Structure for Particle Acceleration And Charged Particle Beam Apparatus

    公开(公告)号:US20240242918A1

    公开(公告)日:2024-07-18

    申请号:US18559160

    申请日:2021-05-21

    Abstract: Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

    Charged Particle Gun and Charged Particle Beam System

    公开(公告)号:US20230178325A1

    公开(公告)日:2023-06-08

    申请号:US17917305

    申请日:2020-04-23

    CPC classification number: H01J37/07 H01J37/28 H01J2237/061 H01J2237/06375

    Abstract: An electron gun 901 capable of suppressing an uneven temperature distribution at an extraction electrode and a length-measuring SEM 900 are provided. The electron gun 901 is equipped with: a charged particle source 1; an extraction electrode 3 for extracting charged particles from the charged particle source 1 and allowing some of the charged particles to pass while blocking some other charged particles; and an auxiliary structure 5 disposed in contact with the extraction electrode 3. The length-measuring SEM 900 is equipped with the electron gun 901 and a computer system 920 for controlling the electron gun 901.

    ELECTRON BEAM IRRADIATION DEVICE AND METHOD FOR MANUFACTURING SAME

    公开(公告)号:US20200273594A1

    公开(公告)日:2020-08-27

    申请号:US16646382

    申请日:2018-09-05

    Abstract: An electron beam irradiation device includes a vacuum chamber having an electron beam generator inside, a vacuum nozzle, and a window foil on a tip of the vacuum nozzle. The electron beam irradiation device further includes an outer pipe surrounding the vacuum nozzle, a cooling-gas supply unit that supplies cooling gas into a coolant passage formed between the vacuum nozzle and the outer pipe, and a heat-conducting transmission foil fitted to the window foil and contacting the tip of the vacuum nozzle. The heat-conducting transmission foil has a value of at least 63×10−3, which is determined by dividing a thermal conductivity [W/(m·K)] by a density [kg/m3], and a tip part of the vacuum nozzle is made of a material having at least a thermal conductivity of copper.

    STERILIZATION DEVICE AND AN ELECTRON BEAM EMITTER
    37.
    发明申请
    STERILIZATION DEVICE AND AN ELECTRON BEAM EMITTER 有权
    灭菌装置和电子束发射器

    公开(公告)号:US20170056539A1

    公开(公告)日:2017-03-02

    申请号:US15120079

    申请日:2015-01-21

    Inventor: Håkan MELLBIN

    Abstract: Sterilization device, in particular for sterilization of packaging material, comprising a first chamber, a barrier element and a connection area. The first chamber is adapted to provide charge carriers for sterilization, and the connection area is connected to a third chamber so that the barrier element forms at least one part of the boundary of a volume in which a first atmosphere exists.

    Abstract translation: 杀菌装置,特别是灭菌包装材料,包括第一室,屏障元件和连接区域。 第一室适于提供用于灭菌的电荷载体,并且连接区域连接到第三室,使得屏障元件形成存在第一气氛的体积的边界的至少一部分。

    Modulation device and charged particle multi-beamlet lithography system using the same
    40.
    发明授权
    Modulation device and charged particle multi-beamlet lithography system using the same 有权
    调制装置和带电粒子的多光束光刻系统使用相同

    公开(公告)号:US08841636B2

    公开(公告)日:2014-09-23

    申请号:US12911859

    申请日:2010-10-26

    Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.

    Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括光束发生器,子束遮挡器阵列,屏蔽结构和投影系统。 束发生器被布置用于产生多个带电粒子子束。 子束消隐器阵列被布置成用于图形化子束。 子束遮蔽器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据,并且电连接到一个或多个调制器。 屏蔽结构是导电材料,用于基本上屏蔽在光敏元件附近从调制器产生的电场。 屏蔽结构被设置为预定电位。 投影系统布置成将图案化的子束投影到目标表面上。

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