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公开(公告)号：US20240431188A1
公开(公告)日：2024-12-26
申请号：US18824362
申请日：2024-09-04
Applicant: MicroContinuum, Inc.
Inventor： W. Dennis Slafer
IPC: H10K71/00 , H10K50/814 , H10K50/824 , H10K50/842 , H10K50/858 , H10K77/10 , H10K102/00 , H10K102/10
Abstract: Systems, methods, and structures for improving the performance of thin-film electronic devices, in particular organic LEDs (OLEDs) used in lighting, are disclosed. Enhanced substrates, upon which OLED devices may be deposited, incorporate various structures for extracting light trapped in the device stack and substrate. The substrates provide an improved transparent electrode layer. Methods for forming planarized buried extraction structures to reduce disruption to the deposited device stack layers are disclosed, as are methods for providing smooth, planarized buried metal mesh conductors.
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公开(公告)号：US10580649B2
公开(公告)日：2020-03-03
申请号：US15447807
申请日：2017-03-02
Applicant: MicroContinuum Inc.
Inventor： W. Dennis Slafer
IPC: H01L21/027 , H01L27/142 , H01L31/18 , H01L21/467 , H01L21/311 , H01L21/475 , H01L21/3213 , H01L21/308 , H01L21/32 , H01L21/47 , H01L51/00 , H01L31/0352 , H01L31/108 , H01Q1/24
Abstract: The present disclosure advances the art by providing a method and system for forming electronic devices. In particular, and by example only, methods are described for forming devices for harvesting energy in the terahertz frequency range on flexible substrates, wherein the methods provide favorable accuracy in registration of the various device elements and facilitate low-cost R2R manufacturing.
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公开(公告)号：US09307648B2
公开(公告)日：2016-04-05
申请号：US12358964
申请日：2009-01-23
Applicant: W. Dennis Slafer
Inventor： W. Dennis Slafer
IPC: G03F7/20 , B44C1/22 , H05K3/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , C25D1/00 , C25D5/02 , C23C18/16 , B29C35/08 , B05D1/28 , B05D1/32 , B05D1/40 , H01L51/00 , H05K1/03 , H05K3/06 , H05K3/10 , H05K3/14
CPC classification number: H01J37/32009 , B05D1/28 , B05D1/32 , B05D1/40 , B05D2252/02 , B29C2035/0827 , B82Y10/00 , B82Y40/00 , C23C18/1605 , C25D1/003 , C25D5/022 , G03F7/0002 , G03F7/20 , H01J2237/334 , H01L51/0023 , H01L51/5206 , H01L51/5234 , H01L2251/301 , H01L2251/308 , H01L2251/5338 , H05K1/0393 , H05K1/09 , H05K3/0079 , H05K3/061 , H05K3/108 , H05K3/143 , H05K2201/0326 , H05K2203/0108 , H05K2203/0113 , H05K2203/0143 , H05K2203/0264 , H05K2203/1545
Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.
Abstract translation: 公开了通过连续的卷对卷制造方法可以在柔性基板上形成各种材料的图案的系统和方法。 图案可以包括具有横向尺寸的金属，透明导电或非金属元件，其包括在低于100纳米至毫米的范围内，并且厚度尺寸包括从几十埃到大于10,000埃的范围。 衬底可以是能够具有足够柔性的任何材料，以便与基于辊的加工设备（包括聚合物膜，金属箔和薄玻璃）相容，其中聚合物膜代表特别广泛的应用领域。 方法可以包括连续的卷对卷形成临时聚合物结构，其中选定的区域通向下面的基底，构成材料的连续添加或减少，以及必要时连续除去聚合物结构和任何多余材料 。
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公开(公告)号：US20140151935A1
公开(公告)日：2014-06-05
申请号：US14094516
申请日：2013-12-02
Applicant: MICROCONTINUUM, INC.
Inventor： W. Dennis Slafer
IPC: B29C59/16
CPC classification number: B29C35/0888 , B29C35/10 , B29C59/046
Abstract: Methods, apparatus and systems are disclosed by which patterned layers can be formed in a roll-to-roll process using a variable and programmable means for applying liquids and solutions used in the patterning process.
