公开(公告)号：US06333508B1

公开(公告)日：2001-12-25

申请号：US09580530

申请日：2000-05-30

Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

IPC: H01J37302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US6028317A

公开(公告)日：2000-02-22

申请号：US5640

申请日：1998-01-12

Applicant: Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

Inventor： Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

IPC: G21K1/087 ,  G21K1/093 ,  H01J3/18 ,  H01J37/12 ,  H01J37/14 ,  H01J37/305 ,  H01L21/027 ,  G21K1/08 ,  H01J3/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/087 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/153 ,  H01J2237/3175

Abstract: An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam passing direction and to form curves obtained by deforming hyperbolas in a direction perpendicular to the beam passing direction, in order that an electric field whose effective part except for an arbitrary constant of the field potential is given by.phi.=(k/2)r.sup.2 -.alpha.lnr-kz.sup.2is spatially partially formed in a cylindrical coordinate system defined by (r, z, .theta.).

Abstract translation: 光学元件包括两个彼此相对配置的距离并配置成会聚电子束的电极1和2。 电极1和2的相对表面被形成为沿着光束通过方向为圆柱对称，并且形成通过使垂直于光束通过方向的方向使双曲线变形而获得的曲线，以便将有效部分除外 对于场电位的任意常数由phi =（k / 2）给出，r2-α1nr-kz2在空间上部分地形成在由（r，z，θ）定义的圆柱坐标系中。

公开(公告)号：US10074503B2

公开(公告)日：2018-09-11

申请号：US15037971

申请日：2014-09-16

Applicant: Siemens Aktiengesellschaft

Inventor： Oliver Heid

IPC: H01J35/06 ,  H01J3/02 ,  H01J35/14 ,  H01J3/18

CPC classification number: H01J3/027 ,  H01J3/02 ,  H01J3/18 ,  H01J35/06 ,  H01J35/14

Abstract: The invention relates to an electron gun for generating a flat electron beam, comprising a cathode with an emission surface which is curved about a central axis and which is designed to emit electrons. The electron gun further comprises an accelerating device for accelerating the electrons in a radial direction towards a target region on the central axis. Furthermore, the emission surface has a width in the azimuth direction and a height oriented perpendicularly to the width, said width being at least ten times greater than the height.

公开(公告)号：US09202662B2

公开(公告)日：2015-12-01

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

公开(公告)号：US08927942B2

公开(公告)日：2015-01-06

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J27/00 ,  H01J37/08 ,  H01J27/02 ,  H01J27/22 ,  H01J3/18 ,  H01J3/26 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：腔室，用于将物质注入到腔室中的注射器，其中所述物质包括至少第一物质，具有位于所述腔室中的顶点的尖端，其中所述顶点具有由金属第二物质制成的表面， 用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述腔室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US08710455B2

公开(公告)日：2014-04-29

申请号：US13838785

申请日：2013-03-15

Applicant: Canon Kabushiki Kaisha

Inventor： Takashi Shiozawa

IPC: H01J37/10 ,  H01J49/42 ,  H01J43/20

CPC classification number: H01J37/10 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/038 ,  H01J2237/31774

Abstract: A charged-particle beam lens includes a plate-like anode, a plate-like cathode, and an insulator disposed between the anode and the cathode. The insulator, the anode, and the cathode have a passage portion through which a charged beam is passed. A high-resistance film is formed on an inner side of the insulator, the inner side forming the passage portion, or an outermost side of insulator, and the anode and the cathode are electrically connected together via the high-resistance film. The anode and the high-resistance film, and the cathode and the high-resistance film each contain the same metal or semiconductor element and have different resistant values. This suppresses electric field concentration due to an increase in resistance and poor connection at the interface between the anode and the cathode and the high-resistance film or at the interface between the electroconductive film and the high-resistance film, thus suppressing generation of discharge.

