Integrated vapor delivery systems for chemical vapor deposition precursors
    59.
    发明授权
    Integrated vapor delivery systems for chemical vapor deposition precursors 有权
    用于化学气相沉积前体的综合蒸汽输送系统

    公开(公告)号:US08571817B2

    公开(公告)日:2013-10-29

    申请号:US12208255

    申请日:2008-09-10

    IPC分类号: G01F1/34

    CPC分类号: C23C16/4482 C23C16/52

    摘要: One disclosed feature of the embodiments is a control processor in a vapor delivery system for chemical vapor deposition precursors. A pressurization rate processor calculates first and second pressurization rate curves at first and second time instants. A volume calculator computes consumed volume based on first and second volumes at the respective first and second time instants. The first and second volumes are computed using slopes of lines fitting the first and second pressurization rate curves.

    摘要翻译: 实施例的一个公开的特征是用于化学气相沉积前体的蒸气输送系统中的控制处理器。 加压率处理器计算第一和第二时刻的第一和第二加压速率曲线。 体积计算器基于相应的第一和第二时刻的第一和第二体积计算消耗的体积。 使用适合第一和第二加压速率曲线的线的斜率来计算第一和第二体积。