Gel patterned surfaces
    57.
    发明授权
    Gel patterned surfaces 有权
    凝胶图案表面

    公开(公告)号:US09512422B2

    公开(公告)日:2016-12-06

    申请号:US13787396

    申请日:2013-03-06

    Applicant: Illumina, Inc.

    Abstract: Provided is an array including a solid support having a surface, the surface having a plurality of wells, the wells containing a gel material, the wells being separated from each other by interstitial regions on the surface, the interstitial regions segregating the gel material in each of the wells from the gel material in other wells of the plurality; and a library of target nucleic acids in the gel material, wherein the gel material in each of the wells comprises a single species of the target nucleic acids of the library. Methods for making and using the array are also provided.

    Abstract translation: 提供了一种阵列,其包括具有表面的固体支持物,所述表面具有多个孔,所述孔包含凝胶材料,所述孔通过表面上的间隙区彼此分离,所述间隙区域在每个孔中分离凝胶材料 的来自多个其他孔中的凝胶材料的孔; 和凝胶材料中的靶核酸文库,其中每个孔中的凝胶材料包含文库的单个靶核酸的种类。 还提供了制作和使用阵列的方法。

    MICROARRAY PROCESSING APPARATUS, WELL PLATE FOR MICROARRAY PROCESSING APPARATUS, MICROARRAY HOLDER, AND MICROARRAY WASHING METHOD
    58.
    发明申请
    MICROARRAY PROCESSING APPARATUS, WELL PLATE FOR MICROARRAY PROCESSING APPARATUS, MICROARRAY HOLDER, AND MICROARRAY WASHING METHOD 审中-公开
    微波加工设备,微波加工设备用微波炉,微波炉保持器和微波洗涤方法

    公开(公告)号:US20160339439A1

    公开(公告)日:2016-11-24

    申请号:US15159026

    申请日:2016-05-19

    Inventor: Kouji SHIMIZU

    Abstract: Provided is a microarray processing apparatus which is capable of sufficiently washing a microarray. The microarray processing apparatus (30) includes a well plate (38) in which one or two or more wells (40) are formed, each well (40) accommodating a microarray (1), and a suction nozzle (46) that suctions a liquid from the well. The well has a concave portion whose upper end is opened, which has a depth equal to or greater than a height of the microarray, and into which a front end of the suction nozzle can be inserted up to a height position of a lower end of the microarray accommodated in the well. The suction nozzle can relatively descend in the well until the front end of the suction nozzle is located at the height position of the lower end of the microarray accommodated in the well.

    Abstract translation: 提供一种能够充分洗涤微阵列的微阵列处理装置。 微阵列处理装置(30)包括其中形成有一个或两个以上的孔(40)的孔板(38),容纳微阵列(1)的每个孔(40)和吸入喷嘴 液体从井。 井具有上端开口的凹部,其深度等于或大于微阵列的高度,并且吸嘴的前端可以插入其中,直到下端的高度位置 微阵列容纳在井中。 吸嘴可以在井中相对下降,直到吸嘴的前端位于容纳在井中的微阵列的下端的高度位置。

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