Abstract translation: 带电粒子束透镜包括板状阳极，板状阴极和布置在阳极和阴极之间的绝缘体。 绝缘体，阳极和阴极具有带电束通过的通道部分。 在绝缘体的内侧形成高电阻膜，形成绝缘体的通路部分或最外侧的内侧，并且阳极和阴极通过高电阻膜电连接在一起。 阳极和高电阻膜以及阴极和高电阻膜各自含有相同的金属或半导体元件，并具有不同的电阻值。 由于电阻增加和阳极与阴极与高电阻膜之间的界面或导电膜与高电阻膜之间的界面处的接合不良而抑制电场集中，因此抑制了放电的产生。

公开(公告)号：US20140077096A1

公开(公告)日：2014-03-20

申请号：US14023308

申请日：2013-09-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takashi Shiozawa ,  Kazushige Utsumi ,  Toshiro Yamanaka

IPC: H01J3/18

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: An electrostatic lens unit of the present disclosure includes an electrostatic lens fixed to a fixing member. The electrostatic lens has a plurality of electrodes arranged apart from each other by a spacing member and each having a through hole through which a charged beam passes. The electrostatic lens is fixed to the fixing member at a position, on a side where the charged beam goes out, shifted from a center of a thickness of the electrostatic lens in a direction of an optical axis.Part of a surface of the electrostatic lens on the side where the charged beam enters is connected to the fixing member via a supporting member.

Abstract translation: 本公开的静电透镜单元包括固定到固定构件的静电透镜。 静电透镜具有通过间隔构件彼此分开布置的多个电极，每个电极具有带电束通过的通孔。 静电透镜在被充电光束出射的一侧的位置处，在静电透镜的厚度中心沿光轴的方向固定在固定部件上。 静电透镜在充电束进入侧的表面的一部分经由支撑构件连接到固定构件。

公开(公告)号：US20130341526A1

公开(公告)日：2013-12-26

申请号：US13915834

申请日：2013-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Yasuo Ohashi

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

公开(公告)号：US08558191B2

公开(公告)日：2013-10-15

申请号：US13744536

申请日：2013-01-18

Applicant: Canon Kabushiki Kaisha

Inventor： Akira Shimazu

IPC: G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/1205 ,  H01J2237/18

Abstract: A charged particle beam lens includes a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam. Each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes. The second electrode further has a second through hole formed therein, through which the charged particle beam does not pass. A distance defining member is provided between the first electrode and the second electrode such that the first electrode and the second electrode are spaced away from each other. A gap is surrounded the first electrode, the second electrode, and the distance defining member, wherein both the first through and the second through hole communicate to the gap. A third through hole passes through the first electrode and the second electrode in the travelling direction of the charged particle beam, and the third through hole is provided outside of the gap and does not communicate to the gap.

Abstract translation: 带电粒子束透镜包括下游侧的第一电极和带电粒子束的行进方向上游侧的第二电极。 第一电极和第二电极中的每一个具有形成在其中的第一通孔，带电粒子束通过该第一通孔。 第二电极还具有形成在其中的第二通孔，带电粒子束通过该通孔不通过。 在第一电极和第二电极之间设置有距离限定部件，使得第一电极和第二电极彼此间隔开。 间隙围绕第一电极，第二电极和距离限定构件，其中第一通孔和第二通孔都与间隙连通。 第三通孔在带电粒子束的行进方向上穿过第一电极和第二电极，并且第三通孔设置在间隙的外部并且不与间隙连通。

公开(公告)号：US08278813B2

公开(公告)日：2012-10-02

申请号：US12481995

申请日：2009-06-10

Applicant: Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

Inventor： Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

IPC: H01J29/46

CPC classification number: H01J37/045 ,  H01J3/18 ,  H01J37/063 ,  H01J37/073 ,  H01J37/295 ,  H01J2237/0432 ,  H01J2237/06333

Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.

Abstract translation: 公开了一种用于产生飞秒电子束的装置和方法。 通过将通过阴极发射的电子放电到阳极来产生电子束的装置包括设置在阴极的一侧以允许入射激光通过的透射窗口，形成在阳极上的针孔，使得针孔对应于位置 的发射窗产生的电子，以及设置在阴极一侧的聚焦单元，产生电场以加速并同时将电子集中到针孔。 通过由位于阴极处的聚焦单元产生的电场，电子同时集中并加速到针孔，以产生飞秒电子束。