Electrostatic alignment of a charged particle beam
    21.
    发明授权
    Electrostatic alignment of a charged particle beam 失效
    带电粒子束的静电排列

    公开(公告)号:US06288401B1

    公开(公告)日:2001-09-11

    申请号:US09364777

    申请日:1999-07-30

    IPC分类号: G21K108

    摘要: A field emission source produces a charged particle beam that can be electrostatically aligned with the optical axis. Quadrupole (or higher multipole) centering electrodes approximately centered on the optical axis are placed between the emitter and the extraction electrode. By applying centering potentials of equal amplitude and opposite polarity on opposing elements of the centering electrodes, an electrostatic deflection field is created near the optical axis. The electrostatic deflection field aligns the charged particle beam with the optical axis thereby obviating the need to mechanically align the emitter with the optical axis. A second set of centering electrodes may be used to deflect the charged particle beam back and to ensure that the charged particle beam is parallel with the optical axis. Further, the extraction electrode may be split into a quadrupole arrangement with the extraction and centering potentials superimposed.

    摘要翻译: 场发射源产生可以与光轴静电对准的带电粒子束。 大约以光轴为中心的四极(或更高的多极)定心电极放置在发射极和引出电极之间。 通过在定心电极的相对元件上施加相等振幅和相反极性的定心电位,在光轴附近产生静电偏转场。 静电偏转磁场将带电粒子束与光轴对准,从而避免了将发射器与光轴机械对准的需要。 可以使用第二组定心电极将带电粒子束偏转回来并确保带电粒子束与光轴平行。 此外,提取电极可以被分成四极排列,其中提取和对中电位叠加。

    Compact arrangement for aberration correction of electron lenses

    公开(公告)号:US11276549B1

    公开(公告)日:2022-03-15

    申请号:US13251266

    申请日:2011-10-02

    申请人: Marian Mankos

    发明人: Marian Mankos

    摘要: One embodiment relates to apparatus for correcting aberrations introduced when an electron lens images a specimen. A specimen is illuminated, and a cathode objective lens accelerates emitted or scattered electrons. The resulting electron beam is deflected by a magnetic beam separator that disperses the incoming electron beam according to its energy. The dispersed beam is focused at the reflection plane of an electron mirror. After this focusing, and a second deflection by the beam separator, the beam dispersion is removed. The dispersion-free beam is reflected in a second electron mirror which corrects aberrations of the cathode objective lens. The beam separator then deflects the beam towards projection optics which form a magnified, aberration-corrected image. When energy filtering is needed, a knife-edge plate is inserted between the beam separator and first electron mirror to remove electrons outside the selected range.
    Other embodiments are disclosed.

    Mirror pulse compressor for electron beam apparatus
    23.
    发明授权
    Mirror pulse compressor for electron beam apparatus 有权
    用于电子束装置的镜面脉冲压缩机

    公开(公告)号:US09406479B1

    公开(公告)日:2016-08-02

    申请号:US14751087

    申请日:2015-06-25

    申请人: Marian Mankos

    发明人: Marian Mankos

    摘要: One embodiment pertains to an apparatus for compressing an electron pulse. An electron source is illuminated by a pulsed laser and generates a pulse of electrons. The pulse enters a beam separator which deflects the electrons by 90 degrees into an electron mirror. The faster, higher energy electrons form the leading edge of the pulse and penetrate more deeply into the retarding field of the electron mirror than the lower energy electrons. After reflection, the lower energy electrons exit the electron mirror before the higher energy electrons and form the leading edge of the pulse. The reflected pulse reenters the separator and is deflected by 90 degrees towards the specimen. The fast, higher energy electrons catch up with the slow, low energy electrons as the electrons strike the specimen. The electrons are scattered by the specimen and used to form a two-dimensional image or diffraction pattern of the specimen.

    摘要翻译: 一个实施例涉及一种用于压缩电子脉冲的装置。 电子源被脉冲激光照射并产生电子脉冲。 脉冲进入光束分离器,将电子偏转90度,使其成为电子反射镜。 更快,更高能量的电子形成脉冲的前沿,并且比较低能量电子更深入地进入电子反射镜的延迟场。 在反射之后,较低能量的电子在较高能量的电子之前离开电子反射镜并形成脉冲的前沿。 反射的脉冲重新进入分离器,并向样品偏转90度。 随着电子撞击样品,快速,高能量的电子赶上缓慢的低能电子。 电子被样品散射并用于形成样品的二维图像或衍射图案。

    Electron beam column and methods of using same
    24.
    发明授权
    Electron beam column and methods of using same 有权
    电子束柱及其使用方法

    公开(公告)号:US08461526B2

    公开(公告)日:2013-06-11

    申请号:US12958174

    申请日:2010-12-01

    IPC分类号: G01N23/00

    摘要: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

    摘要翻译: 在一个实施例中,电子束列的第一真空室具有沿着光轴定位的开口,以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部,并且被配置为将电子源浸入磁场中,以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上,以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

    Shielding, Particulate Reducing High Vacuum Components
    25.
    发明申请
    Shielding, Particulate Reducing High Vacuum Components 有权
    屏蔽,颗粒减少高真空组件

    公开(公告)号:US20110142382A1

    公开(公告)日:2011-06-16

    申请号:US13034770

    申请日:2011-02-25

    IPC分类号: F16C29/00 B23K31/02 B32B15/00

    摘要: A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.

