PHYSICAL QUANTITY SENSOR WITH SON STRUCTURE, AND MANUFACTURING METHOD THEREOF
    1.
    发明申请
    PHYSICAL QUANTITY SENSOR WITH SON STRUCTURE, AND MANUFACTURING METHOD THEREOF 有权
    具有SON结构的物理量传感器及其制造方法

    公开(公告)号:US20130193531A1

    公开(公告)日:2013-08-01

    申请号:US13712062

    申请日:2012-12-12

    IPC分类号: H01L29/84

    摘要: Provided by some aspects of the invention is a relatively low-cost, relatively highly accurate physical quantity sensor, and a manufacturing method thereof, that relaxes thermal stress from an outer peripheral portion of a diaphragm in a silicon-on-nothing (“SON”) structure. By providing a stress relaxation region (trench groove) in an outer peripheral portion of a diaphragm in a SON structure, there can be, in some aspects of the invention, a benefit of relaxing the transmission to the diaphragm of thermal stress generated by the difference in linear expansion coefficient between a package and chip, and it is possible to relax the transmission to an electronic circuit disposed in an outer peripheral portion of mechanical stress generated by a measured pressure. As a result of this, it is possible to provide a highly accurate physical quantity sensor.

    摘要翻译: 通过本发明的某些方面提供了一种相对低成本,相对高度精确的物理量传感器及其制造方法,其在无硅无极(“SON”)中松弛来自隔膜的外周部分的热应力, ) 结构体。 通过在SON结构中的隔膜的外周部设置应力松弛区域(沟槽),在本发明的一些方面,可以有利于放松由隔膜产生的热应力对隔膜的传递 在封装和芯片之间的线膨胀系数,并且可以放松到设置在由测量压力产生的机械应力的外周部分中的电子电路的传输。 作为其结果,可以提供高精度的物理量传感器。

    Method of forming radiation hard integrated circuits
    3.
    发明授权
    Method of forming radiation hard integrated circuits 失效
    形成辐射硬集成电路的方法

    公开(公告)号:US5418174A

    公开(公告)日:1995-05-23

    申请号:US905020

    申请日:1992-06-26

    摘要: A method is provided for forming a radiation hard dielectric region of a semiconductor integrated circuit, and an integrated circuit formed according to the same. A field oxide region, a gate oxide layer and an interlevel dielectric layer are formed over the integrated circuit. Silicon ions are implanted separately into the field oxide region, gate oxide layer and interlevel dielectric layer to a sufficient dosage of less than or equal to approximately 1.times.10.sup.14 /cm.sup.2 to form electron traps to capture radiation induced electrons. This method allows for selective enhancement of radiation hardness of a portion of a circuit, thus providing an on-chip "dosimeter" which can be used to compensate the circuit for the loss of performance due to ionizing radiation.

    摘要翻译: 提供一种用于形成半导体集成电路的辐射硬介电区域的方法和根据该集成电路形成的集成电路。 在集成电路上形成场氧化物区域,栅极氧化物层和层间电介质层。 将硅离子分别注入到场氧化物区域,栅极氧化物层和层间电介质层中,以足够的剂量小于或等于约1×10 14 / cm 2,以形成捕获辐射诱导电子的电子阱。 该方法允许选择性地增强电路的一部分的辐射硬度,从而提供片上“剂量计”,其可用于补偿电路由于电离辐射导致的性能损失。

    Semiconductor device
    5.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US4484212A

    公开(公告)日:1984-11-20

    申请号:US335712

    申请日:1981-12-29

    摘要: A semiconductor device comprising a semiconductor substrate having at least two resistor elements, wherein said resistor elements have a specific resistance ratio relative to each other, an insulation layer formed on a major surface of said semiconductor substrate, a circuit wiring layer formed on said insulation layer covering a portion of said insulation layer which corresponds to at least one of said resistor elements, and a dummy wiring layer made of the same material as that of the circuit wiring layer and formed on the insulation layer covering that portion of said insulation layer which corresponds to the resistor element or elements not covered by said circuit wiring layer, and where the ratio of an overlapping area of one resistor element in said circuit wiring layer and an overlapping area of the other resistor element and said dummy wiring layer is equal to a resistance ratio of said resistor elements.

    摘要翻译: 一种半导体器件,包括具有至少两个电阻元件的半导体衬底,其中所述电阻元件相对于彼此具有比电阻比,形成在所述半导体衬底的主表面上的绝缘层,形成在所述绝缘层上的电路布线层 覆盖对应于所述电阻元件中的至少一个的所述绝缘层的一部分,以及由与所述电路布线层相同的材料制成的虚拟布线层,并形成在所述绝缘层上,覆盖所述绝缘层对应的部分 连接到所述电路布线层未被覆盖的电阻元件或元件,并且其中所述电路布线层中的一个电阻元件的重叠区域与所述另一个电阻元件与所述伪布线层的重叠区域的重叠面积之比等于电阻 所述电阻元件的比例。

    Integrated semiconductor device
    6.
    发明授权
    Integrated semiconductor device 失效
    集成半导体器件

    公开(公告)号:US3666995A

    公开(公告)日:1972-05-30

    申请号:US3666995D

    申请日:1970-04-28

    申请人: PHILIPS CORP

    CPC分类号: H01L27/0802 Y10S257/925

    摘要: In an integrated semiconductor device according to the invention, a resistance element with small resistance comprises between its electric connections a number of parallel arranged resistance zones of the same width and thickness. The influence of inaccuracies in providing the electric connections is eliminated, and a zone of a resistance element with large resistor may have the same width and thickness as the parallel zones of the resistance element with small resistance.

    摘要翻译: 在根据本发明的集成半导体器件中,具有小电阻的电阻元件在其电连接之间包括相同宽度和厚度的多个平行布置的电阻区域。 消除了提供电连接的不精确度的影响,并且具有大电阻器的电阻元件的区域可以具有与电阻小的电阻元件的平行区域相同的宽度和厚度。

    Physical quantity sensor with son structure, and manufacturing method thereof
    8.
    发明授权
    Physical quantity sensor with son structure, and manufacturing method thereof 有权
    具有子结构的物理量传感器及其制造方法

    公开(公告)号:US08884385B2

    公开(公告)日:2014-11-11

    申请号:US13712062

    申请日:2012-12-12

    摘要: Provided by some aspects of the invention is a relatively low-cost, relatively highly accurate physical quantity sensor, and a manufacturing method thereof, that relaxes thermal stress from an outer peripheral portion of a diaphragm in a silicon-on-nothing (“SON”) structure. By providing a stress relaxation region (trench groove) in an outer peripheral portion of a diaphragm in a SON structure, there can be, in some aspects of the invention, a benefit of relaxing the transmission to the diaphragm of thermal stress generated by the difference in linear expansion coefficient between a package and chip, and it is possible to relax the transmission to an electronic circuit disposed in an outer peripheral portion of mechanical stress generated by a measured pressure. As a result of this, it is possible to provide a highly accurate physical quantity sensor.

    摘要翻译: 通过本发明的某些方面提供了一种相对低成本,相对高度精确的物理量传感器及其制造方法,其在无硅无极(“SON”)中松弛来自隔膜的外周部分的热应力, ) 结构体。 通过在SON结构中的隔膜的外周部设置应力松弛区域(沟槽),在本发明的一些方面,可以有利于放松由隔膜产生的热应力对隔膜的传递 在封装和芯片之间的线膨胀系数,并且可以放松到设置在由测量压力产生的机械应力的外周部分中的电子电路的传输。 作为其结果,可以提供高精度的物理量传感器。