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公开(公告)号:US11594469B2
公开(公告)日:2023-02-28
申请号:US17228018
申请日:2021-04-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shih-Chang Ku , Hung-Chi Li , Tsung-Shu Lin , Tsung-Yu Chen , Wensen Hung
IPC: H01L23/34 , H01L23/427 , H01L21/48 , H01L25/00 , H01L25/065
Abstract: A semiconductor device includes a vapor chamber lid for high power applications such as chip-on-wafer-on-substrate (CoWoS) applications using high performance processors (e.g., graphics processing unit (GPU)) and methods of manufacturing the same. The vapor chamber lid provides a thermal solution which enhances the thermal performance of a package with multiple chips. The vapor chamber lid improves hot spot dissipation in high performance chips, for example, at the three-dimensional (3D-IC) packaging level.
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公开(公告)号:US11282825B2
公开(公告)日:2022-03-22
申请号:US16877504
申请日:2020-05-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tsung-Shu Lin , Tsung-Yu Chen , Wensen Hung
Abstract: A structure including a wiring substrate, an interposer disposed on and electrically connected to the wiring substrate, a semiconductor die disposed on and electrically connected to the interposer, a first insulating encapsulation disposed on the interposer, a second insulating encapsulation disposed on the wiring substrate, and a lid is provided. The semiconductor die is laterally encapsulated by the first insulating encapsulation. The semiconductor die and the first insulating encapsulation are laterally encapsulated by the second insulating encapsulation. A top surface of the first insulating encapsulation is substantially leveled with a top surface of the second insulating encapsulation and a surface of the semiconductor die. The lid is disposed on the semiconductor die, the first insulating encapsulation and the second insulating encapsulation.
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公开(公告)号:US20210366889A1
公开(公告)日:2021-11-25
申请号:US16877504
申请日:2020-05-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tsung-Shu Lin , Tsung-Yu Chen , Wensen Hung
Abstract: A structure including a wiring substrate, an interposer disposed on and electrically connected to the wiring substrate, a semiconductor die disposed on and electrically connected to the interposer, a first insulating encapsulation disposed on the interposer, a second insulating encapsulation disposed on the wiring substrate, and a lid is provided. The semiconductor die is laterally encapsulated by the first insulating encapsulation. The semiconductor die and the first insulating encapsulation are laterally encapsulated by the second insulating encapsulation. A top surface of the first insulating encapsulation is substantially leveled with a top surface of the second insulating encapsulation and a surface of the semiconductor die. The lid is disposed on the semiconductor die, the first insulating encapsulation and the second insulating encapsulation.
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公开(公告)号:US20210280491A1
公开(公告)日:2021-09-09
申请号:US17328266
申请日:2021-05-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tsung-Shu Lin , Wensen Hung , Hung-Chi Li , Tsung-Yu Chen
IPC: H01L23/367 , H01L25/065 , H01L25/00 , H01L21/48 , H01L21/56 , H01L21/78 , H01L23/31
Abstract: In an embodiment, a device includes: a die stack over and electrically connected to an interposer, the die stack including a topmost integrated circuit die including: a substrate having a front side and a back side opposite the front side, the front side of the substrate including an active surface; a dummy through substrate via (TSV) extending from the back side of the substrate at least partially into the substrate, the dummy TSV electrically isolated from the active surface; a thermal interface material over the topmost integrated circuit die; and a dummy connector in the thermal interface material, the thermal interface material surrounding the dummy connector, the dummy connector electrically isolated from the active surface of the topmost integrated circuit die.
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公开(公告)号:US20210082845A1
公开(公告)日:2021-03-18
申请号:US17093190
申请日:2020-11-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Hsien Hsieh , Hsien-Wei Chen , Chen-Hua Yu , Tsung-Shu Lin , Wei-Cheng Wu
Abstract: A redistribution layer with a landing pad is formed over a substrate with one or more mesh holes extending through the landing pad. The mesh holes may be arranged in a circular shape, and a passivation layer may be formed over the landing pad and the mesh holes. An opening is formed through the passivation layer and an underbump metallization is formed in contact with an exposed portion of the landing pad and extends over the mesh holes. By utilizing the mesh holes, sidewall delamination and peeling that might otherwise occur may be reduced or eliminated.
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公开(公告)号:US20200381382A1
公开(公告)日:2020-12-03
申请号:US16997941
申请日:2020-08-20
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Yen Chiu , Shou-Yi Wang , Tsung-Shu Lin
IPC: H01L23/00 , H01L23/522 , H01L21/56 , H01L23/31
Abstract: A semiconductor package includes a semiconductor die and a connection structure. The semiconductor die is laterally encapsulated by an insulating encapsulant. The connection structure is disposed on the semiconductor die, the connection structure is electrically connected to the semiconductor die, and the connection structure includes at least one first via, first pad structures, second vias, a second pad structure and a conductive terminal. The at least one first via is disposed over and electrically connected to the semiconductor die. The first pad structures are disposed over the at least one first via, wherein the at least one first via contacts at least one of the first pad structures. The second vias are disposed over the first pad structures, wherein the second vias contact the first pad structures. The second pad structure is disposed over and contacts the second vias, wherein a vertical projection of each of first pad structures overlaps with a vertical projection of the second pad structure, and an overall area of the vertical projections of the first pad structures is smaller than an area of the vertical projection of the second pad structure. The conductive terminal is disposed over and connects with the second pad structure.
