Process for electroless copper plating
    6.
    发明授权
    Process for electroless copper plating 失效
    化学镀铜工艺

    公开(公告)号:US4632852A

    公开(公告)日:1986-12-30

    申请号:US746099

    申请日:1985-06-18

    IPC分类号: C23C18/40 H05K3/18 C23C3/02

    CPC分类号: H05K3/187 C23C18/40

    摘要: In a process for electroless copper plating in an electroless copper plating solution containing a copper salt, a complexing agent for the copper salt, a reducing agent for the copper salt, and a pH-adjusting agent, a plating film having distinguished mechanical properties can be obtained by adding at least one of soluble inorganic silicon compounds and soluble inorganic germanium compounds and conducting the electroless copper plating by injecting an oxygen-containing gas into the plating solution or by adding an oxidizing agent to the plating solution or by both injection or the oxygen-containing gas and addition of the oxidizing agent thereto. The stability of the electroless copper plating solution can be maintained better thereby and substantially thick plating is possible.

    摘要翻译: 在含有铜盐,铜盐络合剂,铜盐还原剂和pH调节剂的化学镀铜溶液中的无电镀铜方法中,具有显着的机械性能的镀膜可以是 通过添加可溶性无机硅化合物和可溶性无机锗化合物中的至少一种而进行无电镀铜,通过将含氧气体注入镀液中或者通过向镀液中添加氧化剂,或者通过注入或氧气 并且向其中加入氧化剂。 可以更好地保持化学镀铜溶液的稳定性,并且可以实现基本上厚的镀覆。