Abstract translation: 公开了方法，装置和系统，通过该方法，装置和系统可以使用可变的和可编程的装置在卷对卷过程中形成图案化的层，用于在图案化工艺中使用液体和溶液。
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公开(公告)号：US20100245998A1
公开(公告)日：2010-09-30
申请号：US12749241
申请日：2010-03-29
Applicant: Vivian K. Walworth , W. Dennis Slafer
Inventor： Vivian K. Walworth , W. Dennis Slafer
CPC classification number: G02B27/26
Abstract: An aspect of the present disclosure provides for a quarter-wave retarder film that is overlaid onto a linearly-polarized stereoscopic image pair in an appropriate orientation in order to produce an image that is viewable using circularly polarized viewing glasses for increased viewing comfort and head-tilt resistance. Another aspect of the present disclosure enables the production of StereoJet-type ink jet images through the use of two separate single-sided clear polarizer substrates with the stretch orientation parallel to the running edge of the support layer. A further aspect of the present disclosure is directed to the production of laminated stereoscopic images in which the spacing of the image planes of the members of the image pair can be made in close proximity, farther proximity, or at an intermediate proximity to achieve desired optical, mechanical and/or visual results.
Abstract translation: 本公开的一个方面提供一种四分之一波长延迟膜，其以适当的取向覆盖在线性偏振立体图像对上，以便产生使用圆偏振观察眼镜可观看的图像，以增加观看舒适度和头戴式耳机， 倾斜阻力。 本公开的另一方面使得能够通过使用具有平行于支撑层的行进边缘的拉伸取向的两个单独的单面透明偏振器基板来生产StereoJet型喷墨图像。 本公开的另一方面涉及层叠立体图像的制造，其中图像对的构件的图像平面的间隔可以靠近，靠近或在中间附近，以实现期望的光学 ，机械和/或视觉效果。
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Patent Agency Ranking
公开(公告)号：US10546607B2
公开(公告)日：2020-01-28
申请号：US15213907
申请日：2016-07-19
Applicant: MicroContinuum, Inc.
Inventor： W. Dennis Slafer
IPC: B41N7/00 , G03F7/00 , B29C59/04 , B82Y10/00 , B82Y40/00 , G03F7/24 , G11B7/26 , C25D1/02 , C25D1/10 , C25D21/02 , C25D17/02 , C25D17/04 , C25D21/10 , C25D21/06 , C25D5/02 , B29C33/38 , C25D7/04 , C25D17/12 , C25D3/04 , C25D3/12 , C25D3/46 , C25D3/48 , C25D17/06 , B29L31/00
Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
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公开(公告)号：US09395623B2
公开(公告)日：2016-07-19
申请号：US13302098
申请日：2011-11-22
Applicant: W. Dennis Slafer
Inventor： W. Dennis Slafer
IPC: G03F7/00 , G03F7/24 , C25D1/02 , C25D1/10 , C25D21/02 , C25D17/02 , C25D17/04 , C25D21/10 , C25D21/06 , B29C33/38 , B82Y10/00 , B82Y40/00 , G11B7/26 , C25D5/02 , C25D7/04 , C25D17/12
CPC classification number: G11B7/263 , B29C33/3857 , B29C59/04 , B29L2031/757 , B82Y10/00 , B82Y40/00 , C25D1/02 , C25D1/10 , C25D3/04 , C25D3/12 , C25D3/46 , C25D3/48 , C25D5/02 , C25D5/022 , C25D7/04 , C25D17/02 , C25D17/04 , C25D17/06 , C25D17/12 , C25D21/02 , C25D21/06 , C25D21/10 , G03F7/0002 , G03F7/24 , G11B7/26 , G11B7/261
Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
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公开(公告)号：US08940117B2
公开(公告)日：2015-01-27
申请号：US12270650
申请日：2008-11-13
Applicant: W. Dennis Slafer
Inventor： W. Dennis Slafer
CPC classification number: H01Q1/364 , B82Y10/00 , B82Y40/00 , C23C18/1605 , C23C18/165 , C25D5/022 , C25D7/00 , G03F7/0002 , Y10T156/1039
Abstract: Techniques are described for fabricating multilayer structures having arrays of conducting elements or apertures in a conductive grid which can be used to form frequency selective surfaces (FSSs), antenna arrays and the like on flexible substrates. Fabrication techniques can include use of a polymer mask or direct dielectric molding. In embodiments utilizing a polymer mask, a temporary 3D polymeric relief pattern is formed on a substrate and used as a mask or stencil to form the desired pattern elements. In an additive process, the conductive material is deposited over the masked surface. Deposition can be followed by mask removal In the subtractive process, the conductive layer can be deposited prior to formation of the polymer mask, and the exposed parts of the underlying conductive layer can be etched. Other embodiments utilize dielectric molding in which the molded structure itself becomes an integral and permanent part of the FSS structure.
