公开(公告)号：US09627338B2

公开(公告)日：2017-04-18

申请号：US14187014

申请日：2014-02-21

Applicant: STATS ChipPAC, Ltd.

Inventor： See Chian Lim ,  Teck Tiong Tan ,  Yung Kuan Hsiao ,  Ching Meng Fang ,  Yoke Hor Phua ,  Bartholomew Liao

IPC: H01L21/56 ,  H01L23/00 ,  H01L23/14 ,  H01L23/498 ,  H01L23/538 ,  H01L23/29 ,  H01L23/31

CPC classification number: H01L23/3128 ,  H01L21/56 ,  H01L21/568 ,  H01L21/768 ,  H01L23/145 ,  H01L23/15 ,  H01L23/295 ,  H01L23/3135 ,  H01L23/49822 ,  H01L23/5389 ,  H01L23/562 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/96 ,  H01L2924/01322 ,  H01L2924/12 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/351 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/19 ,  H01L2224/11

Abstract: A semiconductor device has a plurality of semiconductor die. A first prefabricated insulating film is disposed over the semiconductor die. A conductive layer is formed over the first prefabricated insulating film. An interconnect structure is formed over the semiconductor die and first prefabricated insulating film. The first prefabricated insulating film is laminated over the semiconductor die. The first prefabricated insulating film includes glass cloth, glass fiber, or glass fillers. The semiconductor die is embedded within the first prefabricated insulating film with the first prefabricated insulating film covering first and side surfaces of the semiconductor die. The interconnect structure is formed over a second surface of the semiconductor die opposite the first surface. A portion of the first prefabricated insulating film is removed after disposing the first prefabricated insulating film over the semiconductor die. A second prefabricated insulating film is disposed over the first prefabricated insulating film.

公开(公告)号：US20140252641A1

公开(公告)日：2014-09-11

申请号：US14187014

申请日：2014-02-21

Applicant: STATS ChipPAC, Ltd.

Inventor： See Chian Lim ,  Teck Tiong Tan ,  Yung Kuan Hsiao ,  Ching Meng Fang ,  Yoke Hor Phua ,  Bartholomew Liao

IPC: H01L23/52 ,  H01L23/00 ,  H01L21/768

CPC classification number: H01L23/3128 ,  H01L21/56 ,  H01L21/568 ,  H01L21/768 ,  H01L23/145 ,  H01L23/15 ,  H01L23/295 ,  H01L23/3135 ,  H01L23/49822 ,  H01L23/5389 ,  H01L23/562 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/96 ,  H01L2924/01322 ,  H01L2924/12 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/351 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/19 ,  H01L2224/11

Abstract: A semiconductor device has a plurality of semiconductor die. A first prefabricated insulating film is disposed over the semiconductor die. A conductive layer is formed over the first prefabricated insulating film. An interconnect structure is formed over the semiconductor die and first prefabricated insulating film. The first prefabricated insulating film is laminated over the semiconductor die. The first prefabricated insulating film includes glass cloth, glass fiber, or glass fillers. The semiconductor die is embedded within the first prefabricated insulating film with the first prefabricated insulating film covering first and side surfaces of the semiconductor die. The interconnect structure is formed over a second surface of the semiconductor die opposite the first surface. A portion of the first prefabricated insulating film is removed after disposing the first prefabricated insulating film over the semiconductor die. A second prefabricated insulating film is disposed over the first prefabricated insulating film.

Abstract translation: 半导体器件具有多个半导体管芯。 第一预制绝缘膜设置在半导体管芯上。 在第一预制绝缘膜上形成导电层。 在半导体管芯和第一预制绝缘膜上形成互连结构。 将第一预制绝缘膜层叠在半导体管芯上。 第一预制绝缘膜包括玻璃布，玻璃纤维或玻璃填料。 半导体管芯被嵌入第一预制绝缘膜中，其中第一预制绝缘膜覆盖半导体管芯的第一和第二表面。 互连结构形成在与第一表面相对的半导体管芯的第二表面上。 在将第一预制绝缘膜设置在半导体管芯上之后，去除第一预制绝缘膜的一部分。 第二预制绝缘膜设置在第一预制绝缘膜上。

公开(公告)号：US20140077389A1

公开(公告)日：2014-03-20

申请号：US13800807

申请日：2013-03-13

Applicant: STATS CHIPPAC, LTD.

