公开(公告)号：US3433923A

公开(公告)日：1969-03-18

申请号：US3433923D

申请日：1968-06-10

Applicant: MECH TRONICS CORP

Inventor： MCNABB LOUIS A

IPC: B23K15/06 ,  H01J37/063 ,  H01J37/07 ,  B23K9/00

CPC classification number: B23K15/06 ,  H01J37/063 ,  H01J37/07

公开(公告)号：US3433922A

公开(公告)日：1969-03-18

申请号：US3433922D

申请日：1968-06-10

Applicant: MECH TRONICS CORP

Inventor： MCNABB LOUIS A

IPC: B23K15/06 ,  H01J37/063 ,  H01J37/07 ,  B23K9/02

CPC classification number: H01J37/07 ,  B23K15/06 ,  H01J37/063

公开(公告)号：US3273003A

公开(公告)日：1966-09-13

申请号：US25658863

申请日：1963-02-06

Applicant: HERAEUS GMBH W C

Inventor： WALTER DIETRICH

IPC: H01J1/18 ,  H01J1/94 ,  H01J37/07

CPC classification number: H01J1/94 ,  H01J1/18 ,  H01J37/07

公开(公告)号：US20240242918A1

公开(公告)日：2024-07-18

申请号：US18559160

申请日：2021-05-21

Applicant: Hitachi High-Tech Corporation

Inventor： RYO SUGIYAMA ,  Kenji TANIMOTO ,  Shuhei ISHIKAWA

IPC: H01J37/07 ,  H01J37/063 ,  H01J37/08

CPC classification number: H01J37/07 ,  H01J37/063 ,  H01J37/08 ,  H01J2237/038 ,  H01J2237/04735 ,  H01J2237/061

Abstract: Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

公开(公告)号：US20230178325A1

公开(公告)日：2023-06-08

申请号：US17917305

申请日：2020-04-23

Applicant: Hitachi High-Tech Corporation

Inventor： Masahiro FUKUTA ,  Keigo KASUYA ,  Noriaki ARAI

IPC: H01J37/07 ,  H01J37/28

CPC classification number: H01J37/07 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/06375

Abstract: An electron gun 901 capable of suppressing an uneven temperature distribution at an extraction electrode and a length-measuring SEM 900 are provided. The electron gun 901 is equipped with: a charged particle source 1; an extraction electrode 3 for extracting charged particles from the charged particle source 1 and allowing some of the charged particles to pass while blocking some other charged particles; and an auxiliary structure 5 disposed in contact with the extraction electrode 3. The length-measuring SEM 900 is equipped with the electron gun 901 and a computer system 920 for controlling the electron gun 901.

公开(公告)号：US20200273594A1

公开(公告)日：2020-08-27

申请号：US16646382

申请日：2018-09-05

Applicant: HITACHI ZOSEN CORPORATION

Inventor： Ryuta TANAKA ,  Ichiro SAKAI ,  Takeshi NODA

IPC: G21K5/04 ,  H01J37/07

Abstract: An electron beam irradiation device includes a vacuum chamber having an electron beam generator inside, a vacuum nozzle, and a window foil on a tip of the vacuum nozzle. The electron beam irradiation device further includes an outer pipe surrounding the vacuum nozzle, a cooling-gas supply unit that supplies cooling gas into a coolant passage formed between the vacuum nozzle and the outer pipe, and a heat-conducting transmission foil fitted to the window foil and contacting the tip of the vacuum nozzle. The heat-conducting transmission foil has a value of at least 63×10−3, which is determined by dividing a thermal conductivity [W/(m·K)] by a density [kg/m3], and a tip part of the vacuum nozzle is made of a material having at least a thermal conductivity of copper.

公开(公告)号：US20170056539A1

公开(公告)日：2017-03-02

申请号：US15120079

申请日：2015-01-21

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.

Inventor： Håkan MELLBIN

IPC: A61L2/08 ,  H01J37/07 ,  B65B55/08 ,  H01J37/24

CPC classification number: A61L2/087 ,  A61L2202/11 ,  A61L2202/23 ,  B65B55/08 ,  G21K5/02 ,  H01J37/07 ,  H01J37/242

Abstract: Sterilization device, in particular for sterilization of packaging material, comprising a first chamber, a barrier element and a connection area. The first chamber is adapted to provide charge carriers for sterilization, and the connection area is connected to a third chamber so that the barrier element forms at least one part of the boundary of a volume in which a first atmosphere exists.

Abstract translation: 杀菌装置，特别是灭菌包装材料，包括第一室，屏障元件和连接区域。 第一室适于提供用于灭菌的电荷载体，并且连接区域连接到第三室，使得屏障元件形成存在第一气氛的体积的边界的至少一部分。

公开(公告)号：US09530612B2

公开(公告)日：2016-12-27

申请号：US14314222

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Mark D. DiManna ,  Raymond Hill ,  Robert Conners ,  Alexander Groholski

IPC: H01J37/07 ,  H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a charged particle beam system comprising a charged particle beam source, a charged particle column, a sample chamber, a plurality of electrically powered devices arranged within or at either one of the charged particle column, the charged particle beam source and the sample chamber, and at least one first converter to convert an electrical AC voltage power into an electrical DC voltage. The first converter is positioned at a distance from either of the charged particle beam source, the charged particle column and the charged particle chamber, and all elements of the plurality of electrically powered devices, when operated during operation of the charged particle beam source, are configured to be exclusively powered by the DC voltage provided by the converter.

Abstract translation: 本发明涉及一种带电粒子束系统，其包括带电粒子束源，带电粒子柱，样品室，布置在带电粒子柱中的任一个中的多个电动设备，带电粒子束源和 样品室和至少一个第一转换器，以将电AC电压功率转换成电DC电压。 第一转换器位于与带电粒子束源，带电粒子柱和带电粒子室中的任一个相距一定距离处，并且当在带电粒子束源的操作期间操作时，多个电动装置的所有元件是 配置为由转换器提供的直流电压专门供电。

公开(公告)号：US20150325403A1

公开(公告)日：2015-11-12

申请号：US14803964

申请日：2015-07-20

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J37/07 ,  H01J37/305 ,  H01J37/147 ,  H01J37/21 ,  H01J37/10

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

Abstract translation: 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。

公开(公告)号：US08841636B2

公开(公告)日：2014-09-23

申请号：US12911859

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/04 ,  B82Y40/00 ,  B82Y10/00 ,  H01J37/07

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.

Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。 束发生器被布置用于产生多个带电粒子子束。 子束消隐器阵列被布置成用于图形化子束。 子束遮蔽器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据，并且电连接到一个或多个调制器。 屏蔽结构是导电材料，用于基本上屏蔽在光敏元件附近从调制器产生的电场。 屏蔽结构被设置为预定电位。 投影系统布置成将图案化的子束投影到目标表面上。