Abstract translation: 描述了用于制造具有导电栅格中的导电元件或孔的阵列的多层结构的技术，其可用于在柔性基板上形成频率选择表面（FSS），天线阵列等。 制造技术可以包括使用聚合物掩模或直接电介质成型。 在使用聚合物掩模的实施方案中，在基材上形成临时3D聚合物浮雕图案，并用作掩模或模板以形成所需的图案元素。 在添加工艺中，导电材料沉积在掩模表面上。 沉积后可以通过掩模去除在减法过程中，可以在形成聚合物掩模之前沉积导电层，并且可以蚀刻下面的导电层的暴露部分。 其他实施例使用电介质模制，其中模制结构本身变成FSS结构的整体和永久部分。
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公开(公告)号：US20120125880A1
公开(公告)日：2012-05-24
申请号：US13302731
申请日：2011-11-22
Applicant: W. Dennis Slafer
Inventor： W. Dennis Slafer
CPC classification number: B29C59/002 , B29C59/022 , B29C2059/023 , B29K2905/00 , B29K2995/0026 , H01L51/0023
Abstract: Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
Abstract translation: 描述了用于形成改进的刚性或柔性半透明压印模板的装置，装置，系统和/或方法。 这些模板可用于产生具有改进的分辨率的图案掩模，其不需要用于残留物去除的等离子体蚀刻。 所述方法和设备与卷对卷制造工艺兼容，并且能够实现宽范围的金属图案化薄膜的卷对卷形成。
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公开(公告)号：US07674103B2
公开(公告)日：2010-03-09
申请号：US11337013
申请日：2006-01-20
Applicant: W. Dennis Slafer
Inventor： W. Dennis Slafer
IPC: B29B13/00
CPC classification number: G11B7/263 , B29C33/3857 , B29C59/04 , B29L2031/757 , B82Y10/00 , B82Y40/00 , C25D1/02 , C25D1/10 , C25D3/04 , C25D3/12 , C25D3/46 , C25D3/48 , C25D5/02 , C25D5/022 , C25D7/04 , C25D17/02 , C25D17/04 , C25D17/06 , C25D17/12 , C25D21/02 , C25D21/06 , C25D21/10 , G03F7/0002 , G03F7/24 , G11B7/26 , G11B7/261
Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
Abstract translation: 公开了耐久的无缝复制工具，用于在期望的介质（例如光学记录或数据存储介质）中复制无缝浮雕图案。 公开了制造这种耐用的复制工具的方法，包括在支撑圆筒的内表面上制备记录基底，在基底中记录和显影浮雕图案，形成图案的耐久的负浮雕复制品，提取所得到的耐用的工具套 并且将工具套筒安装在安装夹具上。 公开了用于制造这种无缝复制工具的装置，包括用于在支撑筒的内表面上的感光层上记录期望的浮雕图案的系统。 还公开了用于形成具有期望的浮雕图案的耐用工具套筒的电沉积池。 复制工具浮雕功能可能具有至微米和纳米方面的关键尺寸。
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