Inventor： Il Kwon Shim ,  Jun Mo Koo ,  Pandi C. Marimuthu ,  Yaojian Lin ,  See Chian Lim

IPC: H01L23/48 ,  H01L21/48

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/20 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/9222 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/0652 ,  H01L2225/06568 ,  H01L2225/06572 ,  H01L2225/1035 ,  H01L2225/1052 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/01082 ,  H01L2224/03 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a substrate including a base and a plurality of conductive posts extending from the base. The substrate can be a wafer-shape, panel, or singulated form. The conductive posts can have a circular, rectangular, tapered, or narrowing intermediate shape. A semiconductor die is disposed through an opening in the base between the conductive posts. The semiconductor die extends above the conductive posts or is disposed below the conductive posts. An encapsulant is deposited over the semiconductor die and around the conductive posts. The base and a portion of the encapsulant is removed to electrically isolate the conductive posts. An interconnect structure is formed over the semiconductor die, encapsulant, and conductive posts. An insulating layer is formed over the semiconductor die, encapsulant, and conductive posts. A semiconductor package is disposed over the semiconductor die and electrically connected to the conductive posts.

Abstract translation: 半导体器件具有包括基底和从基底延伸的多个导电柱的基底。 衬底可以是晶片形状，面板或单体形式。 导电柱可以具有圆形，矩形，锥形或变窄的中间形状。 通过导电柱之间的底座中的开口设置半导体管芯。 半导体管芯延伸到导电柱之上，或者设置在导电柱的下方。 密封剂沉积在半导体管芯上并且在导电柱周围。 去除基底和一部分密封剂以电绝缘导电柱。 在半导体管芯，密封剂和导电柱之上形成互连结构。 在半导体管芯，密封剂和导电柱上形成绝缘层。 半导体封装设置在半导体管芯上并电连接到导电柱。

公开(公告)号：US09559039B2

公开(公告)日：2017-01-31

申请号：US13800807

申请日：2013-03-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Jun Mo Koo ,  Pandi C. Marimuthu ,  Yaojian Lin ,  See Chian Lim

IPC: H01L23/48 ,  H01L21/48 ,  H01L23/498 ,  H01L23/538 ,  H01L23/00 ,  H01L25/10 ,  H01L25/00 ,  H01L21/56 ,  H01L23/31

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/20 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/9222 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/0652 ,  H01L2225/06568 ,  H01L2225/06572 ,  H01L2225/1035 ,  H01L2225/1052 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/01082 ,  H01L2224/03 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a substrate including a base and a plurality of conductive posts extending from the base. The substrate can be a wafer-shape, panel, or singulated form. The conductive posts can have a circular, rectangular, tapered, or narrowing intermediate shape. A semiconductor die is disposed through an opening in the base between the conductive posts. The semiconductor die extends above the conductive posts or is disposed below the conductive posts. An encapsulant is deposited over the semiconductor die and around the conductive posts. The base and a portion of the encapsulant is removed to electrically isolate the conductive posts. An interconnect structure is formed over the semiconductor die, encapsulant, and conductive posts. An insulating layer is formed over the semiconductor die, encapsulant, and conductive posts. A semiconductor package is disposed over the semiconductor die and electrically connected to the conductive posts.

Abstract translation: 半导体器件具有包括基底和从基底延伸的多个导电柱的基底。 衬底可以是晶片形状，面板或单体形式。 导电柱可以具有圆形，矩形，锥形或变窄的中间形状。 通过导电柱之间的底座中的开口设置半导体管芯。 半导体管芯延伸到导电柱之上，或者设置在导电柱的下方。 密封剂沉积在半导体管芯上并且在导电柱周围。 去除基底和一部分密封剂以电绝缘导电柱。 在半导体管芯，密封剂和导电柱上形成互连结构。 在半导体管芯，密封剂和导电柱上形成绝缘层。 半导体封装设置在半导体管芯上并电连接到导电柱。

公开(公告)号：US09240331B2

公开(公告)日：2016-01-19

申请号：US14039418

申请日：2013-09-27

Applicant: STATS ChipPAC, Ltd.

Inventor： KyungMoon Kim ,  KooHong Lee ,  JaeHak Yee ,  YoungChul Kim ,  Lan Hoang ,  Pandi C. Marimuthu ,  Steve Anderson ,  See Chian Lim ,  HeeJo Chi

IPC: H01L23/52 ,  H01L29/40 ,  H01L21/48 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L21/4867 ,  H01L23/49811 ,  H01L23/49816 ,  H01L24/05 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0381 ,  H01L2224/0401 ,  H01L2224/05567 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/05684 ,  H01L2224/10165 ,  H01L2224/13076 ,  H01L2224/131 ,  H01L2224/13294 ,  H01L2224/13311 ,  H01L2224/13313 ,  H01L2224/13316 ,  H01L2224/13324 ,  H01L2224/13339 ,  H01L2224/13344 ,  H01L2224/13347 ,  H01L2224/13355 ,  H01L2224/13794 ,  H01L2224/138 ,  H01L2224/16112 ,  H01L2224/16113 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1701 ,  H01L2224/17517 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/81007 ,  H01L2224/81011 ,  H01L2224/81022 ,  H01L2224/81024 ,  H01L2224/8114 ,  H01L2224/81192 ,  H01L2224/81201 ,  H01L2224/81203 ,  H01L2224/81424 ,  H01L2224/81815 ,  H01L2224/81986 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/05552 ,  H01L2224/81805

