公开(公告)号：US20240063179A1

公开(公告)日：2024-02-22

申请号：US17821009

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Krishna Vasanth Valavala ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Debendra Mallik ,  Feras Eid ,  Xavier Francois Brun ,  Bhaskar Jyoti Krishnatreya

IPC: H01L25/065 ,  H01L25/00 ,  H01L23/00 ,  H01L21/56

CPC classification number: H01L25/0652 ,  H01L25/50 ,  H01L24/20 ,  H01L24/08 ,  H01L21/568 ,  H01L24/19 ,  H01L24/06 ,  H01L2224/221 ,  H01L2224/211 ,  H01L2224/08225 ,  H01L2224/19 ,  H01L2224/0612 ,  H01L2224/06181 ,  H01L24/13 ,  H01L2224/13025 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2924/381

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a dielectric layer having one or more conductive traces and a surface; a microelectronic subassembly on the surface of the dielectric layer, the microelectronic subassembly including a first die and a through-dielectric via (TDV) surrounded by a dielectric material, wherein the first die is at the surface of the dielectric layer; a second die and a third die on the first die and electrically coupled to the first die by interconnects having a pitch of less than 10 microns, and wherein the TDV is electrically coupled at a first end to the dielectric layer and at an opposing second end to the second die; and a substrate on and coupled to the second and third dies; and an insulating material on the surface of the dielectric layer and around the microelectronic subassembly.

公开(公告)号：US20240061194A1

公开(公告)日：2024-02-22

申请号：US17821019

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  David Hui ,  Haris Khan Niazi ,  Wenhao Li ,  Bhaskar Jyoti Krishnatreya ,  Henning Braunisch ,  Shawna M. Liff ,  Jiraporn Seangatith ,  Johanna M. Swan ,  Krishna Vasanth Valavala ,  Xavier Francois Brun ,  Feras Eid

IPC: G02B6/42

CPC classification number: G02B6/4274 ,  G02B6/4204

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include an interconnect die in a first layer surrounded by a dielectric material; a processor integrated circuit (processor IC) and an integrated circuit (IC) in a second layer, the second layer on the first layer, wherein the interconnect die is electrically coupled to the processor IC and the IC by first interconnects having a pitch of less than 10 microns between adjacent first interconnects; a photonic integrated circuit (PIC) and a substrate in a third layer, the third layer on the second layer, wherein the PIC has an active surface, and wherein the active surface of the PIC is coupled to the IC by second interconnects having a pitch of less than 10 microns between adjacent second interconnects; and a fiber connector optically coupled to the active surface of the PIC.

公开(公告)号：US20250006695A1

公开(公告)日：2025-01-02

申请号：US18344260

申请日：2023-06-29

Applicant: Intel Corporation

Inventor： Bhaskar Jyoti Krishnatreya ,  Adel A. Elsherbini ,  Brandon M. Rawlings ,  Kimin Jun ,  Omkar G. Karhade ,  Mohit Bhatia ,  Nitin A. Deshpande ,  Prashant Majhi ,  Johanna M. Swan

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/31 ,  H01L23/48

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first layer with a first die having a first contact; a second die having a second contact; and a pad layer, on the first and second dies, including a first pad and a second pad, where the first pad is coupled to and offset from the first contact in a first direction, and the second pad is coupled to and is offset from the second contact in a second direction different than the first direction; and a second layer including a third die having third and fourth contacts, where the first layer is coupled to the second layer by metal-to-metal bonds and fusion bonds, the first contact is coupled to the third contact by the first pad, and the second contact is coupled to the fourth contact by the second pad.

