Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

IPC分类号： H01L21/44 ,  H01L21/00 ,  H01L23/04

CPC分类号： H01L21/76898 ,  H01L21/563 ,  H01L23/481 ,  H01L24/03 ,  H01L24/04 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/03002 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03464 ,  H01L2224/03618 ,  H01L2224/0401 ,  H01L2224/05017 ,  H01L2224/05557 ,  H01L2224/0557 ,  H01L2224/05609 ,  H01L2224/05613 ,  H01L2224/05614 ,  H01L2224/05616 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/05649 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/0567 ,  H01L2224/05673 ,  H01L2224/05676 ,  H01L2224/0568 ,  H01L2224/05681 ,  H01L2224/05683 ,  H01L2224/05684 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13118 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13166 ,  H01L2224/13169 ,  H01L2224/13171 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/73204 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/15311 ,  H01L2224/05552

摘要： A semiconductor apparatus having a through electrode, a semiconductor package, and a method of manufacturing the semiconductor package are provided. The method of includes preparing a substrate including a buried via, the buried via having a first surface at a first end, and the buried via extending from a first substrate surface of the substrate into the substrate; planarizing a second substrate surface of the substrate opposite the first substrate surface to form a through via by exposing a second via surface at a second end of the buried via opposite the first end; forming a conductive capping layer on the exposed second via surface of the through via; and recessing the second substrate surface so that at least a first portion of the through via extends beyond the second substrate surface.

摘要翻译： 提供了具有贯通电极，半导体封装以及半导体封装的制造方法的半导体装置。 该方法包括制备包括掩埋通孔的衬底，所述埋入通孔在第一端具有第一表面，以及所述掩埋通孔从所述衬底的第一衬底表面延伸到所述衬底中; 平行化与第一衬底表面相对的衬底的第二衬底表面以通过在与第一端相对的埋置通孔的第二端处暴露第二通孔表面而形成通孔; 在通孔的暴露的第二通孔表面上形成导电覆盖层; 并且使所述第二衬底表面凹陷，使得所述通孔的至少第一部分延伸超出所述第二衬底表面。

公开(公告)号：US20120299194A1

公开(公告)日：2012-11-29

申请号：US13569653

申请日：2012-08-08

申请人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

发明人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

IPC分类号： H01L23/48

CPC分类号： H01L23/48 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05647 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/01327 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/04953 ,  H01L2924/04941

摘要： A semiconductor device includes a semiconductor substrate and a via electrode. The via electrode has a first portion on the substrate and extends towards the substrate and has a plurality of spikes that extends from the first portion into the substrate, each of the spikes being spaced apart form one another.

摘要翻译： 半导体器件包括半导体衬底和通孔电极。 通孔电极在基板上具有第一部分并且朝向基板延伸并且具有从第一部分延伸到基板中的多个尖峰，每个尖峰彼此间隔开。

公开(公告)号：US20120028412A1

公开(公告)日：2012-02-02

申请号：US13195128

申请日：2011-08-01

申请人： Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

发明人： Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

IPC分类号： H01L21/50 ,  H01L21/768

CPC分类号： H01L21/76898 ,  H01L21/563 ,  H01L23/481 ,  H01L24/03 ,  H01L24/04 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/03002 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03464 ,  H01L2224/03618 ,  H01L2224/0401 ,  H01L2224/05017 ,  H01L2224/05557 ,  H01L2224/0557 ,  H01L2224/05609 ,  H01L2224/05613 ,  H01L2224/05614 ,  H01L2224/05616 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/05649 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/0567 ,  H01L2224/05673 ,  H01L2224/05676 ,  H01L2224/0568 ,  H01L2224/05681 ,  H01L2224/05683 ,  H01L2224/05684 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13118 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13166 ,  H01L2224/13169 ,  H01L2224/13171 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/73204 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/15311 ,  H01L2224/05552

摘要： A semiconductor apparatus having a through electrode, a semiconductor package, and a method of manufacturing the semiconductor package are provided. The method of includes preparing a substrate including a buried via, the buried via having a first surface at a first end, and the buried via extending from a first substrate surface of the substrate into the substrate; planarizing a second substrate surface of the substrate opposite the first substrate surface to form a through via by exposing a second via surface at a second end of the buried via opposite the first end; forming a conductive capping layer on the exposed second via surface of the through via; and recessing the second substrate surface so that at least a first portion of the through via extends beyond the second substrate surface.

