Semiconductor package and method for manufacturing the same

    公开(公告)号:US11430761B2

    公开(公告)日:2022-08-30

    申请号:US16793991

    申请日:2020-02-18

    Abstract: Present disclosure provides a semiconductor package, including a first substrate having a first active surface and a first trench recessed from the first active surface, a second substrate having a second trench facing the first trench, and a pathway cavity defined by the first trench and the second trench. The first trench comprises a first metal protrusion and a first insulating protrusion. A method for manufacturing the semiconductor package described herein is also disclosed.

    MEASUREMENT EQUIPMENT
    9.
    发明申请

    公开(公告)号:US20180128612A1

    公开(公告)日:2018-05-10

    申请号:US15862476

    申请日:2018-01-04

    CPC classification number: G01C11/04 G01B11/245 G01B2210/56

    Abstract: The measurement equipment includes a rack, a first image capturing device, a second image capturing device, a third image capturing device and a fourth image capturing device. Wherein, the first image capturing device and the second image capturing device capture an entire image of a to-be-measured object, the third image capturing device and the fourth image capturing device capture a plurality of local images of a plurality of local areas of the to-be-measured object, and the entire image and the local images and are simultaneously captured.

    Package structure and method for manufacturing the same

    公开(公告)号:US11309253B2

    公开(公告)日:2022-04-19

    申请号:US16858269

    申请日:2020-04-24

    Inventor: Chin-Li Kao

    Abstract: A package structure and a method for manufacturing a package structure are provided. The package structure includes a first conductive structure and a second conductive structure. The first conductive structure includes at least one dielectric layer and at least one circuit layer in contact with the dielectric layer. The second conductive structure is bonded to the first conductive structure. The second conductive structure includes at least one dielectric layer and at least one circuit layer in contact with the dielectric layer. A distribution density of the circuit layer of the first conductive structure is greater than a distribution density of the circuit layer of the second conductive structure. A size of the second conductive structure is less than a size of the first conductive structure.

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