Abstract: A semiconductor device includes a substrate with contact pads. A mask is disposed over the substrate. Aluminum-wettable conductive paste is printed over the contact pads of the substrate. A semiconductor die is disposed over the aluminum-wettable conductive paste. The aluminum-wettable conductive paste is reflowed to form an interconnect structure over the contact pads of the substrate. The contact pads include aluminum. Contact pads of the semiconductor die are disposed over the aluminum-wettable conductive paste. The aluminum-wettable conductive paste is reflowed to form an interconnect structure between the contact pads of the semiconductor die and the contact pads of the substrate. The interconnect structure is formed directly on the contact pads of the substrate and semiconductor die. The contact pads of the semiconductor die are etched prior to reflowing the aluminum-wettable conductive paste. An epoxy pre-dot to maintain a separation between the semiconductor die and substrate.

Abstract translation: 半导体器件包括具有接触焊盘的衬底。 掩模设置在基板上。 铝可润湿的导电浆料印刷在基材的接触垫上。 将半导体管芯设置在铝可润湿的导电膏上。 铝可湿性导电膏被回流以在衬底的接触焊盘上形成互连结构。 接触垫包括铝。 半导体管芯的接触焊盘设置在铝可润湿的导电膏上。 铝可润湿的导电膏被回流以在半导体管芯的接触焊盘和衬底的接触焊盘之间形成互连结构。 互连结构直接形成在基板和半导体管芯的接触焊盘上。 在回流铝可湿性导电膏之前，蚀刻半导体管芯的接触焊盘。 环氧预处理点，以保持半导体管芯和衬底之间的间隔。

公开(公告)号：US20140175661A1

公开(公告)日：2014-06-26

申请号：US14039418

申请日：2013-09-27

Applicant: STATS ChipPAC, Ltd.

Inventor： KyungMoon Kim ,  KooHong Lee ,  JaeHak Yee ,  YoungChul Kim ,  Lan Hoang ,  Pandi C. Marimuthu ,  Steve Anderson ,  See Chian Lim ,  HeeJo Chi

IPC: H01L23/48 ,  H01L21/56

CPC classification number: H01L21/4867 ,  H01L23/49811 ,  H01L23/49816 ,  H01L24/05 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0381 ,  H01L2224/0401 ,  H01L2224/05567 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/05684 ,  H01L2224/10165 ,  H01L2224/13076 ,  H01L2224/131 ,  H01L2224/13294 ,  H01L2224/13311 ,  H01L2224/13313 ,  H01L2224/13316 ,  H01L2224/13324 ,  H01L2224/13339 ,  H01L2224/13344 ,  H01L2224/13347 ,  H01L2224/13355 ,  H01L2224/13794 ,  H01L2224/138 ,  H01L2224/16112 ,  H01L2224/16113 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1701 ,  H01L2224/17517 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/81007 ,  H01L2224/81011 ,  H01L2224/81022 ,  H01L2224/81024 ,  H01L2224/8114 ,  H01L2224/81192 ,  H01L2224/81201 ,  H01L2224/81203 ,  H01L2224/81424 ,  H01L2224/81815 ,  H01L2224/81986 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/05552 ,  H01L2224/81805

Abstract: A semiconductor device includes a substrate with contact pads. A mask is disposed over the substrate. Aluminum-wettable conductive paste is printed over the contact pads of the substrate. A semiconductor die is disposed over the aluminum-wettable conductive paste. The aluminum-wettable conductive paste is reflowed to form an interconnect structure over the contact pads of the substrate. The contact pads include aluminum. Contact pads of the semiconductor die are disposed over the aluminum-wettable conductive paste. The aluminum-wettable conductive paste is reflowed to form an interconnect structure between the contact pads of the semiconductor die and the contact pads of the substrate. The interconnect structure is formed directly on the contact pads of the substrate and semiconductor die. The contact pads of the semiconductor die are etched prior to reflowing the aluminum-wettable conductive paste. An epoxy pre-dot to maintain a separation between the semiconductor die and substrate.

Abstract translation: 半导体器件包括具有接触焊盘的衬底。 掩模设置在基板上。 铝可润湿的导电膏被印刷在基底的接触垫上。 将半导体管芯设置在铝可润湿的导电膏上。 铝可湿性导电膏被回流以在衬底的接触焊盘上形成互连结构。 接触垫包括铝。 半导体管芯的接触焊盘设置在铝可润湿的导电膏上。 铝可润湿的导电膏被回流以在半导体管芯的接触焊盘和衬底的接触焊盘之间形成互连结构。 互连结构直接形成在基板和半导体管芯的接触焊盘上。 在回流铝可湿性导电膏之前，蚀刻半导体管芯的接触焊盘。 环氧预处理点，以保持半导体管芯和衬底之间的间隔。