摘要翻译： 提供了具有贯通电极，半导体封装以及半导体封装的制造方法的半导体装置。 该方法包括制备包括掩埋通孔的衬底，所述埋入通孔在第一端具有第一表面，以及所述掩埋通孔从所述衬底的第一衬底表面延伸到所述衬底中; 平行化与第一衬底表面相对的衬底的第二衬底表面以通过在与第一端相对的埋置通孔的第二端处暴露第二通孔表面而形成通孔; 在通孔的暴露的第二通孔表面上形成导电覆盖层; 并且使所述第二衬底表面凹陷，使得所述通孔的至少第一部分延伸超出所述第二衬底表面。

公开(公告)号：US20100105169A1

公开(公告)日：2010-04-29

申请号：US12543347

申请日：2009-08-18

申请人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

发明人： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

IPC分类号： H01L21/98 ,  H01L21/768

CPC分类号： H01L23/48 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05647 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/01327 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/04953 ,  H01L2924/04941

摘要： A semiconductor device includes a semiconductor substrate and a via electrode. The via electrode has a first portion on the substrate and extends towards the substrate and has a plurality of spikes that extends from the first portion into the substrate, each of the spikes being spaced apart form one another.

摘要翻译： 半导体器件包括半导体衬底和通孔电极。 通孔电极在基板上具有第一部分并且朝向基板延伸并且具有从第一部分延伸到基板中的多个尖峰，每个尖峰彼此间隔开。

公开(公告)号：US20140124901A1

公开(公告)日：2014-05-08

申请号：US14153478

申请日：2014-01-13

申请人： Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-iI Choi ,  Son-kwan Hwang

发明人： Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-iI Choi ,  Son-kwan Hwang

IPC分类号： H01L23/528 ,  H01L23/522

CPC分类号： H01L23/528 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/5226 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/06181 ,  H01L2224/13009 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/15311 ,  H01L2924/00012

摘要： Methods of forming an integrated circuit device include forming an interlayer dielectric layer on a first surface of a semiconductor substrate and then forming an interconnect hole that extends through the interlayer dielectric layer and into the semiconductor substrate. A first sidewall spacer layer is formed on a sidewall of the interconnect hole. The semiconductor substrate at a bottom of the interconnect hole is isotropically etched to define an undercut recess in the semiconductor substrate. This etching step is performed using the first sidewall spacer layer as an etching mask. The interconnect hole and the uncut recess are then filled with a through-via electrode. A second surface of the semiconductor substrate is removed for a sufficient duration to expose the uncut recess containing the through-via electrode.

摘要翻译： 形成集成电路器件的方法包括在半导体衬底的第一表面上形成层间电介质层，然后形成延伸穿过层间电介质层并进入半导体衬底的互连孔。 第一侧壁间隔层形成在互连孔的侧壁上。 在互连孔的底部的半导体衬底被各向同性蚀刻以在半导体衬底中限定底切凹部。 该蚀刻步骤使用第一侧壁间隔层作为蚀刻掩模进行。 然后用通孔电极填充互连孔和未切割凹部。 去除半导体衬底的第二表面足够的持续时间以露出包含通孔电极的未切割凹部。

公开(公告)号：US08415804B2

公开(公告)日：2013-04-09

申请号：US12639241

申请日：2009-12-16

申请人： Ho-jin Lee ,  Dong-hyun Jang ,  In-young Lee ,  Min-seung Yoon ,  Son-kwan Hwang

发明人： Ho-jin Lee ,  Dong-hyun Jang ,  In-young Lee ,  Min-seung Yoon ,  Son-kwan Hwang

IPC分类号： H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L21/44

CPC分类号： H01L24/13 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/29 ,  H01L24/32 ,  H01L24/81 ,  H01L24/83 ,  H01L24/91 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05599 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/13009 ,  H01L2224/13023 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/13124 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/29 ,  H01L2224/29101 ,  H01L2224/29298 ,  H01L2224/83194 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/0001 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/14 ,  H01L2924/00 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299 ,  H01L2224/2929 ,  H01L2224/05552

摘要： A semiconductor chip, a method of fabricating the same, and a stack module and a memory card including the semiconductor chip include a first surface and a second surface facing the first surface is provided. At least one via hole including a first portion extending in a direction from the first surface of the substrate to the second surface of the substrate and a second portion that is connected to the first portion and has a tapered shape. At least one via electrode filling the at least one via hole is provided.

摘要翻译： 提供一种半导体芯片及其制造方法，以及包括半导体芯片的堆叠模块和存储卡，其包括第一表面和面对第一表面的第二表面。 至少一个通孔，包括在从基板的第一表面到基板的第二表面的方向上延伸的第一部分和连接到第一部分并具有锥形形状的第二部分。 提供至少一个填充至少一个通孔的通孔电极。