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    METHOD FOR TRANSFERRING GRAPHENE
    95.
    发明申请
    METHOD FOR TRANSFERRING GRAPHENE 审中-公开
    转印石墨的方法

    公开(公告)号：US20170057812A1

    公开(公告)日：2017-03-02

    申请号：US15220234

    申请日：2016-07-26

    Applicant: GRAPHENEA S.A.

    Inventor： M. Amaia ZURUTUZA ELORZA ,  M. Alba CENTENO PEREZ

    IPC: B81C1/00

    CPC classification number: H01L21/02527 ,  B32B37/025 ,  B32B38/0036 ,  B32B38/10 ,  B81C1/00158 ,  B81C2201/0133 ,  B81C2201/0176 ,  B81C2201/0191 ,  B81C2201/053 ,  C01B32/194 ,  H01L21/02664

    Abstract: A method of transferring graphene onto a target substrate having cavities and/or holes or onto a substrate having at least one water soluble layer is disclosed. It comprises the steps of: applying a protective layer (4) onto a sample comprising a stack (20) formed by a graphene monolayer (2) grown on a metal foil or on a metal thin film on a silicon substrate (1); attaching to said protective layer (4) a frame (5) comprising at least one outer border and at least one inner border, said frame (5) comprising a substrate and a thermal release adhesive polymer layer, the frame (5) providing integrity and allowing the handling of said sample; removing or detaching said metal foil or metal thin film on a silicon substrate (1); once the metal foil or metal thin film on a silicon substrate (1) has been removed or detached, drying the sample; depositing the sample onto a substrate (7); removing said frame (5) by cutting through said protective layer (4) at said at least one inner border of the frame (5) or by thermal release.

    Abstract translation: 公开了一种将石墨烯转移到具有空穴和/或空穴的目标基底上或具有至少一个水溶性层的基底上的方法。 其包括以下步骤：将保护层（4）施加到包含由在金属箔上生长的石墨烯单层（2）或在硅衬底（1）上的金属薄膜上形成的堆叠（20）的样品上; 附接到所述保护层（4）包括至少一个外边界和至少一个内边界的框架（5），所述框架（5）包括基底和热释放粘合聚合物层，所述框架（5）提供完整性和 允许处理所述样品; 在硅衬底（1）上移除或分离所述金属箔或金属薄膜; 一旦硅衬底（1）上的金属箔或金属薄膜被去除或分离，干燥样品; 将样品沉积到衬底（7）上; 通过在框架（5）的所述至少一个内边界处切割所述保护层（4）或通过热释放来移除所述框架（5）。

    Microelectromechanical device including an encapsulation layer of which a portion is removed to expose a substantially planar surface having a portion that is disposed outside and above a chamber and including a field region on which integrated circuits are formed, and methods for fabricating same
    97.
    发明授权
    Microelectromechanical device including an encapsulation layer of which a portion is removed to expose a substantially planar surface having a portion that is disposed outside and above a chamber and including a field region on which integrated circuits are formed, and methods for fabricating same 有权
    微电子机械装置包括一个封装层，一个部分被去除以暴露一个基本平坦的表面，该表面具有一个设置在室外的部分，并且包括形成有集成电路的场区域，以及用于制造集成电路的方法

    公开(公告)号：US08623686B2

    公开(公告)日：2014-01-07

    申请号：US13829393

    申请日：2013-03-14

    Applicant: Aaron Partridge ,  Markus Lutz ,  Silvia Kronmueller

    Inventor： Aaron Partridge ,  Markus Lutz ,  Silvia Kronmueller

    IPC: H01L21/00

    CPC classification number: B81C1/00261 ,  B81B2207/015 ,  B81C1/00333 ,  B81C2201/0176 ,  B81C2203/0136 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a MEMS device, and technique of fabricating or manufacturing a MEMS device, having mechanical structures encapsulated in a chamber prior to final packaging. The material that encapsulates the mechanical structures, when deposited, includes one or more of the following attributes: low tensile stress, good step coverage, maintains its integrity when subjected to subsequent processing, does not significantly and/or adversely impact the performance characteristics of the mechanical structures in the chamber (if coated with the material during deposition), and/or facilitates integration with high-performance integrated circuits. In one embodiment, the material that encapsulates the mechanical structures is, for example, silicon (polycrystalline, amorphous or porous, whether doped or undoped), silicon carbide, silicon-germanium, germanium, or gallium-arsenide.

