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    Plasma process system and plasma process method
    1.
    发明授权
    Plasma process system and plasma process method 失效
    等离子体工艺系统和等离子体处理方法

    公开(公告)号：US07481886B2

    公开(公告)日：2009-01-27

    申请号：US10623866

    申请日：2003-07-22

    申请人： Yoshihiro Kato ,  Tadashi Goto ,  Hikaru Yoshitaka ,  Makoto Aoki

    发明人： Yoshihiro Kato ,  Tadashi Goto ,  Hikaru Yoshitaka ,  Makoto Aoki

    IPC分类号： C23C16/455 ,  C23C16/00

    CPC分类号： C23C16/45565 ,  C23C16/455 ,  H01J37/3244

    摘要： A first channel is formed in the side of a first diffusion plate which is on that side of a gas inlet tube and a recess is formed in the side which is on that side of an electrode plate. The first channel and the recess communicate with each other through a plurality of inlet ports. The first channel and the inlet ports form a gas flow passage L which leads to the recess from the gas inlet tube. As a process gas supplied from the gas inlet tube passes through the gas flow passage L, it is supplied, dispersed, to a hollow portion formed between the recess and the electrode plate.

    摘要翻译： 第一通道形成在第一扩散板的位于气体入口管的该侧的侧面上，并且在电极板的该侧上形成凹部。 第一通道和凹槽通过多个入口端口彼此连通。 第一通道和入口端口形成气体通道L，其从气体入口管通向凹部。 当从气体导入管供给的工艺气体通过气体流路L时，被供给到分散在凹部和电极板之间的中空部分。

    Plasma treatment device
    2.
    发明申请
    Plasma treatment device 审中-公开
    等离子体处理装置

    公开(公告)号：US20070158027A1

    公开(公告)日：2007-07-12

    申请号：US11702075

    申请日：2007-02-05

    申请人： Makoto Aoki ,  Hikaru Yoshitaka ,  Yoshihiro Kato ,  Shigeo Ashigaki ,  Syoichi Abe

    发明人： Makoto Aoki ,  Hikaru Yoshitaka ,  Yoshihiro Kato ,  Shigeo Ashigaki ,  Syoichi Abe

    IPC分类号： C23F1/00 ,  C23C16/00

    CPC分类号： H01J37/32623 ,  H01J37/32633

    摘要： In a parallel plate type plasma processing apparatus (1), a baffle plate (28) is fitted between a ceiling (2b) and side wall (2a) of a chamber (2). The baffle plate (28) confines plasma into the upper portion of the chamber (2), and at the same time, constitutes a return route of a return current to a high frequency power source (27). A return current flowing through the baffle plate (28) returns to the high frequency power source (27) via the ceiling (2b) of the chamber (2).

    摘要翻译： 在平行板式等离子体处理装置（1）中，挡板（28）装配在室（2）的顶板（2b）和侧壁（2a）之间。 挡板（28）将等离子体限制在室（2）的上部，并且同时构成返回电流返回到高频电源（27）的返回路径。 流经挡板（28）的回流电流通过腔室（2）的顶板（2b）返回到高频电源（27）。

    Method of manufacturing semiconductor device
    3.
    发明授权
    Method of manufacturing semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号：US06620739B1

    公开(公告)日：2003-09-16

    申请号：US09657620

    申请日：2000-09-08

    申请人： Hikaru Yoshitaka ,  Yoshihiro Kato ,  Takashi Kobayashi

    发明人： Hikaru Yoshitaka ,  Yoshihiro Kato ,  Takashi Kobayashi

    IPC分类号： H01L2131

    CPC分类号： H01L21/3148 ,  C23C16/325 ,  C23C16/345 ,  C23C16/36 ,  H01L21/31144 ,  H01L21/31629 ,  H01L21/31633 ,  H01L21/318 ,  H01L21/3185 ,  H01L21/76801 ,  H01L21/76802

    摘要： An inorganic insulating film 103 of SiC is formed on a fluorine-containing carbon film 102 by a chemical vapor deposition process using SiF4 and C2H4 as source gases. By using SiF4 and CF4 containing no hydrogen (H) as source gases, H inhibited from being incorporated into the inorganic insulating film 103 forming a hard mask 113. Thus, H having diffused outwardly from the inorganic insulating film 103 is bonded to fluorine (F) in the fluorine-containing carbon film 102 to form HF which inhibits the corrosion of the inorganic insulating film 103 and so forth. Thus, it is possible to inhibit the deterioration of the adhesion of the hard mask 113 formed of the inorganic insulating film 103 to other layers, such as the fluorine-containing carbon film 102.