公开(公告)号：US20250006651A1

公开(公告)日：2025-01-02

申请号：US18345820

申请日：2023-06-30

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Nitin A. Deshpande ,  Francisco Maya ,  Khant Minn ,  Suresh V. Pothukuchi ,  Arnab Sarkar ,  Mohit Bhatia ,  Bhaskar Jyoti Krishnatreya ,  Siyan Dong

IPC: H01L23/544 ,  H01L23/00

Abstract: An apparatus comprising a first integrated circuit device, the first integrated circuit device comprising a fiducial having a length size greater than a width size of the fiducial, wherein the fiducial comprises at least one first area and at least one second area, wherein the at least one first area is to stop light from a light source and the at least one second area is to pass light from the light source during a determination of an alignment between the first integrated circuit device and a second integrated circuit device.

公开(公告)号：US20240063180A1

公开(公告)日：2024-02-22

申请号：US17891654

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Kimin Jun ,  Adel Elsherbini ,  Omkar Karhade ,  Bhaskar Jyoti Krishnatreya ,  Mohammad Enamul Kabir ,  Jiraporn Seangatith ,  Tushar Talukdar ,  Shawna Liff ,  Johanna Swan ,  Feras Eid

IPC: H01L25/065 ,  H01L25/00 ,  H01L21/48 ,  H01L23/13 ,  H01L23/31

CPC classification number: H01L25/0652 ,  H01L25/50 ,  H01L21/4857 ,  H01L23/13 ,  H01L23/3185 ,  H01L24/05

Abstract: Quasi-monolithic multi-die composites including a primary fill structure within a space between adjacent IC dies. A fill material layer, which may have inorganic composition, may be bonded to a host substrate and patterned to form a primary fill structure that occupies a first portion of the host substrate. IC dies may be bonded to regions of the host substrate within openings where the primary fill structure is absent to have a spatial arrangement complementary to the primary fill structure. The primary fill structure may have a thickness substantially matching that of IC dies and/or be co-planar with a surface of one or more of the IC dies. A gap fill material may then be deposited within remnants of the openings to form a secondary fill structure that occupies space between the IC dies and the primary fill structure.

公开(公告)号：US20240063071A1

公开(公告)日：2024-02-22

申请号：US17891880

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Jeffery Bielefeld ,  Adel Elsherbini ,  Bhaskar Jyoti Krishnatreya ,  Feras Eid ,  Gauri Auluck ,  Kimin Jun ,  Mohammad Enamul Kabir ,  Nagatoshi Tsunoda ,  Renata Camillo-Castillo ,  Tristan A. Tronic ,  Xavier Brun

IPC: H01L23/31 ,  H01L25/065 ,  H01L23/00 ,  H01L23/367 ,  H01L23/498 ,  H01L21/48 ,  H01L21/56 ,  H01L25/00

CPC classification number: H01L23/3128 ,  H01L25/0655 ,  H01L24/08 ,  H01L23/367 ,  H01L23/49827 ,  H01L23/49838 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L24/80 ,  H01L25/50 ,  H01L2224/08225 ,  H01L2224/80895 ,  H01L2224/80896

Abstract: Multi-die composite structures including a multi-layered inorganic dielectric gap fill material within a space between adjacent IC dies. A first layer of fill material with an inorganic composition may be deposited over IC dies with a high-rate deposition process, for example to at least partially fill a space between the IC dies. The first layer of fill material may then be partially removed to modify a sidewall slope of the first layer or otherwise reduce an aspect ratio of the space between the IC dies. Another layer of fill material may be deposited over the lower layer of fill material, for example with the same high-rate deposition process. This dep-etch-dep cycle may be repeated any number of times to backfill spaces between IC dies. The multi-layer fill material may then be globally planarized and the IC die package completed and/or assembled into a next-level of integration.

