公开(公告)号：US20090305437A1

公开(公告)日：2009-12-10

申请号：US12282160

申请日：2007-03-08

Applicant: Pierre-Marc Allemand ,  Manfred Heidecker ,  Gregory L. Kirk ,  Xina Quan ,  Cheng-I Wang

Inventor： Pierre-Marc Allemand ,  Manfred Heidecker ,  Gregory L. Kirk ,  Xina Quan ,  Cheng-I Wang

IPC: H01L21/36 ,  C07K2/00 ,  C07K16/00

CPC classification number: G03F7/265 ,  B82Y10/00 ,  B82Y30/00 ,  G01N33/54353 ,  G03F7/165 ,  H01L21/0237 ,  H01L21/02439 ,  H01L21/02521 ,  H01L21/02639 ,  H01L21/02645 ,  H01L21/02647

Abstract: A method of forming an integrated circuit layer material is described, comprising depositing a layer of templates on a substrate, said template including a first binding site having an affinity for the substrate, a second binding site having an affinity for a target integrated circuit material and a protecting material coupled to the second binding site via a labile linkage to prevent the binding site from binding to the target integrated circuit material; exposing the template to an external stimulus to degrade the labile linkage; removing the protecting material; and binding the integrated circuit material to the second binding site.

Abstract translation: 描述了形成集成电路层材料的方法，包括在衬底上沉积模板层，所述模板包括对衬底具有亲和性的第一结合位点，对目标集成电路材料具有亲和力的第二结合位点，以及 经由不稳定连接物耦合到第二结合位点的保护材料以防止结合位点结合到靶集成电路材料; 将模板暴露于外部刺激以降低不稳定性联系; 去除保护材料; 并将集成电路材料结合到第二结合位点。

公开(公告)号：US07569252B2

公开(公告)日：2009-08-04

申请号：US10449685

申请日：2003-06-02

Applicant: Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

Inventor： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

IPC: B05D5/00

CPC classification number: B82B3/00 ,  B05D1/007 ,  B05D1/185 ,  B05D1/26 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/165 ,  Y10S977/84 ,  Y10S977/857 ,  Y10S977/863 ,  Y10S977/877 ,  Y10T428/24917 ,  Y10T436/24

Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN and kits for performing DPN.The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.

Abstract translation: 本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子 固态基板为“墨水”。 在DPN中使用分子从SPM尖端到固体基质的毛细管传输，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微尺寸和纳米尺寸的器件。 本发明还提供由DPN图案化的基材和用于进行DPN的试剂盒。 本发明还提供了一种在空气中进行AFM成像的方法。 该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。 最后，本发明提供涂覆有疏水化合物的AFM尖端。

公开(公告)号：US07524534B2

公开(公告)日：2009-04-28

申请号：US10937877

申请日：2004-09-10

Applicant: Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

Inventor： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

IPC: B05D1/26

CPC classification number: B82B3/00 ,  B05D1/007 ,  B05D1/185 ,  B05D1/26 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/165 ,  Y10S977/849 ,  Y10S977/853 ,  Y10S977/854 ,  Y10S977/855 ,  Y10S977/856 ,  Y10S977/857 ,  Y10S977/86 ,  Y10S977/88 ,  Y10S977/884 ,  Y10S977/885 ,  Y10S977/886 ,  Y10S977/895 ,  Y10T428/24802

Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN), which utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid-state substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging preformed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.

Abstract translation: 本发明提供一种称为“浸笔”纳米光刻（DPN）的光刻方法，其使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态 衬底（例如，金）作为“纸”，以及对固态衬底具有化学亲和力的分子作为“油墨”。 在DPN中使用分子从SPM尖端到固态基底的毛细管转运，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微米级和纳米尺寸的器件。 本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。 本发明还提供了一种在空气中进行AFM成像的方法。 该方法包括用疏水化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端预成型的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。 最后，本发明提供涂覆有疏水化合物的AFM尖端。

