公开(公告)号：US11804355B2

公开(公告)日：2023-10-31

申请号：US17418749

申请日：2019-11-26

Applicant: ASML Netherlands B.V.

Inventor： Yan Ren

IPC: H01J37/05 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/055 ,  H01J2237/1205 ,  H01J2237/24592

Abstract: Systems and methods of observing a sample in a multi-beam apparatus are disclosed. The multi-beam apparatus may include an electron source configured to generate a primary electron beam, a pre-current limiting aperture array comprising a plurality of apertures and configured to form a plurality of beamlets from the primary electron beam, each of the plurality of beamlets having an associated beam current, a condenser lens configured to collimate each of the plurality of beamlets, a beam-limiting unit configured to modify the associated beam current of each of the plurality of beamlets, and a sector magnet unit configured to direct each of the plurality of beamlets to form a crossover within or at least near an objective lens that is configured to focus each of the plurality of beamlets onto a surface of the sample and to form a plurality of probe spots thereon.

公开(公告)号：US20180350555A1

公开(公告)日：2018-12-06

申请号：US15925606

申请日：2018-03-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US10072334B2

公开(公告)日：2018-09-11

申请号：US15786358

申请日：2017-10-17

Applicant: KLA-Tencor Corporation ,  UChicago Argonne LLC

Inventor： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

IPC: H01J37/02 ,  C23C16/455 ,  C23C16/40 ,  C23C16/32 ,  C23C16/34 ,  H01J37/12 ,  H01J37/317 ,  B81B3/00

CPC classification number: C23C16/45529 ,  B81B3/0008 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  H01J37/026 ,  H01J37/06 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/31794

Abstract: A digital pattern generator has a MEMS substrate with a plurality of doping layers and a plurality of insulating layers between respective doping layers. A plurality of lenslets are formed as holes through the substrate. A charge drain coating is applied to the inner surfaces of the lenslets. The charge drain coating drains electrons that come into contact with the charge drain coating so that the performance of the digital pattern generator will not be hindered by electron charge build-up. The charge drain coating includes a doping material that coalesces into clusters that are embedded within a high dielectric insulating material.

公开(公告)号：US09911575B2

公开(公告)日：2018-03-06

申请号：US15207150

申请日：2016-07-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Chi Wang ,  Tsung-Chih Chien ,  Hui-Min Huang ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/10 ,  H01J37/04 ,  H01J37/12 ,  H01J37/20

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: A charged particle multi-beam lithography system includes an illumination sub-system that is configured to generate a charged particle beam; and multiple plates with a first aperture through the plates. The plates and the first aperture are configured to form a charged particle doublet. The system further includes a blanker having a second aperture whose footprint is smaller than that of the first aperture. The charged particle doublet is configured to demagnify a portion of the charged particle beam passing through the first aperture, thereby producing a demagnified beamlet. The blanker is configured to receive the demagnified beamlet from the charged particle doublet, and is further configured to conditionally allow the demagnified beamlet to travel along a desired path.

公开(公告)号：US09558915B2

公开(公告)日：2017-01-31

申请号：US14861737

申请日：2015-09-22

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/317 ,  H01J37/248 ,  H01J37/20 ,  B82B3/00 ,  H01J37/06 ,  H01J37/08 ,  H01J9/02

CPC classification number: H01J37/244 ,  B82B3/00 ,  G03F9/00 ,  H01J9/022 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

Abstract translation: 本发明提供一种用于成像系统的装置，其包括在基板上的多个成像元件。 在一些实施例中，基底可以近似圆形，半径约为一英寸。 讨论了与使用和产生成像系统有关的各种方法。

公开(公告)号：US09336917B2

公开(公告)日：2016-05-10

申请号：US13142787

申请日：2010-06-30

Applicant: Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

Inventor： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

IPC: G21K1/06 ,  G01J3/12 ,  B82Y10/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G01J3/12 ,  G21K1/062 ,  G21K2201/064 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

Abstract translation: 一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括：单色器105，其分散发散的X射线束;以及选择部107，其安装在聚光的X射线束的聚光位置，用于选择具有波长的X射线 在一个特定的范围内，允许它通过，并创建一个虚拟源。 利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。 通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。 此外，还可以切出部分连续X射线束以创建虚拟源。

公开(公告)号：US20160049278A1

公开(公告)日：2016-02-18

申请号：US14483740

申请日：2014-09-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Chi Wang ,  Tsung-Chih Chien ,  Hui-Min Huang ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each having a first aperture and each configured to demagnify a beamlet incident upon the first aperture thereby producing a demagnified beamlet. The apparatus further includes a plurality of charged particle lenses each associated with one of the charged particle doublets, each having a second aperture, and each configured to receive the demagnified beamlet from the associated charged particle doublet and to realize one of two states: a switched-on state, wherein the demagnified beamlet is allowed to travel along a desired path, and a switched-off state, wherein the demagnified beamlet is prevented from traveling along the desired path. In embodiments, the first aperture is greater than the second aperture, thereby improving particle beam efficiency in the charged particle multi-beam lithography system.

Abstract translation: 公开了一种用于带电粒子多光束光刻系统的装置。 该装置包括多个带电荷的微粒双峰，每个具有第一孔，并且每个被配置成使入射在第一孔上的子束缩小，从而产生缩小的子束。 该装置还包括多个带电粒子透镜，每个与带电粒子双重体中的一个相关联，每个具有第二孔径，并且每个被配置成从相关联的带电粒子双重体接收已缩小的子束并实现两种状态之一： 在状态下，其中允许缩小的子束沿着期望的路径行进，并且关闭状态，其中防止了缩小的子束沿所需的路径行进。 在实施例中，第一孔径大于第二孔径，从而提高带电粒子多光束光刻系统中的粒子束效率。

公开(公告)号：US09105439B2

公开(公告)日：2015-08-11

申请号：US13304427

申请日：2011-11-25

Applicant: Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

Inventor： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

IPC: H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

Abstract translation: 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

公开(公告)号：US08912506B2

公开(公告)日：2014-12-16

申请号：US12278219

申请日：2007-02-02

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: G01F23/00 ,  H01J37/18

CPC classification number: H01J37/18 ,  H01J2237/1205 ,  H01J2237/188

Abstract: Disclosed is a device for sustaining different vacuum degrees for an electron column, including an electron emitter, a lens part, and a housing for securing them, to maintain the electron column and a sample under different vacuum degrees. The device comprises a column housing coupling part coupled to the housing to isolate a vacuum; a hollow part defined through the center portion of the device to allow an electron beam emitted from the electron column to pass therethrough; and a vacuum isolation part having a structure of a gasket for vacuum coupling, wherein a difference of no less than 10 torr in a vacuum degree is maintained between both sides of the device by selecting an appropriate diameter of a lens electrode layer which is finally positioned in a path along which the electron beam is emitted or by using the hollow part.

Abstract translation: 公开了一种用于维持用于电子柱的不同真空度的装置，包括电子发射器，透镜部分和用于固定它们的壳体，以保持电子柱和样品处于不同的真空度。 该装置包括一个联接到壳体上的柱壳体联接部分以隔离真空; 通过装置的中心部分限定出允许从电子塔发射的电子束通过的中空部分; 以及具有用于真空联接的衬垫的结构的真空隔离部分，其中通过选择最终定位的透镜电极层的适当直径，在装置的两侧之间保持真空度不小于10托的差异 在发射电子束的路径中或通过使用中空部分。

公开(公告)号：US08835848B2

公开(公告)日：2014-09-16

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung-Joon Ahn

IPC: H01J29/46 ,  H01J3/36 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。