公开(公告)号：US20240063066A1

公开(公告)日：2024-02-22

申请号：US17891665

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Tomita Yoshihiro ,  Adel A. Elsherbini ,  Bhaskar Jyoti Krishnatreya ,  Tushar Talukdar ,  Haris Khan Niazi ,  Yi Shi ,  Batao Zhang ,  Wenhao Li ,  Feras Eid

IPC: H01L23/04 ,  H01L25/065 ,  H01L23/18 ,  H01L23/00 ,  H01L23/48 ,  H01L23/46 ,  H01L23/367

CPC classification number: H01L23/041 ,  H01L25/0652 ,  H01L23/18 ,  H01L24/08 ,  H01L23/481 ,  H01L23/46 ,  H01L23/367 ,  H01L2224/08145 ,  H01L2224/05599 ,  H01L24/05 ,  H01L2224/80379 ,  H01L24/80 ,  H01L2224/16227 ,  H01L24/16 ,  H01L2224/32225 ,  H01L24/32 ,  H01L2224/73204 ,  H01L24/73 ,  H01L2224/131 ,  H01L24/13 ,  H01L2224/29099 ,  H01L24/29

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die having a surface; a template structure having a first surface and an opposing second surface, wherein the first surface of the template structure is coupled to the surface of the first die, and wherein the template structure includes a cavity at the first surface and a through-template opening extending from a top surface of the cavity to the second surface of the template structure; and a second die within the cavity of the template structure and electrically coupled to the surface of the first die by interconnects having a pitch of less than 10 microns between adjacent interconnects.

公开(公告)号：US20250109221A1

公开(公告)日：2025-04-03

申请号：US18374530

申请日：2023-09-28

Applicant: Intel Corporation

Inventor： Wenhao Li ,  Veronica Strong ,  Feras Eid ,  Bhaskar Jyoti Krishnatreya

IPC: C08F20/18 ,  C08F22/10 ,  C09J133/10

Abstract: Hybrid bonded die stacks, related apparatuses, systems, and methods of fabrication are disclosed. One or both of an integrated circuit (IC) die hybrid bonding region and a base substrate hybrid bonding region surrounded by hydrophobic structures that include a cross-linked material. The hybrid bonding regions are brought together with a liquid droplet therebetween, and capillary forces cause the IC die to self-align. A hybrid bond is formed by evaporating the droplet and a subsequent anneal. The cross-linked material hydrophobic structures contain the liquid droplet for alignment and are resistant to plasma treatment prior to bonding.

公开(公告)号：US20250015028A1

公开(公告)日：2025-01-09

申请号：US18887368

申请日：2024-09-17

Applicant: Intel Corporation

Inventor： Bhaskar Jyoti Krishnatreya ,  Nagatoshi Tsunoda ,  Shawna M. Liff ,  Sairam Agraharam

IPC: H01L23/00 ,  H01L21/48 ,  H01L21/56 ,  H01L23/31 ,  H01L23/367 ,  H01L23/538 ,  H01L25/00 ,  H01L25/065

Abstract: Disclosed herein are structures and techniques related to singulation of microelectronic components with direct bonding interfaces. For example, in some embodiments, a microelectronic component may include a surface, wherein conductive contacts are at the surface; a trench at a perimeter of the surface, the trench having a depth; and a burr in the trench having a height that is less than the depth of the trench.

公开(公告)号：US20240347590A1

公开(公告)日：2024-10-17

申请号：US18755306

申请日：2024-06-26

Applicant: Intel Corporation

Inventor： Bhaskar Jyoti Krishnatreya ,  Guruprasad Arakere ,  Nitin Ashok Deshpande ,  Mohammad Enamul Kabir ,  Omkar Gopalkrishna Karhade ,  Keith Edward Zawadzki ,  Trianggono S. Widodo

IPC: H01L29/06 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/78 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L29/0657 ,  H01L21/78 ,  H01L23/562 ,  H01L25/0655 ,  H01L21/30625 ,  H01L21/3065 ,  H01L24/08 ,  H01L2224/08221

Abstract: Systems, apparatus, articles of manufacture, and methods to reduce stress in integrated circuit packages are disclosed. An example semiconductor chip includes: a front surface; a back surface opposite the front surface; a first lateral surface extending between the front surface and the back surface; a second lateral surface extending between the front surface and the back surface; and a curved fillet at an intersection between the first lateral surface and the second lateral surface.