公开(公告)号：US20060240672A1

公开(公告)日：2006-10-26

申请号：US11434074

申请日：2006-05-16

申请人： Yasuhiro Yoneda ,  Ryoichi Hashimoto ,  Toshiya Hagihara

发明人： Yasuhiro Yoneda ,  Ryoichi Hashimoto ,  Toshiya Hagihara

IPC分类号： H01L21/461 ,  B44C1/22 ,  H01L21/302 ,  C03C15/00

CPC分类号： C09K13/06 ,  C09G1/02 ,  C23F3/00 ,  C23F3/04 ,  C23F3/06 ,  H01L21/31053 ,  H01L21/3212

摘要： A polishing liquid composition is applicable as a means of forming embedded metal interconnections on a semiconductor substrate. In a surface to be polished comprising an insulating layer and a metal interconnection layer, the polishing liquid composition is capable of maintaining a polishing speed of the metal layer, of suppressing an etching speed, and of preventing dishing of the metal layer.

公开(公告)号：US6160171A

公开(公告)日：2000-12-12

申请号：US242441

申请日：1999-02-17

申请人： Yasuhito Yamamoto ,  Yasuhiro Yoneda ,  Kikuo Ataka ,  Naoyuki Yokota

发明人： Yasuhito Yamamoto ,  Yasuhiro Yoneda ,  Kikuo Ataka ,  Naoyuki Yokota

IPC分类号： C07C63/70 ,  C07C69/76 ,  C07C51/363

CPC分类号： C07C69/76 ,  C07C63/70

摘要： The present invention is to provide a trifluoro-substituted benzoic acid, an ester thereof, particularly 2,3,4-trifluoro-5-iodobenzoic acid, 2,3,4-trifluoro-5-trifluoromethylbenzoic acid, esters thereof, which are useful as a starting material for synthesizing a quinolonecarboxylic acid compound useful as a medicine, an anti-bacterial agent or an antiviral agent, and processes for preparing these compounds and 2,4,5-trifluoro-3-iodobenzoic acid, 2,4,5-trifluoro-3-trifluoromethylbenzoic acid and esters thereof.

摘要翻译： PCT No.PCT / JP97 / 02856 Sec。 371日期1999年2月17日 102（e）1999年2月17日PCT PCT 1997年8月19日PCT公布。 出版物WO98 / 07682 日期：1998年2月26日本发明提供三氟取代的苯甲酸，其酯，特别是2,3,4-三氟-5-碘苯甲酸，2,3,4-三氟-5-三氟甲基苯甲酸，酯 可用作合成可用作药物的喹诺酮羧酸化合物的起始原料，抗菌剂或抗病毒剂，以及制备这些化合物和2,4,5-三氟-3-碘代苯甲酸的方法， 2,4,5-三氟-3-三氟甲基苯甲酸及其酯。

公开(公告)号：US5942292A

公开(公告)日：1999-08-24

申请号：US990762

申请日：1997-12-15

申请人： Yasuhiro Yoneda ,  Kazuo Kubota ,  Tetsuo Takano

发明人： Yasuhiro Yoneda ,  Kazuo Kubota ,  Tetsuo Takano

IPC分类号： G02F1/1335 ,  G02F1/1339

CPC分类号： G02F1/13392 ,  G02F1/133512 ,  Y10T428/24273 ,  Y10T428/2982

摘要： The present invention provides a spacer for a liquid crystal display which is excellent in light shielding properties, does not suffer from fading even after the lapse of a long period, thus being excellent in long-term reliability, and has satisfactory strengths and a liquid crystal display made by using the spacer. The above spacer is composed of colored fine particles prepared by copolymerizing a polymerizable anthraquinone dye having at least one ethylenically unsaturated bond in the molecule with an ethylenically unsaturated monomer component in an aqueous medium.

摘要翻译： 本发明提供一种液晶显示器用间隔物，其遮光性优异，即使经过长时间后也不会褪色，因此长期可靠性优异，强度优异，液晶 通过使用间隔件制成的显示。 上述间隔物由通过在水性介质中使分子中具有至少一个烯属不饱和键的聚合性蒽醌染料与烯键式不饱和单体成分共聚而成的有色细颗粒构成。

公开(公告)号：US5895800A

公开(公告)日：1999-04-20

申请号：US106180

申请日：1998-06-29

申请人： Hideaki Kataoka ,  Eiko Yuda ,  Shigemitsu Kamiya ,  Masahide Yamamoto ,  Yoshikatsu Ishizuki ,  Yasuhiro Yoneda ,  Daisuke Mizutani ,  Kishio Yokouchi