    Abstract translation: 这里描述和说明了许多发明。 在一个方面，本发明涉及MEMS器件，以及制造或制造MEMS器件的技术，其具有在最终封装之前封装在腔室中的机械结构。 当沉积时，封装机械结构的材料包括以下属性中的一个或多个：低拉伸应力，良好的阶梯覆盖，在经受后续加工时保持其完整性，不会显着和/或不利地影响 室中的机械结构（如果在沉积期间涂覆材料）和/或促进与高性能集成电路的集成。 在一个实施例中，封装机械结构的材料是例如硅（多晶，无定形或多孔，无论掺杂或未掺杂），碳化硅，硅 - 锗，锗或砷化镓。

    MICROELECTROMECHANICAL DEVICE INCLUDING AN ENCAPSULATION LAYER OF WHICH A PORTION IS REMOVED TO EXPOSE A SUBSTANTIALLY PLANAR SURFACE HAVING A PORTION THAT IS DISPOSED OUTSIDE AND ABOVE A CHAMBER AND INCLUDING A FIELD REGION ON WHICH INTEGRATED CIRCUITS ARE FORMED, AND METHODS FOR FABRICATING SAME
    98.
    发明申请
    MICROELECTROMECHANICAL DEVICE INCLUDING AN ENCAPSULATION LAYER OF WHICH A PORTION IS REMOVED TO EXPOSE A SUBSTANTIALLY PLANAR SURFACE HAVING A PORTION THAT IS DISPOSED OUTSIDE AND ABOVE A CHAMBER AND INCLUDING A FIELD REGION ON WHICH INTEGRATED CIRCUITS ARE FORMED, AND METHODS FOR FABRICATING SAME 有权
    微电子装置，其中包括一部分的封装层，其中所述掩蔽层被移除以暴露出具有外部并在室外排出的部分的主要平面表面，并且包括形成集成电路的场区域及其制造方法

    公开(公告)号：US20130280842A1

    公开(公告)日：2013-10-24

    申请号：US13829393

    申请日：2013-03-14

    Applicant: Aaron PARTRIDGE ,  Markus LUTZ ,  Silvia Kronmueller

    Inventor： Aaron PARTRIDGE ,  Markus LUTZ ,  Silvia Kronmueller

    IPC: B81C1/00

    CPC classification number: B81C1/00261 ,  B81B2207/015 ,  B81C1/00333 ,  B81C2201/0176 ,  B81C2203/0136 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a MEMS device, and technique of fabricating or manufacturing a MEMS device, having mechanical structures encapsulated in a chamber prior to final packaging. The material that encapsulates the mechanical structures, when deposited, includes one or more of the following attributes: low tensile stress, good step coverage, maintains its integrity when subjected to subsequent processing, does not significantly and/or adversely impact the performance characteristics of the mechanical structures in the chamber (if coated with the material during deposition), and/or facilitates integration with high-performance integrated circuits. In one embodiment, the material that encapsulates the mechanical structures is, for example, silicon (polycrystalline, amorphous or porous, whether doped or undoped), silicon carbide, silicon-germanium, germanium, or gallium-arsenide.

    Abstract translation: 这里描述和说明了许多发明。 在一个方面，本发明涉及MEMS器件，以及制造或制造MEMS器件的技术，其具有在最终封装之前封装在腔室中的机械结构。 当沉积时，封装机械结构的材料包括以下属性中的一个或多个：低拉伸应力，良好的阶梯覆盖，在经受后续加工时保持其完整性，不会显着和/或不利地影响 室中的机械结构（如果在沉积期间涂覆材料）和/或促进与高性能集成电路的集成。 在一个实施例中，封装机械结构的材料是例如硅（多晶，无定形或多孔，无论掺杂或未掺杂），碳化硅，硅 - 锗，锗或砷化镓。

    Coated Capacitive Sensor
    99.
    发明申请
    Coated Capacitive Sensor 审中-公开
    涂层电容传感器

    公开(公告)号：US20130032904A1

    公开(公告)日：2013-02-07

    申请号：US13197981

    申请日：2011-08-04

    Applicant: Ando Feyh ,  Johannes Classen

    Inventor： Ando Feyh ,  Johannes Classen

    IPC: H01L29/84 ,  H01L21/00

    CPC classification number: B81B3/0086 ,  B81B3/0008 ,  B81C2201/0169 ,  B81C2201/017 ,  B81C2201/0176

    Abstract: In one embodiment, a method of forming a MEMS device includes providing a substrate, forming a sacrificial layer above the substrate layer, forming a silicon based working portion on the sacrificial layer, releasing the silicon based working portion from the sacrificial layer such that the working portion includes at least one exposed outer surface, forming a first layer of silicide forming metal on the at least one exposed outer surface of the silicon based working portion, and forming a first silicide layer with the first layer of silicide forming metal.

    Abstract translation: 在一个实施例中，形成MEMS器件的方法包括提供衬底，在衬底层上形成牺牲层，在牺牲层上形成硅基工作部分，从牺牲层释放硅基工作部分，使得工作 部分包括至少一个暴露的外表面，在硅基工作部分的至少一个暴露的外表面上形成第一层硅化物形成金属，以及形成具有第一层硅化物形成金属的第一硅化物层。

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