公开(公告)号：US07514764B2

公开(公告)日：2009-04-07

申请号：US11386226

申请日：2006-03-21

Applicant: Paul F Nealey ,  Tushar S. Jain ,  Erik W. Edwards ,  Juan J. de Pablo

Inventor： Paul F Nealey ,  Tushar S. Jain ,  Erik W. Edwards ,  Juan J. de Pablo

IPC: H01L23/58 ,  C12Q1/68 ,  C12M1/36

CPC classification number: H01L21/3086 ,  B81C1/00404 ,  B82B3/0014 ,  B82Y10/00 ,  B82Y30/00 ,  C08J7/12 ,  C08J7/16 ,  G03F1/68 ,  G03F7/165 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/3083

Abstract: The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.

Abstract translation: 本发明在衬底上提供尺寸小于50nm的图案特征。 根据各种实施例，特征可以是“曼哈顿式”结构，具有高纵横比，和/或具有原子平滑表面。 图案特征由接枝到基底上的聚合物刷制成。 在一些实施方案中，可以通过调整电刷的接枝密度和/或分子量来确定特征的尺寸。 一旦刷子被图案化，就可以通过热处理或溶剂处理来形成特征并重新形成特征，以实现所需的轮廓。 因此，聚合物刷的化学性质独立于图案化工艺，这允许优化用于特定应用的聚合物刷。 应用包括用于图案转移技术的掩模，例如反应离子蚀刻。

公开(公告)号：US07479362B2

公开(公告)日：2009-01-20

申请号：US11116265

申请日：2005-04-28

Applicant: Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

Inventor： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C07D207/404 ,  B82Y30/00 ,  G03F7/0045 ,  G03F7/165 ,  Y10S430/116 ,  Y10S430/136

Abstract: Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention can provide a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety: X—Y-Z   (0) where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable structure by itself and Z represents a structure which is capable of changing solid-state properties on the solid-phase surface or a reactive structure.

Abstract translation: 本发明的方面提供了一种控制固相表面的固态特性或控制成形反应区的方法。 该方法可以通过使用用于喷射液滴的装置和用于包含在SAM中的分子来实现，该SAM可以使用低能量UV辐射（即具有相对长的波长的电视辐射）在短时间内进行光刻图案化。 本发明可以提供由分子构成的单分子膜，该分子包含疏水性和/或疏水性的结构成分（B）和当波长为254-400nm的紫外线照射时分解的结构成分（A） 以除去具有结构组分（B）的分子的一部分，留下残留的亲水结构组分（C）。 此外，本发明可以提供一种形成膜图案的方法，包括： 在具有功能部分的固相表面上至少喷射包含下述式（0）表示的化合物的液滴的步骤：<？in-line-formula description =“In-line Formulas”end = “lead”？> XYZ（0）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中，X表示与固相存在的功能部分具有反应性的结构 表面，Y表示本身可分解的结构，Z表示能够改变固相表面或反应性结构的固态性质的结构。

公开(公告)号：US07473513B1

公开(公告)日：2009-01-06

申请号：US11505324

申请日：2006-08-17

Applicant: Jong Jin Park ,  Eun Jeong Jeong ,  Sang Yoon Lee

Inventor： Jong Jin Park ,  Eun Jeong Jeong ,  Sang Yoon Lee

IPC: G03C1/52 ,  G03C1/735 ,  G03F7/027

CPC classification number: G03F7/165 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0047 ,  G03F7/016 ,  G03F7/027 ,  Y10S430/117

Abstract: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.

Abstract translation: 感光性金属纳米粒子及使用其形成导电图案的方法，其中在金属纳米粒子的表面上形成硫醇化合物的自组装单层或具有末端反应性基团的异氰化物化合物，并将光敏基团引入到 终端反应组。 感光金属纳米粒子可以容易地形成在暴露于紫外线时具有优异导电性的导电膜或图案，因此可用于抗静电可洗涤粘性垫或鞋，导电聚氨酯打印辊，电磁干扰屏蔽等。