发明人： Hideaki Kataoka ,  Eiko Yuda ,  Shigemitsu Kamiya ,  Masahide Yamamoto ,  Yoshikatsu Ishizuki ,  Yasuhiro Yoneda ,  Daisuke Mizutani ,  Kishio Yokouchi

IPC分类号： C08F255/08 ,  C08F283/14 ,  C08G59/32 ,  C08G59/34 ,  C08G61/08 ,  C08L51/00 ,  C08L51/06 ,  C08L51/08 ,  G03F7/004 ,  G03F7/012 ,  G03F7/038 ,  H01B3/40 ,  H01B3/44 ,  H05K1/00 ,  H05K3/28

CPC分类号： C08G59/027 ,  C08F255/08 ,  C08F283/14 ,  C08G59/3218 ,  C08G61/08 ,  C08L51/00 ,  C08L51/06 ,  C08L51/08 ,  G03F7/0045 ,  G03F7/0125 ,  G03F7/038 ,  H01B3/40 ,  H01B3/441 ,  H05K3/285 ,  H05K3/4676

摘要： A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.

公开(公告)号：US5091285A

公开(公告)日：1992-02-25

申请号：US515444

申请日：1990-04-27

申请人： Keiji Watanabe ,  Yasuhiro Yoneda ,  Koichi Kobayashi ,  Keiko Yano ,  Tomio Nakamura ,  Shigeru Shimizu

发明人： Keiji Watanabe ,  Yasuhiro Yoneda ,  Koichi Kobayashi ,  Keiko Yano ,  Tomio Nakamura ,  Shigeru Shimizu

IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  H01L21/66

CPC分类号： G03F7/0047 ,  Y10S430/143

摘要： A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics.When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.

公开(公告)号：US4464455A

公开(公告)日：1984-08-07

申请号：US385887

申请日：1982-06-07

申请人： Yasuhiro Yoneda ,  Kenroh Kitamura ,  Jiro Naito ,  Toshisuke Kitakohji

发明人： Yasuhiro Yoneda ,  Kenroh Kitamura ,  Jiro Naito ,  Toshisuke Kitakohji

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  G03F7/09 ,  G03F7/30 ,  G03F7/36 ,  G03C5/16

CPC分类号： G03F7/094 ,  G03F7/038 ,  G03F7/0755 ,  G03F7/36 ,  Y10S430/143

摘要： A dry-developing negative resist composition consisting of (a) a polymer of a monomer of the following formula I or II or a copolymer of a monomer of the following formula I with a monomer of the following formula II, ##STR1## in which R represents alkyl of 1 to 6 carbon atoms, benzyl, phenyl, or cyclohexyl and (b) 1% to 70% by weight, based on the weight of the composition, of a silicone compound. A negative resist pattern can be formed on a substrate by a process comprising coating the substrate with the resist composition, exposing the resist layer to an ionizing radiation, subjecting the resist layer to a relief treatment, and developing a resist pattern on the substrate by treatment with gas plasma.

摘要翻译： 由（a）下式I或II的单体的聚合物或下式I的单体的共聚物与下式II的单体组成的干显影负性抗蚀剂组合物， > II，其中R表示1至6个碳原子的烷基，苄基，苯基或环己基，和（b）1重量％至70重量％，基于组合物的重量，硅氧烷化合物。 可以通过包括用抗蚀剂组合物涂覆基板，将抗蚀剂层暴露于电离辐射，使抗蚀剂层进行浮雕处理，以及通过处理在基板上显影抗蚀剂图案的方法，在基板上形成负的抗蚀剂图案 与气体等离子体。

公开(公告)号：US09318425B2

公开(公告)日：2016-04-19

申请号：US13212467

申请日：2011-08-18

申请人： Teru Nakanishi ,  Nobuyuki Hayashi ,  Masaru Morita ,  Yasuhiro Yoneda

发明人： Teru Nakanishi ,  Nobuyuki Hayashi ,  Masaru Morita ,  Yasuhiro Yoneda

IPC分类号： H05K1/00 ,  H01L23/498 ,  H01L23/13 ,  H05K3/34 ,  H01L23/00

CPC分类号： H05K1/0296 ,  H01L23/13 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/4985 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05647 ,  H01L2224/1379 ,  H01L2224/13839 ,  H01L2224/13847 ,  H01L2224/16225 ,  H01L2224/16235 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2924/01004 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15311 ,  H05K1/181 ,  H05K3/3436 ,  H05K2201/10287 ,  H05K2201/10378 ,  H05K2201/10424 ,  H05K2201/10719 ,  Y02P70/613 ,  H01L2924/00

摘要： A semiconductor device includes: a wiring board including a first electrode pad on a surface thereof; a circuit board disposed to stand on the wiring board, and including an interconnection connected to the first electrode pad; and a semiconductor package disposed to face the wiring board with the circuit board interposed therebetween, and including a second electrode pad on a surface thereof, the second electrode pad being connected to the interconnection.