    摘要翻译: 一种形成用于电子枪的高真空环境中的闸阀的方法,该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯,并且具有拉伸强度 强度为约750兆帕,加工镍铁包层,将芯焊接到包层以形成闸阀,并加工闸阀,以消除芯和包层之间的界面处的任何尺寸差异。 以这种方式,由于通过加工而不是部件组装来控制最终机械公差,因此获得极高的对准精度。 最后一部分提供了由镍合金壳提供的场屏蔽,由非磁性合金提供的低杂散场,良好的真空性能和严格的机械公差控制。 此外,由于与不锈钢和钛相比,该合金具有低氧化速度的优点,所以由于诸如电子束轰击的条件,存在较少的污染物积聚。

    Scanning electron microscope with curved axes
    26.
    发明授权
    Scanning electron microscope with curved axes 有权
    具有弯曲轴的扫描电子显微镜

    公开(公告)号:US07205542B1

    公开(公告)日:2007-04-17

    申请号:US11343418

    申请日:2006-01-31

    IPC分类号: H01J37/304

    摘要: One embodiment relates to a scanning electron beam apparatus having curved electron-optical axes. An electron gun and illumination electron optics are configured to generate a primary electron beam along a first axis. Objective electron optics is configured about a second axis to receive the primary electron beam, to focus the incident electron beam onto the substrate, and to retrieve an emitted beam of scattered electrons from the substrate. Detection electron optics is configured about a third axis to receive the emitted beam and to focus the emitted beam onto a detector. A beam separator is coupled to and interconnecting the illumination electron optics, the objective electron optics, and the detection electron optics in such a way that there is a same angle between the first and second axes as between the second and third axes. A beam deflector is configured to controllably scan the primary electron beam across the substrate and to de-scan the emitted electron beam. Other embodiments are also disclosed.

    摘要翻译: 一个实施例涉及具有弯曲电子 - 光轴的扫描电子束装置。 电子枪和照明电子光学器件被配置为沿着第一轴产生一次电子束。 物镜电子光学被配置成围绕第二轴线接收一次电子束,以将入射的电子束聚焦到衬底上,并且从衬底中取出发射的散射电子束。 检测电子光学器件被构造为围绕第三轴线接收发射的光束并且将发射的光束聚焦到检测器上。 光束分离器以这样的方式耦合到照明电子光学器件,物镜电子光学器件和检测电子光学器件,并且在第一和第二轴线之间具有与第二和第三轴线之间相同的角度。 光束偏转器被配置为可控地扫描穿过衬底的一次电子束并且扫描发射的电子束。 还公开了其他实施例。

    High contrast inspection and review of magnetic media and heads
    27.
    发明授权
    High contrast inspection and review of magnetic media and heads 有权
    磁性介质和磁头的高对比度检查和检查

    公开(公告)号:US06936816B2

    公开(公告)日:2005-08-30

    申请号:US10833611

    申请日:2004-04-28

    摘要: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.

    摘要翻译: 所公开的一个实施例涉及使用自动检查装置检查或检查磁化试样的方法。 该方法包括使用电子源产生入射电子束,使样本相对于电子源偏置,使得入射的电子随着试样的表面而减速,并且以一定的倾斜度照射一部分试样 入射电子束。 使用检查装置的可移动台,使试样在电子的入射光束下移动。 检测到分散的电子以形成不同磁化强度的区域之间显示不同对比度的样本的图像数据。 在入射电子束下的样本的移动可以是连续的,并且可以使用时间延迟积分检测器并行获取多个图像像素的数据。

    Method of forming gated photocathode for controlled single and multiple electron beam emission
    29.
    发明授权
    Method of forming gated photocathode for controlled single and multiple electron beam emission 失效
    形成用于受控单电子束和多电子束发射的门控光电阴极的方法

    公开(公告)号:US06220914B1

    公开(公告)日:2001-04-24

    申请号:US09449201

    申请日:1999-11-24

    IPC分类号: H01J902

    摘要: A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

    摘要翻译: 具有栅极的光电阴极,使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板,光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外,栅电极可以具有多个段,其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

    Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination

    公开(公告)号:US08729466B1

    公开(公告)日:2014-05-20

    申请号:US13804066

    申请日:2013-03-14

    申请人: Marian Mankos

    发明人: Marian Mankos

    摘要: One embodiment relates to an apparatus for correcting aberrations introduced when an electron lens forms an image of a specimen and simultaneously forming an electron image using electrons with a narrow range of electron energies from an electron beam with a wide range of energies. A first electron beam source is configured to generate a lower energy electron beam, and a second electron beam source is configured to generate a higher energy electron beam. The higher energy beam is passed through a monochromator comprising an energy-dispersive beam separator, an electron mirror and a knife-edge plate that removes both the high and low energy tail from the propagating beam. Both the lower and higher energy electron beams are deflected by an energy-dispersive beam separator towards the specimen and form overlapping illuminating electron beams. An objective lens accelerates the electrons emitted or scattered by the sample. The electron beam leaving the specimen is deflected towards a first electron mirror by an energy-dispersive beam separator, which introduces an angular dispersion that disperses the electron beam according to its energy. A knife-edge plate, located between the beam separator and first electron mirror, is inserted that removes all of the beam with energy larger and smaller than a selected energy and filters the beam according to energy. One or more electron lenses focus the electron beam at the reflection surface of the first electron mirror so that after the reflection and another deflection by the same energy-dispersive beam separator the electron beam dispersion is removed. The dispersion-free and energy-filtered electron beam is then reflected in a second electron mirror which corrects one or more aberrations of the objective lens. After the second reflection, electrons are deflected by the magnetic beam separator towards the projection optics which forms a magnified, aberration-corrected, energy-filtered image on a viewing screen.