公开(公告)号：US20090001049A1

公开(公告)日：2009-01-01

申请号：US12187070

申请日：2008-08-06

Applicant: George M. Whitesides ,  Younan Xia ,  James L. Wilbur ,  Rebecca J. Jackman ,  Enoch Kim ,  Mara G. Prentiss ,  Milan Mrksich ,  Amit Kumar ,  Christopher B. Gorman ,  Hans Biebuyck ,  Karl K. Berggren

Inventor： George M. Whitesides ,  Younan Xia ,  James L. Wilbur ,  Rebecca J. Jackman ,  Enoch Kim ,  Mara G. Prentiss ,  Milan Mrksich ,  Amit Kumar ,  Christopher B. Gorman ,  Hans Biebuyck ,  Karl K. Berggren

IPC: C03C15/00

CPC classification number: B01L3/5085 ,  B01J2219/00382 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01L3/5088 ,  B01L2300/0654 ,  B01L2300/0819 ,  B01L2300/0851 ,  B05D1/283 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C40B60/14 ,  G02B5/1857 ,  G02B6/124 ,  G02B6/136 ,  G02B2006/12102 ,  G02B2006/12104 ,  G02B2006/12107 ,  G03F7/0002 ,  G03F7/165 ,  H01L21/4867 ,  H01L21/768

Abstract: Improved methods of forming a patterned self-assembled monolayer on a surface and derivative articles are provided. According to one method, an elastomeric stamp is deformed during and/or prior to using the stamp to print a self-assembled molecular monolayer on a surface. According to another method, during monolayer printing the surface is contacted with a liquid that is immiscible with the molecular monolayer-forming species to effect controlled reactive spreading of the monolayer on the surface. Methods of printing self-assembled molecular monolayers on nonplanar surfaces and derivative articles are provided, as are methods of etching surfaces patterned with self-assembled monolayers, including methods of etching silicon. Optical elements including flexible diffraction gratings, mirrors, and lenses are provided, as are methods for forming optical devices and other articles using lithographic molding. A method for controlling the shape of a liquid on the surface of an article is provided, involving applying the liquid to a self-assembled monolayer on the surface, and controlling the electrical potential of the surface.

Abstract translation: 提供了在表面和衍生物品上形成图案化自组装单层的改进方法。 根据一种方法，弹性印模在使用印模期间和/或之前变形，以在表面上印刷自组装分子单层。 根据另一种方法，在单层印刷过程中，表面与与分子单层形成物质不混溶的液体接触，以实现单层在表面上的受控的反应性扩散。 提供了在非平面表面和衍生物上印刷自组装分子单层的方法，以及用自组装单层蚀刻表面的方法，包括蚀刻硅的方法。 提供包括柔性衍射光栅，反射镜和透镜的光学元件，以及用于使用光刻成型形成光学器件和其它制品的方法。 提供了一种用于控制制品表面上的液体形状的方法，包括将液体施加到表面上的自组装单层，并控制表面的电位。

公开(公告)号：US20080311513A1

公开(公告)日：2008-12-18

申请号：US11505324

申请日：2006-08-17

Applicant: Jong Jin Park ,  Eun Jeong Jeong ,  Sang Yoon Lee

Inventor： Jong Jin Park ,  Eun Jeong Jeong ,  Sang Yoon Lee

IPC: G03C1/52

CPC classification number: G03F7/165 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0047 ,  G03F7/016 ,  G03F7/027 ,  Y10S430/117

Abstract: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.

Abstract translation: 感光性金属纳米粒子及使用其形成导电图案的方法，其中在金属纳米粒子的表面上形成硫醇化合物的自组装单层或具有末端反应性基团的异氰化物化合物，并将光敏基团引入到 终端反应组。 感光金属纳米粒子可以容易地形成在暴露于紫外线时具有优异导电性的导电膜或图案，因此可用于抗静电可洗涤粘性垫或鞋，导电聚氨酯打印辊，电磁干扰屏蔽等。