摘要翻译： 半导体器件包括：布线板，其表面上包括第一电极焊盘; 电路板，被布置成站立在所述布线板上，并且包括连接到所述第一电极焊盘的互连; 以及半导体封装，其设置成与所述布线板面对所述电路板，并且在其表面上包括第二电极焊盘，所述第二电极焊盘连接到所述互连。

公开(公告)号：US09080080B2

公开(公告)日：2015-07-14

申请号：US13996976

申请日：2011-12-21

申请人： Yasuhiro Yoneda ,  Kanji Sato

发明人： Yasuhiro Yoneda ,  Kanji Sato

IPC分类号： C09G1/00 ,  C09G1/02 ,  C09K3/14 ,  G11B5/84 ,  B01D39/00

CPC分类号： C09G1/02 ,  C09K3/1463 ,  G11B5/8404

摘要： Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing composition including a step of filtering with a filtration filter a silica particle dispersion containing colloidal silica whose primary particles have an average particle diameter in a range of 1 to 100 nm, wherein the filtration filter includes diatomite cationized by use of a polyvalent amine compound having 9 to 200 cationic groups in the molecule.

摘要翻译： 本发明提供一种能够在研磨后能够减少被研磨物的划痕和微粒的抛光组合物的制造方法。 一种抛光组合物的制造方法，其特征在于，使用过滤器过滤含有一次粒子的平均粒径为1〜100nm的胶态二氧化硅的二氧化硅粒子分散体，其中，过滤器包括由硅藻土阳离子化的硅藻土 在分子中使用具有9至200个阳离子基团的多价胺化合物。

公开(公告)号：US08357311B2

公开(公告)日：2013-01-22

申请号：US12520747

申请日：2007-12-28

申请人： Mami Shirota ,  Yasuhiro Yoneda

发明人： Mami Shirota ,  Yasuhiro Yoneda

IPC分类号： C09K13/00 ,  C09K3/14

CPC分类号： C09G1/02 ,  B24B7/241 ,  B24B37/044 ,  C01F17/0043 ,  C01G25/00 ,  C01G25/02 ,  C01P2002/50 ,  C01P2002/54 ,  C01P2002/72 ,  C01P2004/62 ,  C01P2004/64 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/304 ,  H01L21/31053

摘要： A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ (θ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.

摘要翻译： 抛光液组合物包括含有铈和锆的复合氧化物颗粒，分散剂和水性介质。 通过CuKα1射线（λ= 0.154050nm）照射获得的复合氧化物粒子的粉末X射线衍射光谱包括在衍射角2θ具有峰顶的峰（第一峰） （＆amp;布拉格角）范围为28.61至29.67°，峰值（第二峰值）在衍射角2θ处具有峰顶; 范围33.14〜34.53°，峰值（第三峰值）在衍射角2θ具有峰顶; 范围为47.57〜49.63°，峰值（第四峰值）为衍射角2θ的峰值顶点; 范围为56.45至58.91°。 第一峰的半宽度为0.8°以下。

公开(公告)号：US20100056026A1

公开(公告)日：2010-03-04

申请号：US12520747

申请日：2007-12-28

申请人： Mami Shirota ,  Yasuhiro Yoneda

发明人： Mami Shirota ,  Yasuhiro Yoneda

IPC分类号： C09K3/14 ,  B24B37/00

CPC分类号： C09G1/02 ,  B24B7/241 ,  B24B37/044 ,  C01F17/0043 ,  C01G25/00 ,  C01G25/02 ,  C01P2002/50 ,  C01P2002/54 ,  C01P2002/72 ,  C01P2004/62 ,  C01P2004/64 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/304 ,  H01L21/31053

摘要： A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ (θ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.

摘要翻译： 抛光液组合物包括含有铈和锆的复合氧化物颗粒，分散剂和水性介质。 通过CuKα1射线（λ= 0.154050nm）照射获得的复合氧化物粒子的粉末X射线衍射光谱包括在衍射角2θ具有峰顶的峰（第一峰） （＆amp;布拉格角）范围为28.61至29.67°，峰值（第二峰值）在衍射角2θ处具有峰顶; 范围33.14〜34.53°，峰值（第三峰值）在衍射角2θ具有峰顶; 范围为47.57〜49.63°，峰值（第四峰值）为衍射角2θ的峰值顶点; 范围为56.45至58.91°。 第一峰的半宽度为0.8°以下。