Silicon chip carrier with through-vias using laser assisted chemical vapor deposition of conductor
    1.
    发明授权
    Silicon chip carrier with through-vias using laser assisted chemical vapor deposition of conductor 有权
    采用激光辅助化学气相沉积导体的通孔的硅芯片载体

    公开(公告)号:US07019402B2

    公开(公告)日:2006-03-28

    申请号:US10686640

    申请日:2003-10-17

    IPC分类号: H01L23/48

    摘要: This disclosure teaches a method of filling deep vias or capping deep conducting paste filled vias in silicon or glass substrate using laser assisted chemical vapor deposition of metals. This method uses a continuous wave or pulsed laser to heat the via bottom and the growing metal fill selectively by selecting the laser wavelength such that silicon and/or glass do not absorb the energy of the laser in any appreciable manner to cause deposition in the field. Alternatively holographic mask or an array of micro lenses may be used to focus the laser beams to the vias to fill them with metal. The substrate is moved in a controlled manner in the z-direction away from the laser at about the rate of deposition thus causing the laser heating to be focused on the surface region of the growing metal fill.

    摘要翻译: 该公开内容教导了使用金属的激光辅助化学气相沉积在硅或玻璃基板中填充深通孔或者封装深导电糊填充通孔的方法。 该方法使用连续波或脉冲激光器通过选择激光波长来选择性地加热通孔底部和生长金属填充物,使得硅和/或玻璃不以任何可察觉的方式吸收激光的能量以在场中沉积 。 或者,可以使用全息掩模或微透镜阵列来将激光束聚焦到通孔以用金属填充它们。 以大约的沉积速率,以z方向以受控方式远离激光器移动衬底,从而使激光加热聚焦在生长金属填充物的表面区域上。

    Low temperature Bi-CMOS compatible process for MEMS RF resonators and filters
    7.
    发明授权
    Low temperature Bi-CMOS compatible process for MEMS RF resonators and filters 失效
    用于MEMS RF谐振器和滤波器的低温Bi-CMOS兼容工艺

    公开(公告)号:US07943412B2

    公开(公告)日:2011-05-17

    申请号:US10316254

    申请日:2002-12-10

    IPC分类号: H01L21/00

    摘要: A method of formation of a microelectromechanical system (MEMS) resonator or filter which is compatible with integration with any analog, digital, or mixed-signal integrated circuit (IC) process, after or concurrently with the formation of the metal interconnect layers in those processes, by virtue of its materials of composition, processing steps, and temperature of fabrication is presented. The MEMS resonator or filter incorporates a lower metal level, which forms the electrodes of the MEMS resonator or filter, that may be shared with any or none of the existing metal interconnect levels on the IC. It further incorporates a resonating member that is comprised of at least one metal layer for electrical connection and electrostatic actuation, and at least one dielectric layer for structural purposes. The gap between the electrodes and the resonating member is created by the deposition and subsequent removal of a sacrificial layer comprised of a carbon-based material. The method of removal of the sacrificial material is by an oxygen plasma or an anneal in an oxygen containing ambient. A method of vacuum encapsulation of the MEMS resonator or filter is provided through means of a cavity containing the MEMS device, filled with additional sacrificial material, and sealed. Access vias are created through the membrane sealing the cavity; the sacrificial material is removed as stated previously, and the vias are re-sealed in a vacuum coating process.

    摘要翻译: 一种形成微机电系统(MEMS)谐振器或滤波器的方法,其与在任何模拟,数字或混合信号集成电路(IC)工艺中的集成兼容,或者与这些工艺中的金属互连层的形成同时 ,由于其组成材料,加工步骤和制造温度。 MEMS谐振器或滤波器包含形成MEMS谐振器或滤波器的电极的较低金属电平,其可与IC上的现有金属互连电平中的任何一个或任何一个共享。 它还包括谐振元件,该谐振元件由用于电连接和静电驱动的至少一个金属层和至少一个用于结构目的的电介质层组成。 通过沉积并随后去除由碳基材料构成的牺牲层来产生电极和谐振构件之间的间隙。 去除牺牲材料的方法是通过氧等离子体或在含氧环境中的退火。 MEMS谐振器或滤波器的真空封装方法是通过一个包含MEMS器件的空腔的装置提供的,其中填充有额外的牺牲材料并被密封。 通过隔膜密封腔形成通孔; 如先前所述去除牺牲材料,并且在真空涂覆工艺中重新密封通孔。