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公开(公告)号:US20180350764A1
公开(公告)日:2018-12-06
申请号:US16101871
申请日:2018-08-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chang-Chia Huang , Tsung-Shu Lin , Ming-Da Cheng , Wen-Hsiung Lu , Bor-Rung Su
IPC: H01L23/00 , H01L21/56 , H01L23/482 , H01L23/498 , H01L23/538 , H01L23/48 , H01L21/768 , H01L21/302 , H01L21/28
CPC classification number: H01L24/16 , H01L21/28 , H01L21/302 , H01L21/565 , H01L21/76895 , H01L23/48 , H01L23/4824 , H01L23/498 , H01L23/538 , H01L24/03 , H01L24/04 , H01L24/05 , H01L24/11 , H01L24/13 , H01L2224/0401 , H01L2224/05556 , H01L2224/05567 , H01L2224/05572 , H01L2224/056 , H01L2224/13083 , H01L2224/131 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13164 , H01L2224/16238 , H01L2224/81191 , H01L2224/81815 , H01L2924/00012 , H01L2924/00014 , H01L2924/01322 , H01L2924/15311 , H01L2924/014 , H01L2224/05552 , H01L2924/00
Abstract: The present disclosure relates a method of forming an integrated chip packaging device. In some embodiments, the method may be performed by forming a conductive trace on a surface of a packaging component. The conductive trace has an angled surface defining an undercut. A molding material is deposited over an entirety of the conductive trace and within the undercut. The molding material is removed from an upper surface of the conductive trace. The molding material has a sloped outermost sidewall after removing the molding material from the upper surface. A solder region is formed on the upper surface of the conductive trace.
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公开(公告)号:US20170345762A1
公开(公告)日:2017-11-30
申请号:US15281043
申请日:2016-09-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Yen Chiu , Ching-Fu Chang , Chien-Chia Chiu , Hsin-Chieh Huang , Tsung-Shu Lin , Pei-Ti Yu
IPC: H01L23/538 , H01L25/10
CPC classification number: H01L23/5386 , H01L21/4857 , H01L21/486 , H01L21/568 , H01L23/49811 , H01L23/5383 , H01L23/5384 , H01L23/5389 , H01L24/19 , H01L24/20 , H01L25/105 , H01L2224/04105 , H01L2224/12105 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2225/1035 , H01L2225/1041 , H01L2225/1058 , H01L2924/15311
Abstract: A conductive pattern including a teardrop shaped portion, a routing line, and a connection portion is provided. The routing line links to the teardrop shaped portion through the connection portion, and a width of the connection portion decreases along an extending direction from the teardrop shaped portion to the routing line. Furthermore, an integrated fan-out package including the above-mentioned conductive pattern is also provided.
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公开(公告)号:US20250022763A1
公开(公告)日:2025-01-16
申请号:US18352363
申请日:2023-07-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Sheng-Han Tsai , Tsung-Yu Chen , Hong-Yu Guo , Tsung-Shu Lin
Abstract: Semiconductor device and methods of manufacture are provided. In an embodiment, the a semiconductor device may include a first semiconductor die; an oxide layer on the first semiconductor die, wherein the first semiconductor die has a first top surface opposite the oxide layer; a first insulating material encapsulating the first semiconductor die and the oxide layer, wherein the first insulating material has a second top surface planar with the first top surface; and a first polymer buffer disposed between a sidewall of the first semiconductor die and a sidewall of the oxide layer, wherein the first polymer buffer has a third top surface planar with both the first top surface and the second top surface.
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公开(公告)号:US11855018B2
公开(公告)日:2023-12-26
申请号:US17093190
申请日:2020-11-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Hsien Hsieh , Hsien-Wei Chen , Chen-Hua Yu , Tsung-Shu Lin , Wei-Cheng Wu
CPC classification number: H01L24/05 , H01L21/56 , H01L23/481 , H01L24/03 , H01L24/11 , H01L24/13 , H01L24/19 , H01L25/105 , H01L25/50 , H01L21/561 , H01L21/568 , H01L23/3128 , H01L23/562 , H01L2224/0231 , H01L2224/04105 , H01L2224/12105 , H01L2224/32145 , H01L2224/32225 , H01L2224/48227 , H01L2224/73265 , H01L2224/73267 , H01L2224/92244 , H01L2225/0651 , H01L2225/06568 , H01L2225/1023 , H01L2225/1041 , H01L2225/1058 , H01L2924/15311 , H01L2924/35121 , H01L2224/73265 , H01L2224/32225 , H01L2224/48227 , H01L2924/00012 , H01L2224/73265 , H01L2224/32145 , H01L2224/48227 , H01L2924/00012 , H01L2924/15311 , H01L2224/73265 , H01L2224/32225 , H01L2224/48227 , H01L2924/00
Abstract: A redistribution layer with a landing pad is formed over a substrate with one or more mesh holes extending through the landing pad. The mesh holes may be arranged in a circular shape, and a passivation layer may be formed over the landing pad and the mesh holes. An opening is formed through the passivation layer and an underbump metallization is formed in contact with an exposed portion of the landing pad and extends over the mesh holes. By utilizing the mesh holes, sidewall delamination and peeling that might otherwise occur may be reduced or eliminated.
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