公开(公告)号：US08481962B2

公开(公告)日：2013-07-09

申请号：US12854008

申请日：2010-08-10

申请人： Eric Kneedler

发明人： Eric Kneedler

IPC分类号： G21K5/04

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

摘要： A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

摘要翻译： 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US12068130B2

公开(公告)日：2024-08-20

申请号：US18333085

申请日：2023-06-12

申请人： NexGen Semi Holding, Inc.

发明人： Mark Joseph Bennahmias ,  Michael John Zani ,  Jeffrey Winfield Scott

IPC分类号： H01J37/30 ,  H01J37/31 ,  H01J37/317

CPC分类号： H01J37/3007 ,  H01J37/3174 ,  H01J2237/04

摘要： A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one- or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.

公开(公告)号：US11694874B2

公开(公告)日：2023-07-04

申请号：US17374459

申请日：2021-07-13

申请人： FEI Company

发明人： Bart Buijsse ,  Bart Jozef Janssen

IPC分类号： H01J37/22 ,  H01J37/26 ,  H01J37/295

CPC分类号： H01J37/265 ,  H01J37/295 ,  H01J2237/04

摘要： Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.

公开(公告)号：US10083815B2

公开(公告)日：2018-09-25

申请号：US15136524

申请日：2016-04-22

申请人： Glenn Lane Family Limited Liability Limited Partnership

发明人： Glenn E. Lane

IPC分类号： H01J37/30 ,  H01J37/08 ,  H01J37/317 ,  H01J37/09 ,  C23C14/48 ,  C23C14/54 ,  H01J49/06 ,  H01J49/26 ,  H01L21/265

CPC分类号： H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

摘要： Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

公开(公告)号：US09793092B2

公开(公告)日：2017-10-17

申请号：US14601446

申请日：2015-01-21

申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

发明人： Masashi Muramatsu ,  Tomokazu Kozakai ,  Fumio Aramaki

IPC分类号： H01J37/304 ,  H01J37/22 ,  H01J37/28 ,  G21K5/02

CPC分类号： H01J37/304 ,  G21K5/02 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/2806 ,  H01J2237/317

摘要： A charged particle beam apparatus has a charged particle beam column configured to irradiate a charged particle beam, and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region. The first and second regions include plural first and second pixels each including first and second sub-pixels which are irradiated by the charged particle beam to generate secondary electrons. First and second sub-pixel images are formed based on the detected secondary electrons, and the first and second sub-pixel images are synthesized to form first and second images.

公开(公告)号：US20170169997A1

公开(公告)日：2017-06-15

申请号：US14770757

申请日：2015-02-25

申请人： ULVAC, INC.

发明人： Naoki MORIGUCHI

IPC分类号： H01J37/32 ,  C03C15/00 ,  H01L21/3065 ,  H01L21/683 ,  H01L21/67

CPC分类号： H01J37/32697 ,  C03C15/00 ,  C09K13/00 ,  C23C16/50 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32706 ,  H01J37/32715 ,  H01J2237/04 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/6831 ,  H02N13/00 ,  H05F3/00

摘要： A plasma etching method includes a first step of attracting a substrate onto a monopolar electrostatic chuck in a first plasma, which is a plasma of a noble gas, and stopping generation of the first plasma after the attracting of the substrate, and a second step of etching the substrate in a second plasma, which is a plasma of a halogen-based etching gas, and stopping generation of the second plasma after the etching of the substrate. In the first step, the generation of the first plasma is stopped when a positive voltage is applied from the monopolar electrostatic chuck to the substrate. In the second step, the generation of the second plasma is stopped when a negative voltage is applied from the monopolar electrostatic chuck to the substrate.

公开(公告)号：US20160293377A1

公开(公告)日：2016-10-06

申请号：US15091639

申请日：2016-04-06

申请人： Euclid TechLabs, LLC

发明人： Sergey V. Baryshev ,  Chunguang Jing ,  Jiaqi Qiu ,  Sergey Antipov ,  Gwanghui Ha ,  June W. Lau ,  Yimei Zhu

IPC分类号： H01J37/06 ,  H01J37/147 ,  H01J31/00

CPC分类号： H01J37/06 ,  H01J37/045 ,  H01J37/1472 ,  H01J2237/04 ,  H01J2237/0432 ,  H01J2237/061 ,  H01J2237/1508

摘要： An ElectroMagnetic-Mechanical Pulser can generate electron pulses at rates up to 50 GHz, energies up to 1 MeV, duty cycles up to 10%, and pulse widths between 100 fs and 10 ps. A modulating Transverse Deflecting Cavity (“TDC”) imposes a transverse modulation on a continuous electron beam, which is then chopped into pulses by an adjustable Chopping Collimating Aperture. Pulse dispersion due to the modulating TDC is minimized by a suppressing section comprising a plurality of additional TDC's and/or magnetic quadrupoles. In embodiments the suppression section includes a magnetic quadrupole and a TDC followed by four additional magnetic quadrupoles. The TDC's can be single-cell or triple-cell. A fundamental frequency of at least one TDC can be tuned by literally or virtually adjusting its volume. TDC's can be filled with vacuum, air, or a dielectric or ferroelectric material. Embodiments are easily switchable between passive, continuous mode and active pulsed mode.

