Copper stainproofing technique
    3.
    发明授权
    Copper stainproofing technique 失效
    铜防污技术

    公开(公告)号:US4647315A

    公开(公告)日:1987-03-03

    申请号:US750573

    申请日:1985-07-01

    摘要: The present invention relates to a technique for improving the tarnish and oxidation resistance of copper and copper base alloy materials. The technique of the present invention involves immersing the copper or copper base alloy material in a dilute aqueous chromic acid-phosphoric acid solution. After emerging from the chromic acid-phosphoric acid solution, the copper or copper base alloy material is preferably rinsed with a dilute aqueous caustic solution and dried. Copper and copper base alloy materials treated in accordance with the present invention have particular utility in printed circuit applications.

    摘要翻译: 本发明涉及一种提高铜和铜基合金材料的抗褪色和抗氧化性能的技术。 本发明的技术包括将铜或铜基合金材料浸入稀酸铬酸 - 磷酸水溶液中。 在从铬酸 - 磷酸溶液中出来之后,铜或铜基合金材料优选用稀的苛性碱水溶液冲洗并干燥。 根据本发明处理的铜和铜基合金材料在印刷电路应用中具有特殊的用途。

    Electrochemical surface preparation for improving the adhesive
properties of metallic surfaces
    4.
    发明授权
    Electrochemical surface preparation for improving the adhesive properties of metallic surfaces 失效
    用于改善金属表面的粘合性能的电化学表面处理

    公开(公告)号:US4549941A

    公开(公告)日:1985-10-29

    申请号:US670236

    申请日:1984-11-13

    摘要: The present invention relates to a treatment for improving the adhesive properties of metallic foils to be used in electrical and electronic applications. The treatment of the present invention comprises applying a light substantially uniform layer of metal to at least one surface of the metallic foil just prior to the formation of a plurality of dendritic structures on the surface. The metal layer renders the surface or surfaces to be treated more uniformly electrochemically active and consequently more receptive to the subsequent dendritic treatment. The treatment of the present invention has particular utility in improving the adhesive properties of wrought copper and copper alloy foils. An apparatus for performing the present treatment is also described.

    摘要翻译: 本发明涉及一种用于改善用于电气和电子应用的金属箔的粘合性能的处理。 本发明的处理包括在表面上形成多个树枝状结构之前,在金属箔的至少一个表面上施加光基本均匀的金属层。 金属层使待处理的表面或表面更均匀地具有电化学活性,因此更容易接受后续的树枝状处理。 本发明的处理在提高锻铜和铜合金箔的粘合性方面具有特别的用途。 还描述了用于执行本处理的装置。

    In-situ dendritic treatment of electrodeposited foil
    9.
    发明授权
    In-situ dendritic treatment of electrodeposited foil 失效
    电沉积箔的原位树枝状处理

    公开(公告)号:US4692221A

    公开(公告)日:1987-09-08

    申请号:US944776

    申请日:1986-12-22

    摘要: The present invention relates to a process and apparatus for forming in situ surface treated metal foil. The apparatus includes a cathode and anode arranged and/or shaped to define a plating region characterized by a first zone having a first interelectrode gap and a second zone having a second interelectrode gap smaller than the first interelectrode gap. It has been found that by providing such an arrangement it is possible to generate in the first zone a localized current density below the limiting current density sufficient to plate metal foil onto the cathode and to simultaneously generate in the second zone a localized current density above the limiting current density sufficient to form dendrites on the freshly produced foil.

    摘要翻译: 本发明涉及用于形成原位表面处理的金属箔的方法和设备。 该装置包括阴极和阳极,其布置和/或成形以限定电镀区域,其特征在于具有第一电极间隙的第一区域和具有小于第一电极间隙的第二电极间隙的第二区域。 已经发现,通过提供这种布置,可以在第一区域中产生低于极限电流密度的局部电流密度,足以将金属箔压平到阴极上并且同时在第二区域中产生局部电流密度高于 限制电流密度足以在新生成的箔上形成枝晶。