Semiconductor device
    7.
    发明申请
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US20060170113A1

    公开(公告)日:2006-08-03

    申请号:US11334373

    申请日:2006-01-19

    IPC分类号: H01L23/48

    摘要: A technology providing an improvement in the durability in the condition of changing the temperature, while ensuring characteristics such as the applicability to applications utilizing larger electric current, lower resistance and the like can be achieved. A semiconductor device 100 includes a ceramic multiple-layered interconnect substrate 120, a silicon chip 110 that is flip-bonded to a chip-carrying region of the ceramic multiple-layered interconnect substrate 120, and an external connecting bumps 161 and an external connecting bumps 163, which are provided in the side that the silicon chip 110 of the ceramic multiple-layered interconnect substrate 120 is carried. The silicon chip 110 includes a front surface electrode and a back surface electrode. The ceramic multiple-layered interconnect substrate 120 includes an interconnect layer composed of a conductive material, and the interconnect layer composes a multiple-layered interconnect layer provided on a front surface and in an interior of the ceramic multiple-layered interconnect substrate 120. The front surface electrode of the silicon chip is electrically connected to the external connecting bump 161 and the external connecting bump 163 through the multiple-layered interconnects in the multiple-layered interconnect layer.

    摘要翻译: 可以实现在改变温度的条件下提高耐久性的技术,同时确保诸如对使用较大电流,较低电阻等的应用的适用性等特性。 半导体器件100包括陶瓷多层互连衬底120,与陶瓷多层互连衬底120的芯片承载区域翻转接合的硅芯片110以及外部连接凸块161和外部连接凸块 163设置在陶瓷多层互连基板120的硅芯片110的一侧。 硅芯片110包括前表面电极和背面电极。 陶瓷多层互连基板120包括由导电材料构成的互连层,并且互连层构成设置在陶瓷多层互连基板120的前表面和内部的多层互连层。 硅芯片的前表面电极通过多层互连层中的多层互连电连接到外部连接凸块161和外部连接凸块163。