摘要翻译： 电磁机械脉冲发生器可以以高达50GHz的速率产生电子脉冲，能量高达1MeV，占空比高达10％，脉冲宽度在100fs和10ps之间。 调制横向偏转腔（“TDC”）对连续电子束施加横向调制，然后通过可调节的切割准直孔将其切成脉冲。 由调制TDC引起的脉冲色散由包括多个附加TDC和/或磁四极管的抑制部分最小化。 在实施例中，抑制部分包括磁性四极杆和TDC，随后是四个额外的四极杆。 TDC可以是单电池或三电池。 至少一个TDC的基本频率可以通过字面或实际调整其音量进行调节。 TDC可以填充真空，空气或电介质或铁电材料。 实施例可在无源连续模式和有源脉冲模式之间容易切换​​。

公开(公告)号：US09355751B2

公开(公告)日：2016-05-31

申请号：US14541238

申请日：2014-11-14

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/24 ,  H01J37/30 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

摘要： The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

摘要翻译： 本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开，并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。

公开(公告)号：US20150270099A1

公开(公告)日：2015-09-24

申请号：US14221840

申请日：2014-03-21

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Joseph C. Olson

IPC分类号： H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3007 ,  H01J37/3171 ,  H01J2237/04 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30455 ,  H01J2237/30488 ,  H01J2237/31703

摘要： A method of achieving ion beam uniformity control using ion beam blockers. The method includes generating an ion beam, detecting a current profile of said ion beam with an ion beam blocker unit, wherein said detected current profile is an initial current profile, blocking a portion of said ion beam with said ion beam blocker unit to achieve a second current profile that is different from the initial current profile, and implanting said ion beam into a workpiece after said blocking.

摘要翻译： 使用离子束阻挡剂实现离子束均匀性控制的方法。 该方法包括产生离子束，用离子束阻挡单元检测所述离子束的电流分布，其中所述检测的电流分布是初始电流分布，用所述离子束阻挡单元阻挡所述离子束的一部分以实现 与初始电流分布不同的第二电流分布，以及在所述阻塞之后将所述离子束植入工件中。

公开(公告)号：US20150214013A1

公开(公告)日：2015-07-30

申请号：US14164179

申请日：2014-01-25

申请人： Yuri GLUKHOY

发明人： Yuri GLUKHOY

IPC分类号： H01J37/32

CPC分类号： H01J37/32449 ,  B05D7/22 ,  C23C14/083 ,  C23C16/405 ,  H01J37/32091 ,  H01J37/32477 ,  H01J37/32807 ,  H01J2237/0213 ,  H01J2237/04 ,  Y10T29/4998

摘要： Proposed is a method for providing uniform distribution of plasma density in a CCP plasma processing apparatus. According to the method the through gas holes of the showerhead of used in the plasma processing chamber of the apparatus are provided with conical nozzles formed on the side of the gas holes that face the gas reservoir of the cooler plate. The cone angle θ of the nozzles decreases in the direction from the peripheral portion to the central area of the showerhead in the range from 120° to 0°. Since the conical nozzles increase the gas gap between the showerhead and the cooler plate, more favorable conditions are created for electric breakdown. In order to protect the surfaces of the conical nozzles and gas holes from deterioration by hollow cathode discharge, these surface are coated by a protective coating resistant to electrical breakdown and chemical corrosion.

摘要翻译： 提出了一种在CCP等离子体处理装置中提供等离子体密度均匀分布的方法。 根据该方法，在装置的等离子体处理室中使用的喷头的通气孔设置有形成在与冷却器板的气体储存器相对的气孔侧的锥形喷嘴。 锥角与角度; 的喷嘴在从120°至0°的范围内从喷墨头的周边部分到中心区域的方向上减小。 由于锥形喷嘴增加了淋浴头和冷却板之间的气隙，因此为电击穿产生了更有利的条件。 为了保护锥形喷嘴和气孔的表面免受空心阴极放电的损坏，这些表面涂有耐电击穿和化学腐蚀的保护涂层。