    摘要翻译： 通过使用SiF 4和C 2 H 4作为源气体的化学气相沉积法，在含氟碳膜102上形成SiC的无机绝缘膜103。 通过使用不含氢（H）作为源气体的SiF 4和CF 4，H被抑制成形成硬掩模113的无机绝缘膜103.因此，从无机绝缘膜103向外扩散的H与氟结合（F ），形成抑制无机绝缘膜103的腐蚀等的HF。 因此，可以抑制由无机绝缘膜103形成的硬掩模113与其它层（例如含氟碳膜102）的粘附性的劣化。

    RESIN COMPOSITION, PREPREG, AND LAMINATE
    6.
    发明申请
    RESIN COMPOSITION, PREPREG, AND LAMINATE 有权
    树脂组合物，PREPREG和层压板

    公开(公告)号：US20140227924A1

    公开(公告)日：2014-08-14

    申请号：US14119342

    申请日：2012-05-23

    申请人： Takeshi Nobukuni ,  Yoshihiro Kato ,  Meguru Ito ,  Tomoki Hamajima

    发明人： Takeshi Nobukuni ,  Yoshihiro Kato ,  Meguru Ito ,  Tomoki Hamajima

    IPC分类号： C09D163/00 ,  H05K1/03

    CPC分类号： C09D163/00 ,  C08G59/245 ,  C08G59/38 ,  C08G59/4014 ,  C08J5/24 ,  C08J2363/00 ,  C08J2479/04 ,  C08J2483/04 ,  C08L63/00 ,  H05K1/0353 ,  H05K1/0373 ,  H05K2201/012 ,  H05K2201/0209 ,  H05K2201/0212 ,  Y10T428/31529 ,  Y10T442/2008 ,  Y10T442/2951 ,  C08L79/04 ,  C08L83/04

    摘要： A resin composition contains a cyanate ester compound, a maleimide compound, an epoxy resin, a silicone rubber powder, and an inorganic filler. The cyanate ester compound contains a compound represented by the following formula. The silicone rubber powder is contained in an amount of 40 to 150 parts by mass based on 100 parts by mass in total of the cyanate ester compound, the maleimide compound, and the epoxy resin. The inorganic filler is contained in an amount of 100 to 340 parts by mass based on 100 parts by mass in total of the cyanate ester compound, the maleimide compound, and the epoxy resin. A total content of the silicone rubber powder and the inorganic filler is 140 to 380 parts by mass based on 100 parts by mass in total of the cyanate ester compound, the maleimide compound, and the epoxy resin.

    摘要翻译： 树脂组合物含有氰酸酯化合物，马来酰亚胺化合物，环氧树脂，硅橡胶粉末和无机填料。 氰酸酯化合物含有下式表示的化合物。 相对于氰酸酯化合物，马来酰亚胺化合物和环氧树脂的总计100质量份，硅橡胶粉末的含量为40〜150质量份。 相对于氰酸酯化合物，马来酰亚胺化合物和环氧树脂的总计100质量份，无机填料的含量为100〜340质量份。 相对于氰酸酯化合物，马来酰亚胺化合物和环氧树脂的总计100质量份，硅橡胶粉末和无机填料的总含量为140〜380质量份。

    METHOD FOR STORING RESIN SOLUTION, AND METHOD FOR PRODUCING PREPREG AND LAMINATE
    8.
    发明申请
    METHOD FOR STORING RESIN SOLUTION, AND METHOD FOR PRODUCING PREPREG AND LAMINATE 有权
    用于储存树脂溶液的方法，以及用于生产PREPREG和层压材料的方法

    公开(公告)号：US20120018072A1

    公开(公告)日：2012-01-26

    申请号：US13258113

    申请日：2010-03-24

    申请人： Masayoshi Ueno ,  Yoshihiro Kato ,  Takeshi Nobukuni

    发明人： Masayoshi Ueno ,  Yoshihiro Kato ,  Takeshi Nobukuni

    IPC分类号： B32B37/14 ,  B29C51/00 ,  C09D183/04 ,  C09D179/00 ,  C08K5/3415 ,  C09D163/00

    CPC分类号： H05K3/0058 ,  C08G73/0655 ,  C08J5/24 ,  C08J2379/00 ,  C08K3/36 ,  C08K5/3415 ,  C08L79/04 ,  C08L79/085 ,  C09D163/00 ,  C09D179/00 ,  H05K1/0271 ,  Y10T156/10 ,  Y10T428/31511 ,  C08L83/00

    摘要： This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).

    摘要翻译： 本发明涉及一种用于储存在溶液状态下由于长期保存而难以析出的萘酚芳烷基型氰酸酯树脂溶液的方法，特别涉及一种用于储存萘酚芳烷基型氰酸酯树脂溶液（AB ），其包括：（i）包含萘酚芳烷基型氰酸酯树脂（A），马来酰亚胺化合物（B）和溶剂的萘酚芳烷基型氰酸酯树脂溶液（AB），（ii）萘酚芳烷基型氰酸酯 包含萘酚芳烷基型氰酸酯树脂（A），马来酰亚胺化合物（B）和溶剂的预聚物的酯树脂溶液（AB），或（iii）萘酚芳烷基型氰酸酯树脂溶液（AB），其包含预聚物 萘酚芳烷基型氰酸酯树脂（A）和马来酰亚胺化合物（B）和溶剂，和 储存树脂溶液（AB）。