公开(公告)号：US07393567B2

公开(公告)日：2008-07-01

申请号：US11086429

申请日：2005-03-23

Applicant: Koichi Kawamura

Inventor： Koichi Kawamura

IPC: B05D1/32 ,  G03C1/73

CPC classification number: G03F7/165 ,  C23C18/1608 ,  C23C18/1612 ,  C23C18/1868 ,  C23C18/1893 ,  C23C18/204 ,  C23C18/2086 ,  C23C18/30 ,  C23C18/405 ,  C23C18/44 ,  C23C18/50 ,  G03F7/029 ,  H05K3/185 ,  H05K3/389 ,  H05K2203/1157 ,  H05K2203/1168

Abstract: The present invention provides a pattern forming method comprising bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety, contacting a radical-polymerizable unsaturated compound with the substrate, and exposing light thereto patternwise, so as to form a region where a graft polymer is generated and a region where a graft polymer is not generated. A conductive pattern forming method applying the pattern forming method, and a conductive pattern material obtained by the conductive film forming method.

Abstract translation: 本发明提供一种图案形成方法，其包括将化合物键合到基底上，所述化合物同时具有能够进行光切割的聚合引发部分以引发自由基聚合和底物键合部分，使可自由基聚合的不饱和化合物与基底接触，以及 以图案方式曝光，从而形成接枝聚合物产生的区域和不产生接枝聚合物的区域。 应用图案形成方法的导电图案形成方法和通过导电膜形成方法得到的导电图案材料。

公开(公告)号：US20080118644A1

公开(公告)日：2008-05-22

申请号：US11963970

申请日：2007-12-24

Applicant: Joseph M. JACOBSON ,  David W. MOSLEY

Inventor： Joseph M. JACOBSON ,  David W. MOSLEY

IPC: B05D1/36

CPC classification number: H01L21/02112 ,  B05D1/185 ,  B82Y30/00 ,  B82Y40/00 ,  G01N31/22 ,  G03F7/165 ,  H01L21/283 ,  Y10S977/882 ,  Y10S977/883

Abstract: A self-replicating monolayer system employing polymerization of monomers or nanoparticle ensembles on a defined template provides a method for synthesis of two-dimensional single molecule polymers. Systems of self-replicating monolayers are used as templates for growth of inorganic colloids. A preferred embodiment employs SAM-based replication, wherein an initial monolayer is patterned and used as a template for self-assembly of a second monolayer by molecular recognition. The second monolayer is polymerized in place and the monolayers are separated to form a replicate. Both may then function as templates for monolayer assemblies. A generic self-replicating monomer unit comprises a polymerizable moiety attached by methylene repeats to a recognition element and an ending unit that will not interfere with the chosen recognition chemistry. The recognition element is self-complementary, unless a set of two replicating monomers with compatible cross-linking chemistry is employed. In a two-component replication system utilizing two different kinds of recognition chemistries, the initial template undergoes replication cycles, while maintaining two-dimensional segregation of the two types of monomers. During subsequent replications, the component domains experience little or no mixing, allowing the two-component, patterned assembly to be exponentially replicated. After replication, selective mineralization and/or electroless plating may produce a two-dimensional inorganic sheet having patterned domains within it.

Abstract translation: 使用单体或纳米颗粒聚合体在定义的模板上进行聚合的自复制单层体系提供了合成二维单分子聚合物的方法。 自复制单层系统用作无机胶体生长的模板。 优选的实施方案采用基于SAM的复制，其中初始单层被图案化并用作通过分子识别自组装第二单层的模板。 将第二单层聚合就位，并将单层分离形成复制物。 然后两者都可以作为单层组件的模板。 一般的自复制单体单元包括通过亚甲基重复序列连接到识别元件的可聚合部分和不会干扰所选择的识别化学物质的结束单元。 识别元件是自互补的，除非使用具有相容的交联化学的两组复制单体。 在使用两种不同类型的识别化学物质的双组分复制系统中，初始模板经历复制循环，同时保持两种类型的单体的二维分离。 在随后的复制过程中，组件域经历很少或不混合，允许双组分图案化组件以指数方式复制。 复制后，选择性矿化和/或化学镀可以产生其内具有图案区的二维无机片。