Method of measuring photoresist and bump misalignment
    4.
    发明授权
    Method of measuring photoresist and bump misalignment 有权
    测量光刻胶和凸块未对准的方法

    公开(公告)号:US06636313B2

    公开(公告)日:2003-10-21

    申请号:US10045413

    申请日:2002-01-12

    IPC分类号: G01B1100

    摘要: A method including the acts of providing a semiconductor device having a plurality of misalignment ruler markers formed therein for measuring removable layer opening misalignment in the X and Y directions, a bond pad and the passivation layer with an opening therein down to the bond pad. A removable layer is formed over the semiconductor device and includes an opening therein down to the bond pad. Preferably this action includes depositing, patterning and developing a dry photoresist film layer over the semiconductor device with an opening therein down to the bond pad. The next act includes measuring the misalignment of the opening in the passivation layer by counting the number of misalignment ruler markers visibly exposed by the opening in the X-direction and also the Y-direction.

    摘要翻译: 一种方法,包括提供半导体器件的动作,所述半导体器件具有形成在其中的多个不对准标尺标记,用于测量在X和Y方向上的可移除层开口未对准,接合焊盘和钝化层,其中开口向下到接合焊盘。 可移除层形成在半导体器件上方并且包括其中向下到达接合焊盘的开口。 优选地,该动作包括在半导体器件上沉积,图案化和显影干的光致抗蚀剂膜层,其中开口向下到接合焊盘。 下一个动作包括通过计数由X方向和Y方向上的开口可见地露出的未对准标尺标记的数量来测量钝化层中的开口的未对准。