Method for manufacturing a chip scale package having slits formed on a substrate

    公开(公告)号:US06432746B1

    公开(公告)日:2002-08-13

    申请号:US09840725

    申请日:2001-04-23

    IPC分类号: H01L2144

    摘要: A method for manufacturing a chip scale package (CSP) including a semiconductor chip and conductive bumps is disclosed. In the present invention, a flexible substrate is provided with a conductive pattern formed thereon. The substrate has a top surface and a bottom surface. Then, a first photosensitive resin pattern is formed over the top surface of the substrate. Next, the first photosensitive resin pattern is cured. Subsequently, a second photosensitive resin pattern is formed over the cured first photosensitive resin pattern. The second photosensitive resin pattern includes a slit comprising a bottom of the first photosensitive resin pattern and side walls of the second photosensitive resin pattern. With the present invention, the problem of burning of neighboring patterns as well as the problem of the overflow of the encapsulant can be overcome.

    CHEMICAL-MECHANICAL POLISHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
    6.
    发明申请
    CHEMICAL-MECHANICAL POLISHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES 失效
    用于制造半导体器件的化学机械抛光装置

    公开(公告)号:US20110171882A1

    公开(公告)日:2011-07-14

    申请号:US12985048

    申请日:2011-01-05

    IPC分类号: B24B41/06 B24B49/00

    CPC分类号: B24B37/10 B24B49/12

    摘要: A chemical-mechanical polishing (CMP) apparatus for manufacturing a semiconductor device. The apparatus includes: a spin chuck for supporting and rotating a semiconductor wafer; a polisher comprising a polishing pad for planarizing a surface of the semiconductor wafer, the polisher moving along the surface of the semiconductor wafer by a polishing arm; and a polisher supporting device for supporting the polisher and maintaining the polisher in a horizontal state, while polishing an edge part of the surface of the semiconductor wafer, in order to improve polishing uniformity of a center part and the edge part of the semiconductor wafer. Accordingly, polishing uniformity of the center part and edge part of the semiconductor wafer may be improved, and a height of the polisher supporting device may be optimized according to a polishing degree. Also, the polisher may be easily supported, wear and tear of the support head may be minimized, and the support head may function as a conditioner.

    摘要翻译: 一种用于制造半导体器件的化学机械抛光(CMP)装置。 该装置包括:用于支撑和旋转半导体晶片的旋转卡盘; 抛光机,包括用于平坦化半导体晶片的表面的抛光垫,抛光机通过抛光臂沿着半导体晶片的表面移动; 以及用于在抛光半导体晶片的表面的边缘部分的同时在支撑抛光机并将抛光机保持在水平状态的抛光机支撑装置,以便改善半导体晶片的中心部分和边缘部分的抛光均匀性。 因此,可以提高半导体晶片的中心部分和边缘部分的抛光均匀性,并且可以根据抛光度来优化抛光机支撑装置的高度。 此外,可以容易地支撑抛光机,可以使支撑头的磨损和撕裂最小化,并且支撑头可用作调节器。

    Diamond tool with metal plate inserted therein
    9.
    发明申请
    Diamond tool with metal plate inserted therein 有权
    镶嵌有金属板的金刚石工具

    公开(公告)号:US20050249560A1

    公开(公告)日:2005-11-10

    申请号:US11118165

    申请日:2005-04-28

    IPC分类号: B23D61/00 B23D61/04 B28D1/12

    摘要: Disclosed is a diamond tool having a metal plate inserted therein. Between abrasive layers containing diamond particles is inserted a ferrous or non-ferrous metal plate having a wear resistance lower than that of the abrasive layers such that a concave groove is spontaneously formed during a cutting process, thereby reducing the contact load with a workpiece to thereby avoid vibration (wobbling) of a shank, and providing a discharge path for smoothly removing cutting chips and the cooling water. In addition, the content of abrasives and the wear resistance of bonding material are uniformly constituted so that the shrinkage rate does not need to be considered during sintering and the manufacturing process can be simplified, thereby reducing the manufacturing cost and improving the productivity therefor. Furthermore, the area of the metal plate can be controlled, thereby enabling an easy design conforming to the working conditions with a workpiece.

    摘要翻译: 公开了一种金刚石工具,其中插入有金属板。 在含有金刚石颗粒的研磨层之间插入耐磨性低于研磨层的耐磨性的铁或非铁金属板,使得在切割过程中自发形成凹槽,从而减少与工件的接触载荷 避免柄的振动(摆动),并且提供用于平滑地去除切屑和冷却水的排出路径。 此外,研磨剂的含量和接合材料的耐磨性均匀地构成,使得在烧结期间不需要考虑收缩率,并且可以简化制造过程,从而降低制造成本并提高其生产率。 此外,可以控制金属板的面积,从而能够使与工件的工作条件相一致的简单设计。

    Obstacle sensor and robot cleaner having the same
    10.
    发明授权
    Obstacle sensor and robot cleaner having the same 有权
    障碍传感器和机器人清洁器具有相同的功能

    公开(公告)号:US09239389B2

    公开(公告)日:2016-01-19

    申请号:US13616137

    申请日:2012-09-14

    摘要: An obstacle sensor includes a line light irradiating unit including a light-emitting unit, a light-emitting driving unit to drive the light-emitting unit, and a first conical mirror, an apex of which is disposed towards the light-emitting unit in a light irradiation direction of the light-emitting unit and which converts light emitted from the light-emitting unit into line light irradiated in all directions, and a reflected light receiving unit including a second conical mirror to condense light, that is irradiated from the first conical mirror and is then reflected from an obstacle, a lens, that is spaced from the apex of the second conical mirror by a predetermined distance and transmits the reflected light, an imaging unit to image the reflected light that passes through the lens, an image processing unit, and an obstacle sensing control unit.

    摘要翻译: 障碍传感器包括:行光照射单元,包括发光单元,驱动发光单元的发光驱动单元;以及第一锥形反射镜,其顶点设置在发光单元中 发光单元的光照射方向,并将从发光单元发射的光转换为沿所有方向照射的线光;以及反射光接收单元,包括第二锥形镜以使光从第一锥形 然后从与第二锥形反射镜的顶点隔开预定距离的障碍物,透镜反射并透射反射光,成像单元对通过透镜的反射光进行成像,图像处理 单元和障碍物感测控制单元。